Capacitively coupled discharge

Most of plasma polymerizations have been carried out in the frequency range from 50 Hz to 13.56 MHz with using the capacitively coupled discharge system (.4,16). For the inductively coupled discharge system, a frequency of 13.56 MHz was mostly used as a discharge frequency (17,18). In this paper, the discussion will be concentrated on the discharge in the capacitively coupled discharge system. 

Kushner, M.J. Monte-carlo simulation of electron properties in RF parallel plate capacitively coupled discharges. J. Appl. Phys. 1983, 54, 4958 965. 

Plasma Polymerization of Tetrafluoroethylene in a Capacitively Coupled Discharge with Internal Electrodes... 

Inductively or capacitively coupled discharges on the other hand do not have electrodes in direct contact with the gaseous plasma region and hence are frequently referred to—sometimes without adequate distinction—as electrodeless discharges. The electric field is generated... 

Figure C2.13.3. Schematic illustrations of various electric discharges (a) DC-glow discharge, R denotes a resistor (b) capacitively coupled RF discharge, MN denotes a matching network (c), (d) inductively coupled RF discharge, MN denotes matching network (e) dielectric barrier discharge.

FIG. 4. Schematic representation (a) of a parallel-plate, capacitively coupled RF-discharge reactor, with unequal-size electrodes. The potential distribution (b) shows the positive plasma potential Vp and the negative dc self-bias voltage... 

Fig. 1. Sketch of a capacitively coupled glow discharge deposition system (Knights et al., 1978).

Wagner, 1982 Beyer and (capacitively coupled) glow discharge 4.4 280-300 UT2 1.29 6 x 10 3 Evolution... 

Fig. 3. Formation of a pulsating negative sheath on a capacitively coupled surface in an rf glow discharge [after Butler and Kino ] a) initial application of rf voltage b) steady-state application of rf voltage...

Physical and Electrical Characteristics. The electrical potentials established in the reaction chamber determine the energy of ions and electrons striking the surfaces immersed in a discharge. Etching and deposition of thin films are usually performed in a capacitively coupled parallel-plate rf reactor (see Plasma Reactors). Therefore, the following discussion will be directed toward this configuration. 

One particular example of what may be called a gas-liquid discharge microreactor is the work of Baba et al. (2006, 2007), who have demonstrated the generation of an atmospheric pressure glow-discharge plasma in contact with liquid paraffin, using a capacitively coupled plasma method. The choice for paraffin has two reasons no hydroxyl group present (which is thought to capture electrons, as is the case in water)... 

Figure 11 Geometries of plasma-assisted CVD reactors (A) parallel-plate discharge, (B) tube with capacitive coupling, (C) tube with inductive coupling.13...

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