Diphenyl sulfone-3,3 -disulfonic acid

Alkanedisulfonic acid diphenyl esters 40 react with chlorosulfonic acid under nitrogen to give the corresponding diphenyl ester disulfonic acid 41 (Equation Ih)." The sulfonation of 40 to 41 was improved by using chlorosulfonic acid instead of oleum or other sulfonating agents. 

Specialty sulfonic acid-based surfactants make up a rather large portion of surfactant production in the United States. Approximately 136,000 metric tons of specialty sulfonic acid-based surfactants were produced in 1992, which included alpha-olefin sulfonates, sulfobetaines, sulfosuccinates, and alkyl diphenyl ether disulfonates (64). These materials found use in the areas of household cleaning products, cosmetics (qv), toiletries, emulsion polymerization, and agricultural chemical manufacture. 

Diphenyl-1,10-phenanthroline and 2,9-dimethyl-4,7-diphenyl-1,10-phenanthroline give disulfonic acids on reaction with chloro-sulfonic acid at 25°. The position of substitution was not established, but presumably it occurs in the two phenyl rings.281 An improved method of sulfonation utilizes hot fuming sulfuric acid.282... 

Bis(4-aminophenoxy)benzophenone-3,3 -disulfonic acid, 496 4,4 -Bis(4-aminophenoxy)biphenyl, 461 4,4 -Bis-(p-aminophenoxy)diphenyl-1,3,4-thiadiazole, 307 Bis[4-(p-aminophenoxy)phenoxy]dimethylsilane, 479 2,2 -Bis[4-(4-amino-phenoxy) phenyl] hexafluoroisopropylidene, 477 1,3-Bis [5 -[3"-(p-aminophenoxy)-pheny 1]-oxadiazol-2-yl]benzene, 307 2,2 -Bis(4-(4-aminophenoxy)phenyl)propane, 477, 487 Bis(aminophenoxy phenyl)-sulfone, 489 B is [4-(3 -anrinophenoxy)phenyl] sulfone, 503 A,A -Bis(4-aminophenyl)-A, A -diphenyl-l,4-phenylenediamine, 468... 

Sodium dodecyl diphenyl ether disulfonate cleaner, tile crystal growth control Sodium isopropyl naphthalene sulfonate cleaner, toilet bowl Methoxy PEG-40 Methoxy PEG-100 cleaner, waterless hand Cetoleth-6 cleaner, window lsotrideceth-7 cleaner, wood Potassium acid oxalate cleaner, zinc-base die-cast metals Ammonium thiosulfate cleaning agent, metals Hydrochloric acid cleaning compound mfg. 

Sodium C4-12 olefin/maleic acid copolymer Sodium decyl sulfate Sodium polycarboxylate Sodium polymethacrylate Sodium polynaphthalene sulfonate Sodium tallate Soyamide DEA Stearamide Stearamine Styrene/MA copolymer Tall oil acid Tall oil hydroxyethyl imidazoline Tallow dipropylene triamine TEA-dodecylbenzenesulfonate Tricontanyl PVP Tridecyl neopentanoate Tridecyl trimellitate Triisocetyl citrate Trioctyidodecyl citrate dispersant, pigment dispersions Disodium decyl diphenyl ether disulfonate lsotrideceth-9 Octoxynol-11... 

Arylalkanes and Arylalkenes (Table VIII, p. 181). Diphenylmethane is sulfonated exclusively in the para position rather than in the more hindered ortho position. The 4-sulfonic acid is prepared by treating diphenylmethane with chlorosulfonic acid in chloroform solution at 0 the 4,4 -disulfonic acid, by the action of oleum at 100 . 1,2-Diphenyl-ethane (bibenzyl) when heated with sulfuric acid " jdelds a mixture of a disulfonic acid (probably 4,4 ) and a tetrasulfonic acid. Oleum reacts with stilbene without affecting the olefinic linkage to 3deld a disulfonic acid of unknown structure. Triphenylmethane, sj/m-tetraphenyl-ethane, and tetraphenylethylene yield sulfonic acids containing one sulfo group for each benzene ring, probably in the para position. 

Malik presented data [27] on the detergency of C12 and C13.6 SMEs via a modified Gardner Straight Line Washability Test [39]. The test solutions consisted of 0.6% of the test surfactant and 0.12% tetrapotassium pyrophosphate in 140 ppm as CaCOj water at 25°C. The C12 SME gave equivalent performance compared to decyl and branched dodecyl diphenyl oxide disulfonates. The Cl3.6 SME slightly outperformed the Cl2 SME but was not quite as good as the C8-10, 5-mole ethoxylated phosphate ester that was also included. Both SMEs contained the analog sulfonated fatty-acid sodium salts as secondary snrfactants. 

Sulfonic (-SO3H) and Sulfinic (-SO2H) Acid-Based Nonsalt Photoinitiators Photosensitive tosylate esters of nitrobenzyl [65] and benzoin [73], sulfonyl ketones [67,68], and diphenyl disulfones [68] can be employed in cationic photopolymerization, especially in photolithography and chemical amplification processes. The advantages of these photoinitiators are the ease of synthesis, the absorption wavelengths suitable for deep-UV curing and the high yield of acid formation [65]. 

Hexadecylpyridinium chloride 1-Hexadecylpyridinium chloride n-Hexade-cylpyridinium chloride. See Cetylpyridinium chloride Hexadecyl sodium sulfate. See Sodium cetyl sulfate Hexadecyl stearate n-Hexadecyl stearate. See Cetyl stearate Hexadecyl (sulfophenoxy) benzenesulfonic acid, disodium salt See Sodium hexadecyl diphenyl disulfonate Hexadecyl tetradecanoate. See Cetyl myristate Hexadecyltrimethylammonium bromide. See Cetrimonium bromide Hexadecyl trimethyl ammonium chloride. See Cetrimonium chloride Hexadecyl trimethyl ammonium p-toluene sulfonate. See Cetrimonium tosylate Hexadienic acid Hexadienoic acid 2/4-Hexadienoic acid. See Sorbic acid 2/4-Hexadienoic acid potassium salt. See Potassium sorbate Hexaethylene glycol. See PEG-6... 

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