Big Chemical Encyclopedia

Chemical substances, components, reactions, process design ...

Articles Figures Tables About

Silicon absorption

Infrared spectra were recorded on the resist film spun onto a silicon wafer using a JASCO IR-810 spectrometer equipped with a JASCO BC-3 beam condenser or a JASCO A-3 spectrometer. In the measurements on the latter spectrometer an uncoated silicon wafer was placed in the reference beam in order to balance the silicon absorption band. The subtraction between the spectra was carried out on a built-in micro-processor attached to the IR-810 spectrometer, and the resulting difference spectrum was used to detect structural changes in the polymer molecule upon exposure. The subtraction technique was also used to balance the silicon absorption band. [Pg.402]

A final consideration for the selection of excitation wavelength in Raman spectroscopy is the efficiency of the silicon-cased charge-coupled device (CCD) detector. Due to silicon absorption, CCD detectors are prohibitively inefficient above 1000 nm. As a result, 785 nm or, more recently, 830 nm are often chosen as the excitation wavelength to fully exploit the diagnostic window while retaining an acceptable quantum efficiency detector. [Pg.394]

Solid surfaces covered by arrays (forests) of whiskers are black bodies because of multiple reflections of the photons in the labyrinth maze structure [4041]. A spectrum selectivity related to topical properties of the material is inherent in arrays of semiconductor whiskers. The transmitted part is characteristic of silicon absorption starting at a wavelength of 1.1 pm. The reflected part changes montonically. The calculated absorption was 93.0% at 1.00 pm, 86.8% at 1.34 pm, 84,5% at 1.55 pm, and 79.8 at 2.00 pm [40]. [Pg.40]

Silicon solar cells suffer from about 50% losses because the solar spectrum does not match well with silicon absorption. Photons with wavelengths longer than the band gap (for multicrystalline silicon, mSi, Eg - 1.1 eV) are wasted, whereas shorter wavelengths are absorbed but the excess energy is lost due to thermahzation of the electrons. The optimum wavelength for absorption is 1,100 nm. Effort has therefore been directed to tailor incident radiation upon the cell by using a front panel so that the optimum response is achieved. It therefore entails that both upconversion and downconversion processes are required to be apphed to modify the energies of incident photons. [Pg.223]

Figure 6.9 Primary silicon absorption line at 251.611 nm and a secondary line at 251.432 nm... Figure 6.9 Primary silicon absorption line at 251.611 nm and a secondary line at 251.432 nm...
Figure Bl.22.4. Differential IR absorption spectra from a metal-oxide silicon field-effect transistor (MOSFET) as a fiinction of gate voltage (or inversion layer density, n, which is the parameter reported in the figure). Clear peaks are seen in these spectra for the 0-1, 0-2 and 0-3 inter-electric-field subband transitions that develop for charge carriers when confined to a narrow (<100 A) region near the oxide-semiconductor interface. The inset shows a schematic representation of the attenuated total reflection (ATR) arrangement used in these experiments. These data provide an example of the use of ATR IR spectroscopy for the probing of electronic states in semiconductor surfaces [44]-... Figure Bl.22.4. Differential IR absorption spectra from a metal-oxide silicon field-effect transistor (MOSFET) as a fiinction of gate voltage (or inversion layer density, n, which is the parameter reported in the figure). Clear peaks are seen in these spectra for the 0-1, 0-2 and 0-3 inter-electric-field subband transitions that develop for charge carriers when confined to a narrow (<100 A) region near the oxide-semiconductor interface. The inset shows a schematic representation of the attenuated total reflection (ATR) arrangement used in these experiments. These data provide an example of the use of ATR IR spectroscopy for the probing of electronic states in semiconductor surfaces [44]-...
The section on Spectroscopy has been retained but with some revisions and expansion. The section includes ultraviolet-visible spectroscopy, fluorescence, infrared and Raman spectroscopy, and X-ray spectrometry. Detection limits are listed for the elements when using flame emission, flame atomic absorption, electrothermal atomic absorption, argon induction coupled plasma, and flame atomic fluorescence. Nuclear magnetic resonance embraces tables for the nuclear properties of the elements, proton chemical shifts and coupling constants, and similar material for carbon-13, boron-11, nitrogen-15, fluorine-19, silicon-19, and phosphoms-31. [Pg.1284]

Cork [61789-98-8] is an effective low cost charring ablator. In order to reduce moisture absorption and related poor performance, cork particles are often blended in a silicone or phenoHc resin. The result is a uniform ablative material in a sheet form that is easy to apply. [Pg.6]

Fig. 8. Optical properties of silicon (a) transmissivity vs wavelength, (b) shortwavelength absorption coefficient where the transmissivity increases sharply... Fig. 8. Optical properties of silicon (a) transmissivity vs wavelength, (b) shortwavelength absorption coefficient where the transmissivity increases sharply...
Silicon—Ca.rbon Thermoset. The Sycar resins of Hercules are sihcon—carbon thermosets cured through the hydrosilation of sihcon hydride and sihcon vinyl groups with a trace amount of platinum catalyst. The material is a fast-cure system (<15 min at 180°C) and shows low moisture absorption that outperforms conventional thermosets such as polyimides and epoxies. Furthermore, the Sycar material provides excellent mechanical and physical properties used in printed wiring board (PWB) laminates and encapsulants such as flow coatable or glob-top coating of chip-on-board type apphcations. [Pg.189]

