Inductively coupled discharges

Most of plasma polymerizations have been carried out in the frequency range from 50 Hz to 13.56 MHz with using the capacitively coupled discharge system (.4,16). For the inductively coupled discharge system, a frequency of 13.56 MHz was mostly used as a discharge frequency (17,18). In this paper, the discussion will be concentrated on the discharge in the capacitively coupled discharge system. 

RF discharges are classified in accordance to their electrode or electrodeless nature into capacitively or inductively coupled. In the case of the inductively coupled discharge, a helical or flat copper coil is utilised. Inductive coupling is generally used at AC frequencies greater than 1 MHz as it becomes less efficient at lower frequencies. Although systems are often described as inductively coupled this may not be the case as the skin depth (the distance over which the electromagnetic radiation is absorbed) is often in excess of the reactor dimensions. This is certainly the case for the 13.56 MHz systems widely employed for polymer deposition. 

Figure C2.13.3. Schematic illustrations of various electric discharges (a) DC-glow discharge, R denotes a resistor (b) capacitively coupled RF discharge, MN denotes a matching network (c), (d) inductively coupled RF discharge, MN denotes matching network (e) dielectric barrier discharge.

The inductively coupled plasma [19] is excited by an electric field which is generated by an RF current in an inductor. The changing magnetic field of this inductor induces an electric field in which tire plasma electrons are accelerated. The helicon discharge [20] is a special type of inductively coupled RF discharge. 

This is the basic process in an inductively coupled plasma discharge (ICP). The excited ions can be examined by observing the emitted light or by mass spectrometry. Since the molecules have been broken down into their constituent atoms (as ions) including isotopes, these can be identified and quantified by mass spectrometry, as happens with isotope ratio measurements. 

Other configurations that are used include an concentric electrode setup in a tubular reactor, where the discharge still is capacitivily coupled. Also, inductive coupling has been used, with a coil surrounding the tubular reactor [146, 147]. 

ICP-MS Inductively coupled plasma Argon plasma discharge... 

There is a branch of MS specially designed for dealing with the analysis of inorganic materials.[21,22] Different specific ionization techniques, such as inductively coupled plasma mass spectrometry (ICP-MS),[23] glow discharge mass spectrometry (GD-MS)[24] and secondary ion mass spectrometry (SIMS),[25] are available and they are widely used in cultural heritage applications. Their description is beyond the scope of this chapter. 

Glow discharge source (GDMS) Laser ion source (LIMS) Secondary ion source (SIMS) Sputtered neutral source (SNMS) Thermal ionization source (TIMS) Inductively coupled plasma ion source (ICP-MS)... 

The ion source is an essential component of all mass spectrometers where the ionization of a gaseous, liquid or solid sample takes place. In inorganic mass spectrometry, several ion sources, based on different evaporation and ionization processes, such as spark ion source, glow discharge ion source, laser ion source (non-resonant and resonant), secondary ion source, sputtered neutral ion source and inductively coupled plasma ion source, have been employed for a multitude of quite different application fields (see Chapter 9). 

Recently, Hieftje et al.15-16 equipped a small double-focusing mass spectrograph built in house with Mattauch-Herzog geometry with several ion sources (such as glow discharge, an inductively coupled plasma ion source or a microwave plasma torch) and a novel array detector for simultaneous ion detection. 

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