Copper in acids

The rotating hemisphere electrode has been used to investigate the effect of AC on the electrodissolution and deposition reactions of zinc in zinc chloride [25] and copper in acid copper sulfate solutions [55], AC was found to increase the rate of nucleation and produce more uniform deposit on the zinc electrode. The corrosion of an iron rotating hemisphere in dilute sulfuric acid was investigated by Haili [31] using the AC impedance measurement. 

Termination of the plateau at a sufficiently high overpotential. The potential at which a consecutive electrode reaction sets in (e.g., hydrogen evolution in cathodic reactions) is determined by the composition of the electrolyte (specifically, the pH) and by the nature and state of the electrode surface (hydrogen overpotential). The reduction of ferricyanide in alkaline solution on nickel also provides a better-defined plateau in this respect than the deposition of copper in acid solution. 

Water and 0H ions have been shown to be oxidized to form oxygen following Mechanism 6. This mechanism has been postulated in the case of Co(III) (19), and of Cu(III) ions (4). In the latter case it was shown by competition kinetics that OH radicals are the primary products of decomposition of H20 by ter valent copper in acid solution (4). 

Furthermore, qdt can be used for the simultaneous determination of cobalt, nickel, and copper in acidic ethanol solutions by monitoring the absorbance maxima (Xmax) at 510, 656, and 625 nm, and solving the simultaneous equations at each wavelength (Scheme 2) (9). In this method, thiourea is added to generate Cu(I), the reactive form of copper. At pH 6, in the absence of thiourea, nickel and cobalt can be determined without interference from copper. 

Luo Q, Babu SV. Dishing effects during chemical mechanical polishing of copper in acidic media. J Electrochem Soc 2000 147(12) 4639-4644. 

Lalitha A, Ramesh S, Rajeswari S. Surface protection of copper in acid medium by azoles and surfactants. Electrochim Acta 2005 51(1) 5. 

The experimentally determined cathodic and anodic Tafel lines for the electrodeposition of copper in acid copper sulfate solution are given in Fig. 4. Data presented in Fig. 4 can be used to evaluate the Tafel... 

Thiocyanate, nitrate, and fluoride interfere in this method for determining rhenium. Palladium and copper in acid media sparingly soluble a-furildioximates. Normally, rhenium should be separated from Mo before the determination. 

An interesting system is the methylene blue catalyzed oxidation of HS by O2 in a CSTR. Oscillation occurs over a narrow range of flow rates, and a mechanism has been proposed. Oscillations have also been found in the cobalt/bromide catalyzed oxidation of cyclohexanone by O2 in the electrochemical oxidation of HCHO and HCOOH/HCOO , and in the electrodissolution of copper in acidic chloride solution, and the anodic dissolution of nickel in aqueous sulfuric acid. °° Damped oscillations are predicted for reactions in stirred diaphragm cells. ... 

Copper in acid, oxidizing environment 18Cr8Ni stainless steel in 6% Feds solution... 

Scendo M, Uznanska J (2011) The effect of ionic liquids on the corrosion inhibition of copper in acidic chloride solutions. Int J Corros. doi I0.II55/20II/7I8626... 

Smyrl, W. H., "Digital Faradaic Impedence Measurements on Corroding Copper in Acid Solutions, Electrochemical Corrosion Testing, ASTM STP 727, 1981, pp. 198-214. 

Gabrielli C, Keddam M, Minouflet-Laurent F, Perrot H (2000) Simultaneous EQCM and ring-disk measurements in AC regime. Application to copper dissolution. Electrochem Solid State Lett 3(9) 418-421 Itagaki M, Kadowaki J, Watanabe K (2000) Analysis of active dissolution of copper in acidic solution by EQCM/... 

Lu D, Tanaka K. (1997) Cu + Au alloy particles formed in the underpotential deposition region of copper in acid solutions. JElectroanal Chem 430 69—76. 

Party RW, DuBois LW (1952) Citrate complexes of copper in acid solutions. J Am Chem Soc 74 3749-3753... 

Nickel, cobalt, zinc, copper in acid leach Various organic chelating agents... 

Burke, L. D. Shama, R. AC impedance investigation of copper in acid solution. 11. Effect of bath additives on copper electrodeposition. J. Electrochem. Soc. 2008, 155, D285-D297. 

The corrosion inhibition effect of a number of complexes, [Cu(S2CNR2)2l (R = Et R2 = C4HgO, C5H10), on copper in acids have been measured by weight loss and polarization studies. A layer of the dithiocarbamate complex is seen at the metal surface, its insoluble nature being responsible for the observed corrosion inhibition (1792). 

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