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Lithographic modeling

Lithographic modeling simulates several key steps in the lithographic process comprising image formation, resist exposure, postexposure bake diffusion,... [Pg.554]

Figure 12.1 Flow diagram of lithographic modeling. (Adapted with permission from... Figure 12.1 Flow diagram of lithographic modeling. (Adapted with permission from...
Lithographic modeling and simulation have found wide applications, spanning research, process development, manufacturing process optimization and control, and even education within the semiconductor industry. A few notable examples of these applications and their roles in shaping the evolution of lithography are outlined helow. [Pg.600]

Still further, lithographic modeling has been employed in resist studies to understand the depth of focus loss associated with printing contact holes in negative... [Pg.602]

Lithographic modeling has found widespread applications in the development of new lithographic processes and equipment. Such applications include the optimization of dye loadings in resists, the simulation of substrate reflectivity, the applicability and optimization of top and bottom antireflection coatings, and the simulation of the effect of bandwidth on swing curve amplitude. " ... [Pg.602]

Furthermore, lithographic modeling is employed by resist manufacmrers to evaluate new formulations and to determine adequate measures of resist... [Pg.602]

See other pages where Lithographic modeling is mentioned: [Pg.356]    [Pg.58]    [Pg.464]    [Pg.551]    [Pg.551]    [Pg.551]    [Pg.553]    [Pg.553]    [Pg.554]    [Pg.555]    [Pg.557]    [Pg.563]    [Pg.565]    [Pg.577]    [Pg.581]    [Pg.583]    [Pg.585]    [Pg.589]    [Pg.595]    [Pg.599]    [Pg.599]    [Pg.599]    [Pg.601]    [Pg.601]    [Pg.601]    [Pg.601]    [Pg.604]    [Pg.604]    [Pg.885]   
See also in sourсe #XX -- [ Pg.551 ]



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