Deep X-ray lithography

V, White, R. Ghodssi, C. Herdey, D.D. Denton and L. McCaughan, Use of photosensitive polyimide for deep X-ray lithography, Appl. Phys. Lett, 66 (1995) 2072-2073. 

White V, Ghodssi R, Herdey C, Denton DD, McCaughan L. Use of photosensitive polyimide for deep x-ray lithography. Appl Phys Lett 1995 66 2072-3. 

Guckel H (1998) High-aspect-ratio micromachining via deep x-ray lithography. Proc IEEE 86 1586... 

Fig. 2 X-ray absorption spectra calculated for the polymers PMMA and PTFE. PMMA is mainly used in deep x-ray lithography, namely the LIGA process, while PTFE is mainly used in SR direct photoetching, namely the TIEGA process...

Fig. 20 SEM picture of the typical microstructures made of PMMA by SR direct etching in vacuum. Here, the structural depth is 200 //m, much larger than the 0.6 mm previously observed in the self-development. But the quality is not as good as that of microstructures made by deep x-ray lithography (cf., Fig. 13)...

Nazmov, V., Shabel nikov, L., Pantenburg, F.-J. et al. 2004. Kinoform x-ray lens creation in polymer materials by deep x-ray lithography. Nuclear Instruments and Methods in Physics Research B 217 409-416. 

Since USM mills can be used on these multipurpose milling machines, the micro milling process is considered a flexible manufacturing process. In addition, the process is characterized by low setup costs, unlimited part materials, and a high material removal rate (Ozel et al. 2011). It is, for example, used to machine small features in molds used for mass production (e.g., microfluidic devices), to structure medical implants for better biocompatibility, to generate deep x-ray lithography masks, and to manufacture prototypes rapidly as well as efficiently (Aurich et al. 2012). 

However, the ultraprecise microstructures with extreme aspect ratio could only be generated by deep X-ray lithography. Difficulties, for example, in the access to synchrotron radiation facilities have limited the commercialization of LIGA technique in mass fabrication. 

Direct nano-in-micropatterning of Ti02 thin layers and Ti02/Pt nanoelectrode arrays by deep X-ray lithography. /,... 

Costacurta, S., Malfotti, L., Patelli, A., Amenitsch, H., Marmiroli, B., Falcaro, P., Grenci, G., Piccinini, M., and Innocenzi, P. (2010) Deep X-ray lithography for direct patterning of PECVD films. Plasma Proems. Polym., 7,459-465. 

H. Guckel, T. Earles, Klein, in Deep X-Ray Lithography and Electroplating for Electomagnetic Actuators. Electrochemical Society Proceedings, vol. 95-18 (1996), p. 407... 

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