Laser-ablated deposition

Pulsed laser ablation deposition technique (PLAI) technique)... 

Pulsed laser ablation deposition was used to coat silicon and quartz glass substrates with I1O2/WO3 thin films [259]. The multilayer film showed high photocatalytic activity under visible light irradiation. 

SR etching has been carried out to deposit thin films of many polymers such as PTFE, PVDF, ETFE and so on, demonstrating that it may also be a simple and versatile method for fabrication of thin polymeric films, like laser ablation deposition. 

D. Ferro, R. Teghil, S.M. Barinov, L. D Alessio, G. DeMaria, Thickness-dependent hardness of pulsed laser ablation deposited thin films of refractory carbides. Mater. Chem. Phys. 87(2-3), 233-236 (2004)... 

Flash evaporation can also be done with the pulsed laser vaporization of surfaces.f This technique is sometimes called laser ablation deposition (LAD) or pulsed laser deposition (PLD). Typically an excimer laser (YAG or ARF) is used to deposit energy in pulses. The YAG lasers typically deliver pulses (5 ns, 5 Hz) with an energy of about J/pulse and the ARF lasers typically deliver pulses (20 ns, 50 Hz) with about 300nJ/ pulse. 

Laser ablation deposition (LAD) (film deposition) Physical vapor deposition using laser vaporization as the vapor source. Also called Pulsed laser deposition (PLD). 

The requirements of thin-film ferroelectrics are stoichiometry, phase formation, crystallization, and microstmctural development for the various device appHcations. As of this writing multimagnetron sputtering (MMS) (56), multiion beam-reactive sputter (MIBERS) deposition (57), uv-excimer laser ablation (58), and electron cyclotron resonance (ECR) plasma-assisted growth (59) are the latest ferroelectric thin-film growth processes to satisfy the requirements. 

Alternative Thin-Film Fabrication Approaches. Thin films of electronic ceramic materials have also been prepared by sputtering, electron beam evaporation, laser ablation, chemical beam deposition, and chemical vapor deposition (CVD). In the sputtering process, targets may be metal... 

Optimisation of SWCNT production has been attempted within the framework of the arc-discharge method in which anode and cathode were made of graphite rods, a hole in the anode being filled with metal catalysts such as Y (1 at.%) and Ni (4.2 at.%) [7]. A dense collar deposit (ca. 20% of the total mass of graphite rod) formed around the eathode under He (ca. 500 Torr), with 30 V and 100 A de eurrent. It was eonfirmed that this optimal eollar eontained large amounts of SWCNT bundles eonsisting of (10, 10) SWCNTs (diameter 1.4 nm). Such morphology resembles that produced by the laser ablation teehnique [4,5]. 

The last problem of this series concerns femtosecond laser ablation from gold nanoparticles [87]. In this process, solid material transforms into a volatile phase initiated by rapid deposition of energy. This ablation is nonthermal in nature. Material ejection is induced by the enhancement of the electric field close to the curved nanoparticle surface. This ablation is achievable for laser excitation powers far below the onset of general catastrophic material deterioration, such as plasma formation or laser-induced explosive boiling. Anisotropy in the ablation pattern was observed. It coincides with a reduction of the surface barrier from water vaporization and particle melting. This effect limits any high-power manipulation of nanostructured surfaces such as surface-enhanced Raman measurements or plasmonics with femtosecond pulses. 

A number of other deposition methods have been used for growing diamond, with varying degrees of success. These include oxyacetylene welding torches, arc jets and plasma torches, laser ablation and hquid phase crystallisation, but none of these yet reahstically compete with the hot filament or microwave systems for reliability and reproducibility. 

Laser ablation of polymer films has been extensively investigated, both for application to their surface modification and thin-film deposition and for elucidation of the mechanism [15]. Dopant-induced laser ablation of polymer films has also been investigated [16]. In this technique ablation is induced by excitation not of the target polymer film itself but of a small amount of the photosensitizer doped in the polymer film. When dye molecules are doped site-selectively into the nanoscale microdomain structures of diblock copolymer films, dopant-induced laser ablation is expected to create a change in the morphology of nanoscale structures on the polymer surface. 

Anode materials are most typically deposited by evaporation, sputtering, or chemical vapor deposition methods. Other methods such as screen printing, laser ablation, electrochemical deposition, etc., have also been used. 

Y. Wu, C.H.M. Maree, R.F. Haglund Jr., J.D. Hamilton, M.A. Morales Paliza, M.B. Huang, L.C. Feldman, and R.A. Weller, Resistivity and oxygen content of indium-tin oxide films deposited at room temperature by pulsed-laser ablation, J. Appl. Phys., 86 991-994 (1999). 

Thin-film balance apparatus, 12 7 Thin-film composite membranes, 21 633 Thin-film deposition, laser ablation for, 24 740... 

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