Ray Lithography

For X-ray lithography, the key reagents are the solvated electrons that are generated when ionizing radiation interacts with water and other solvents [33]  

Solvated electrons have a reduction potential of —2.7 eV, which is sufficient to reduce most metals. Metal nanoparticles are formed by direct reduction of ions  

Patterns were obtained out of metal chalcogenides which were comparable in size and penetration depth to those obtained for metals. Nanoparticles grew in size with irradiation time. Shallow patterns consisted of small, highly luminescent nanoparticles. Deep patterns, where long irradiation times were required, contained large particles with a comparatively low luminescence quantum yield. 

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Because beryllium is relatively transparent to X-rays, ultra-thin Be-foil is finding use in X-ray lithography for reproduction of microminiature integrated circuits. 

Fig. 2.9.5 (a) Typical computer generated percolation cluster that served as a template for the sample fabrication, (b) Photograph of a model object milled 1 mm deep into a polystyrene sheet. The total object size is 12 x 12 cm2, (c) Photographs of model objects etched 1 mm deep into PMMA sheets by X-ray lithography. The total object sizes are 15x15 mm2, 18x18 mm2 and 24 x 24 mm2 from right to... 

One method for obtaining a high masking speed and resolution with X-ray lithography is use of highly sensitive positive resists. This paper reports some investigations on such sensitive positive X-ray resists. 

Proximity-mode X-ray lithography, 75 159 Proxmire Amendments, 78 685 Prussian Blue, 74 534, 536-537 79 407 22 810 color, 7 332 Prussian blue systems... 

Finally, we note that there are two different approaches to an nanodevice science One can carry out some kind of very small-scale Hthography (e-beam direct writing, focussed ion beam FIB, X-ray lithography, etc.), all of which... 

Electron beam resist has been a key material for mask fabrication in the semiconductor industry. EB and x-ray lithography have recently attracted much attention as not only a next-generation lithography in the semiconductor industry but also a nanofabrication tool... 

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