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Ultrahigh-purity

Asian production of hydrogen fluoride is concentrated in Japan. The Japanese are leaders in the production of high quaHty HP. Hashimoto has the capacity for 3000 t/yr of ultrahigh purity product. Por the future, increased production in many of the developing Asian nations is likely. [Pg.198]

Johnson—Matthey/AESAR group, Aldrich Chemical, and EM Industries, Inc. Ultrahigh purity (99.999%) material is available only from Air Products and Chemicals, Inc. of Allentown, Peimsylvania. The price varies depending on the purity of the material from 25/kg (99%) through 250/kg (99.99%), to 1500—2500/kg (99.999%). Consumption of ZrF in the United States is less than 5000 kg/yr. [Pg.262]

Ultrahigh Purity Gallium. Many appHcations, particularly those in the electronics industry (see Electronic materials), require high (>99.99999% = 7.N ) purity metallic galHum. This is achieved by a combination of several operations such as filtration, electrochemical refining, heating under vacuum, and/or fractional crystalli2ation (see Ultrapure materials) (14). [Pg.160]

The advance (ca 1996) in alkylation technology enables the production of ultrahigh purity ethylbenzene at a low cost. With this ethylbenzene as the intermediate, a dehydrogenation unit of the present design will be able to produce styrene of 99.95% purity routinely. It may prompt a new standard in the styrene industry. [Pg.486]

Zone refining can be appHed to the purification of almost every type of substance that can be melted and solidified, eg, elements, organic compounds, and inorganic compounds. Because the soHd—Hquid phase equiHbria are not favorable for all impurities, zone refining often is combined with other techniques to achieve ultrahigh purity. [Pg.446]

For example, chloride and duoride ions, even in trace amounts (ppm), could cause the dissolution of aluminum metallization of complimentary metal oxide semiconductor (CMOS) devices. CMOS is likely to be the trend of VLSI technology and sodium chloride is a common contaminant. The protection of these devices from the effects of these mobile ions is an absolute requirement. The use of an ultrahigh purity encapsulant to encapsulate the passivated IC is the answer to some mobile ion contaminant problems. [Pg.188]

Both liquid and vapor phases are totally miscible. Conventional vapor/liqiiid eqiiilihriiim. Neither phase is pure. Separation factors are moderate and decrease as purity increases. Ultrahigh purity is difficult to achieve. No theoretical limit on recovery. Liquid phases are totally miscible solid phases are not. Eutectic system. Sohd phase is pure, except at eutectic point. Partition coefficients are very high (theoretically, they can be infinite). Ultrahigh purity is easy to achieve. Recovery is hmited by eutectic composition. [Pg.1989]

Thermal treatment of a material in a gas oxidizing atmosphere is the simplest concept. This can be done in air, air diluted in N2, dry air, or in ultrahigh purity O2. In the laboratory practice, calcination is done in flowthrough beds, aided by fluidization, or in static box furnaces. Important aspects are the bed geometry, the removal of the generated gases, and temperature gradients. [Pg.121]

In the case of a simple eutectic system shown in Fig. 20-2, a pure solid phase is obtainecf by cooling if the composition of the feed mixture is not at the eutectic composition. If liquid composition is eutectic, then separate crystals of both species will form. In practice it is difficult to attain perfect separation of one component by crystallization of a eutectic mixture. The solid phase will always contain trace amounts of impurity because of incomplete solid-liquid separation, slight solubility of the impurity in the solid phase, or volumetric inclusions. It is difficult to generalize on which of these mechanisms is the major cause of contamination because of analytical difficulties in the ultrahigh-purity range. [Pg.4]

Process water applications include boiler water feed pretreatment before ion exchange or electrodialysis. RO is also used for ultrahigh-purity water production for use in laboratories, medical devices (kidney dialysis), microelectronic manufacturing (rinse fluids per ASTM D-19 D5127-90, 1990), and pharmaceutical manufacturing (purified water or water for injection as specified by USP). [Pg.47]

Several conditions must be met for successful ETEM investigations. Thin, electron-transparent samples are necessary—this requirement can usually be met with most catalyst powders. Ultrahigh-purity heater materials and sample grids capable of withstanding elevated temperature and gases are required (such as those made of stainless steel or molybdenum). The complex nature of catalysis with gas environments and elevated temperatures requires a stable design of the ETEM instrument to simulate realistic conditions at atomic resolution. [Pg.221]

Ultrahigh molecular weight polycarbonates, 19 802 Ultrahigh purity selenium, 22 93 tellurium, 24 411 Ultrahigh temperature (UHT) technologies, 18 32... [Pg.981]

Secondary refining processes such as zone melting and solid-state electrotransport (Section III,D) should yield ultrahigh-purity Pa metal. [Pg.19]

Uses. Catalyst in manufacture of diborane, ultrahigh-purity boron, and semiconductors... [Pg.88]

The concentration of extremely dilute solutions is sometimes expressed as parts per million. For example, one supplier of ultrahigh purity nitrous oxide lists the concentration of carbon monoxide as less than 0.1 ppm. A ppm concentration is analogous to a percent concentration, except you are comparing the amount of solute to a million parts of solution, rather than 100 parts. Formally, this definition has the following mathematical form. [Pg.198]

FIGURE 33 An ultrahigh-purity water system for semiconductor manufacture. (Nitto Electric Industrial Co., Ltd.)... [Pg.386]

Cryptand syntheses require ultrahigh purity reagents, water-free conditions, and highly dilute reaction conditions in order to quell partial reactions and polymerizations. Also, a template species such as metal ions or nonreactive guest species is useful. [Pg.1084]


See other pages where Ultrahigh-purity is mentioned: [Pg.113]    [Pg.282]    [Pg.385]    [Pg.335]    [Pg.59]    [Pg.327]    [Pg.1990]    [Pg.47]    [Pg.1012]    [Pg.1014]    [Pg.133]    [Pg.136]    [Pg.103]    [Pg.389]    [Pg.3]    [Pg.149]    [Pg.335]    [Pg.263]    [Pg.93]    [Pg.308]    [Pg.385]    [Pg.362]    [Pg.15]    [Pg.20]    [Pg.668]    [Pg.263]    [Pg.1748]   
See also in sourсe #XX -- [ Pg.32 ]




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Ultrahigh-purity gases

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