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Solution processing importance

Vinyl ethers are prepared in a solution process at 150—200°C with alkaH metal hydroxide catalysts (32—34), although a vapor-phase process has been reported (35). A wide variety of vinyl ethers are produced commercially. Vinyl acetate has been manufactured from acetic acid and acetylene in a vapor-phase process using zinc acetate catalyst (36,37), but ethylene is the currently preferred raw material. Vinyl derivatives of amines, amides, and mercaptans can be made similarly. A/-Vinyl-2-pyrroHdinone is a commercially important monomer prepared by vinylation of 2-pyrroHdinone using a base catalyst. [Pg.374]

In the early 1990s, solution processes acquired new importance because of their shorter residence times and abiUty to accommodate metallocene catalysts. Many heterogeneous multicenter Ziegler catalysts produce superior LLDPE resins with a better branching uniformity if the catalyst residence time in a reactor is short. Solution processes usually operate at residence times of around 5—10 min or less and are ideal for this catalyst behavior. Solution processes, both in heavy solvents and in the polymer melt, are inherently suitable to accommodate soluble metallocene catalysts (52). For this reason, these processes were the first to employ metallocene catalysts for LLDPE and VLDPE manufacture. [Pg.400]

Solution processes are used mainly for coating, film casting and fibre spinning, i.e. in processes where the distance the solvent has to diffuse out of the solution once coated, cast or spun is short. Regulation of this diffusion process is important if products of even quality are to be obtained. [Pg.181]

It is clear that nonconfigurational factors are of great importance in the formation of solid and liquid metal solutions. Leaving aside the problem of magnetic contributions, the vibrational contributions are not understood in such a way that they may be embodied in a statistical treatment of metallic solutions. It would be helpful to have measurements both of ACP and A a. (where a is the thermal expansion coefficient) for the solution process as a function of temperature in order to have an idea of the relative importance of changes in the harmonic and the anharmonic terms in the potential energy of the lattice. [Pg.134]

Certain other metal ions also exhibit catalysis in aqueous solution. Two important criteria are rate of ligand exchange and the acidity of the metal hydrate. Metal hydrates that are too acidic lead to hydrolysis of the silyl enol ether, whereas slow exchange limits the ability of catalysis to compete with other processes. Indium(III) chloride is a borderline catalysts by these criteria, but nevertheless is effective. The optimum solvent is 95 5 isopropanol-water. Under these conditions, the reaction is syn selective, suggesting a cyclic TS.63... [Pg.84]

If a substance is to be dissolved, its ions or molecules must first move apart and then force their way between the solvent molecules which interact with the solute particles. If an ionic crystal is dissolved, electrostatic interaction forces must be overcome between the ions. The higher the dielectric constant of the solvent, the more effective this process is. The solvent-solute interaction is termed ion solvation (ion hydration in aqueous solutions). The importance of this phenomenon follows from comparison of the energy changes accompanying solvation of ions and uncharged molecules for monovalent ions, the enthalpy of hydration is about 400 kJ mol-1, and equals about 12 kJ mol-1 for simple non-polar species such as argon or methane. [Pg.26]

Particularly desirable among film deposition processes are solution-based techniques, because of the relative simplicity and potential economy of these approaches. However, the covalent character of the metal chalcogenides, which provides the benefit of the desired electronic properties (e.g., high electrical mobility), represents an important barrier for solution processing. Several methods have been developed to overcome the solubility problem, including spray deposition, bath-based techniques, and electrochemical routes, each of which will be discussed in later chapters. In this chapter, a very simple dimensional reduction approach will be considered as a means of achieving a convenient solution-based route to film deposition. [Pg.78]

The advent of a new class of materials systems based on nanoscale particles dispersed or suspended in carrier and/or binders has captured the attention of the microelectronics technical community. These materials provide the opportunity to use inexpensive solution processing equipment versus expensive vacuum deposition equipment commonly used in the microelectronics manufacturing industry. Experts in the microelectronics industry have suggested that over the course of the next live years, the industry will experience a paradigm shift in manufacturing and, more importantly, will enjoy revenue streams created from never-before-seen products based on printed electronics. [Pg.379]

Many substances react in the gas phase rather than in solution. An important example is the process thought to deplete the ozone layer the reaction between gaseous ozone, O3, and chlorine radicals, high up in the stratosphere. Ultimately, the chlorine derives from volatile halocarbon compounds, such as die refrigerant Freon-12 or the methyl chloroform thinner in correction fluid. [Pg.358]

Most of the studies have been carried out in nonaqueous solution. The important processes are (A) direct metal ion (M) interaction with porphyrin and (B) metal-ion M assisted entry (transmetallation) shown schematically in (4.80). The reactions are usually slow, easily followed spectrally because of the high characteristic absorption coefficients of the complexes and free porphyrins, and attended by beautiful isosbestic points(Fig. 3.10). The free base in (4.80) is represented as H2P and is the reactive species.The mono- and di-protonated forms are unreactive. [Pg.229]

One choice of basis function, based on a quadrilateral patch, is illustrated in Figure 15.2c. In the figure the element in the fth row andyth column of the mesh is assumed to have a magnitude that varies within the patch the derivative properties may be important as well. The choice of fifix, y) is not arbitrary it is made to reflect certain mathematical qualities derived, perhaps, from prior knowledge of the general behavior of similar systems as well as properties that simplify the solution process to follow. One immediately practical constraint is that the fifix, y) must satisfy the boundary conditions. Another property is that the patches meet smoothly at the intersections this is usually obtained by continuity of fifix, y) to first and second order in the derivatives. It is also convenient in many applications to choose combinations of products of functions separately dependent on x and y, reminiscent of the analytic solution, Eq. (15.2). [Pg.256]


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See also in sourсe #XX -- [ Pg.8 , Pg.9 , Pg.10 ]




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Important processes

Solute process

Solution processability

Solution processes

Solution processing

Solutizer process

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