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Tantalum electrochemical coating

The DSA-type anodes are inert , coated anodes made of a valve metal (titanium, niobium, or tantalum) base coated with an electrochemically active coating. The active coating is made either of noble metals or of mixed metal oxides. Noble metals in active coatings are usually platinum or platinum alloys. Mixed metal-oxide coatings contain active oxides and inert oxides the active components are usually ruthenium dioxide (R.UO2) and iridium dioxide (IrC>2) and the inert components are mostly titanium dioxide (TiC>2) and other oxides such as tantalum... [Pg.186]

Kuznetsov, S.A., Glagolevskaya, A.L., and Belyaevskii, A.T. (1994) Electrochemical preparation of tantalum boride coatings in salt melts, Zh. PriklKhim. (Russ). 67,1093-1099. [Pg.108]

Stern K.H. and Carlton E.W., Electrodeposition of Tantalum Silicide Coatings from molten salts, (1986),/. Electrochem. Soc., 133, 2157-60. [Pg.142]

Use Refractory for aircraft and rocket applications, thermocouple protection tubes, high temperature electrical conductor, cutting tool component, coating tantalum, cathode in high-temperature electrochemical systems. [Pg.1351]

Levesque A, Bouteville A (2001) Evaluation of corrosion behaviour of tantalum coating obtained by low pressure chemical vapour deposition using electrochemical polarization. J Phys IVI1 Pr3-915-920... [Pg.70]

The adhesion of the polymer to the electrode surface is another consideration. For example, the polymer can be generated at an electrode such as tantalum, where it will not deposit. In our laboratories38 we have used the fact that deposition of PPy onto tantalum is difficult in the design of an electrochemical slurry cell to coat silica particles. The polymer generated at the tantalum anode does not deposit there instead, it deposits on the more receptive (silica particle) surfaces in the electrochemical cell. This represents a unique polymerization process whereby the polymer is generated electrochemically in an environment that allows nonconductive substrates to be coated, resulting in unique composite structures. [Pg.69]

All experiments were performed on 200mm wafers using Semitool s plating tool. Trenches with various geometries and aspect-ratios were patterned in silicon oxide coated wafers. Titanium Nitride (TiN) or Tantalum (Ta) diffusion barriers with nominal thickness of 300 A were deposited on the trenches by vacuum techniques such as PVD or CVD. Unless specified differently, a PVD copper adhesion layer with a nominal thickness of 200A was deposited on top of the barrier by PVD techniques. This thin PVD copper adhesion layer was electrochemically enhanced in Semitool s proprietary ECD seed plating solution prior to the full deposition from an acid copper sulfate bath. [Pg.123]

EINECS 234-963-5 Zirconium boride Zirconium boride (ZrB2) Zirconium diboride Zirconium diboride (ZrB2). Refractory for aircraft and rocket applications, thermocouple protection tubes, high-temp, electrical conductor, cutting-tool component, coating tantalum, cathode in high-temp, electrochemical systems oxidation-resistant composites. Atomergic Chemetals Cerac Noah Cham. [Pg.681]

W.J. Heffernan, I. Ahmad, R.W. Haskell, A Continuous CVD Process for Coating Filaments with Tantalum Carbide, Proc. 4th Int. Conf. on CVD, The Electrochemical Society, Inc., Princeton, NJ, 1973, pp. 498-508. [Pg.362]

R. A. Bull, F.-R. F. Fan and A. J. Bard, Polymer films on electrodes VII. Electrochemical behavior at polypyrrole-coated platinum and tantalum electrodes, J. Electrochem. Soc. 129 (1982) 1009-1015. [Pg.107]

The anode bodies of tantalum, aluminum, and most recently niobium capacitors are made of highly porous metals. These bodies are obtained either by sintering fine metal powders or electrochemical etching of thin foils. A thin dielectric layer is then electrochemically grown on the metal surface. Due to the porous structure of the anode bodies, the cathode polymer must be able to penetrate deep into the pores and coat aU internal surfaces in order to utilize the full, potential capacitance of the anode. [Pg.410]

Stem KH, Gadomski ST (1983) Electrodeposition of tantalum carbides from molten salts. J Electrochem Soc 130 300-305 Massot L, Chamelot P, Taxil P (2006) Preparation of tantalum carbide films by reaction of electrolytic carbon coating with the tantalum coating. J Alloys Comp 424(1-2) 199-203... [Pg.1805]

Zein El Abedin, S., Welz-Biermann, U., and Endres, F. (2005) A study on the electrodeposition of tantalum on NiTi alloy in an ionic liquid and corrosion behaviour of the coated alloy. Electrochem. Commim, 7(9), 941-946. [Pg.363]


See other pages where Tantalum electrochemical coating is mentioned: [Pg.363]    [Pg.142]    [Pg.114]    [Pg.181]    [Pg.61]    [Pg.544]    [Pg.47]    [Pg.440]    [Pg.4772]    [Pg.1285]    [Pg.227]    [Pg.557]    [Pg.405]    [Pg.578]    [Pg.44]    [Pg.38]    [Pg.645]    [Pg.653]    [Pg.779]    [Pg.359]   
See also in sourсe #XX -- [ Pg.363 ]




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