The purity of cyclobutanone was checked by gas chromatography on a 3.6-m. column containing 20% silicone SE 30 on chromosorb W at 65°. The infrared spectrum (neat) shows carbonyl absorption at 1779 cm. - the proton magnetic resonance spectrum (carbon tetrachloride) shows a multiplet at 8 2.00 and a triplet at S 3.05 in the ratio 1 2. [Pg.39]

Energy Spectrometry (EDS) uses the photoelectric absorption of the X ray in a semiconductor crystal (silicon or germanium), with proportional conversion of the X-ray energy into charge through inelastic scattering of the photoelectron. The quantity of charge is measured by a sophisticated electronic circuit linked with a computer-based multichannel analyzer to collect the data. The EDS instrument is... [Pg.179]

Atomic absorption spectroscopy of VPD solutions (VPD-AAS) and instrumental neutron activation analysis (INAA) offer similar detection limits for metallic impurities with silicon substrates. The main advantage of TXRF, compared to VPD-AAS, is its multielement capability AAS is a sequential technique that requires a specific lamp to detect each element. Furthermore, the problem of blank values is of little importance with TXRF because no handling of the analytical solution is involved. On the other hand, adequately sensitive detection of sodium is possible only by using VPD-AAS. INAA is basically a bulk analysis technique, while TXRF is sensitive only to the surface. In addition, TXRF is fast, with an typical analysis time of 1000 s turn-around times for INAA are on the order of weeks. Gallium arsenide surfaces can be analyzed neither by AAS nor by INAA. [Pg.355]

NAA is a quantitative method. Quantification can be performed by comparison to standards or by computation from basic principles (parametric analysis). A certified reference material specifically for trace impurities in silicon is not currently available. Since neutron and y rays are penetrating radiations (free from absorption problems, such as those found in X-ray fluorescence), matrix matching between the sample and the comparator standard is not critical. Biological trace impurities standards (e.g., the National Institute of Standards and Technology Standard Rference Material, SRM 1572 Citrus Leaves) can be used as reference materials. For the parametric analysis many instrumental fiictors, such as the neutron flux density and the efficiency of the detector, must be well known. The activation equation can be used to determine concentrations ... [Pg.675]

Yet another alternative is the thin-film solar cell. This cannot use silicon, because the transmission of solar radiation through silicon is high enough to require relatively thick silicon layers. One current favourite is the Cu(Ga, InjSci thin-film solar cell, with an efficiency up to 17% in small experimental cells. This material has a very high light absorption and the total thickness of the active layer (on a glass substrate) is only 2 pm. [Pg.270]

In silicone adhesives used to bond structural glazing assemblies, the silicone network is made of very long PDMS chains and is filled with silica that improves the elastomeric properties of the adhesive. The strength of such an adhesive is strongly enhanced through various mechanisms of energy absorption. [Pg.694]

Absorptivity.-emissivity ratio Alkyd silicone Thermal control coating... [Pg.119]

Silicones Highest heat resistance, low water absorption, excellent dielectric properties, high arc resistance Compression molding, injection molding, encapsulation... [Pg.440]

Figure 8-3 is explained as follows. With an increasing content of alumina, the intensity of silicon Ka decreases progressively below the value to be expected from Equation 7-1. The deviation is a negative absorption effect that can be calculated according to Equation 7-6. The intensity of aluminum Ka, on the other hand, behaves quite differently as the silica content increases. This intensity then increases... [Pg.223]

Silica-alumina system, absorption and enhancement effects in x-ray emission spectrography, 222-224 Silicon, /as analyzing crystal, 318-327 determination by x-iay emission spectrography, 67, 219, 222-224, 260, 261, 329... [Pg.352]

The thickness of a photovoltaic cell is chosen on the basis of its ability to absorb sunlight, which in turn depends on the bandgap and absorption coefficient of the semiconductor. For instance, 5 nm of crystalline silicon are required to absorb the same amount of sunlight as 0.1 nm of amorphous silicon and 0.01 nm of copper-indium diselenide. Only MBE and MOCVD are capable of producing such extremely thin films.i l... [Pg.393]


See other pages where Silicon absorption is mentioned: [Pg.241]    [Pg.88]    [Pg.185]    [Pg.190]    [Pg.482]    [Pg.547]    [Pg.1453]    [Pg.241]    [Pg.88]    [Pg.185]    [Pg.190]    [Pg.482]    [Pg.547]    [Pg.1453]    [Pg.1780]    [Pg.186]    [Pg.435]    [Pg.471]    [Pg.471]    [Pg.532]    [Pg.532]    [Pg.1219]    [Pg.66]    [Pg.125]    [Pg.202]    [Pg.214]    [Pg.251]    [Pg.173]    [Pg.236]    [Pg.693]    [Pg.694]    [Pg.1262]    [Pg.223]    [Pg.224]    [Pg.116]    [Pg.134]   
See also in sourсe #XX -- [ Pg.369 ]

See also in sourсe #XX -- [ Pg.399 ]




SEARCH



Absorption bands silicon-oxygen complexes

Absorption spectrum, silicon wafer with

Silicon absorption coefficient

© 2024 chempedia.info