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Resist chemical basis

The insect s choice of food may be governed to a considerable extent, as ours is, by attractants and repellents. In many instances, the actual insecticidal action of plant extractives may be due primarily to an artificially high level of application, while, in fact, the parent plants are only repellent in the field. This repellency may appear to be resistance on the part of the plant, and the chemistry of such resistance factors has begun to receive much-needed attention. For example, Smissman and his coworkers have examined the chemical basis for the inherited resistance of some strains of corn to attack by the European corn borer. 6-Methoxybenzoxazolinone (X) was isolated (2, SO) and shown to be one of the principal resistance factors, and a number of synthetic analogs were found to... [Pg.12]

Adhesives for integrated circuits, requirements, 14 AgCl-As2S3, 172 Ag2Se-GejSei., resists development of latent image, 174 anisotropic wet chemical etching, 177/ chemical basis, 174... [Pg.356]

I. Kubo and K. Nakanishi, Insect antifeedants and repellents from African plants, in ACS Symposium Series 62, The Chemical Basis for Host Plant Resistance to Pest (P. A. Hedin, ed), American Chemical Society, Washington, (1977) 165-178. [Pg.247]

Depending on their chemical basis and the resulting thermosetting crosslinkage ratio, the adhesive layers are thermally resistant and thus perfectly suitable for transmission and engine manufacturing. If repair is required, the bonded joints can be removed by heating them to approximately 120-150 °C. [Pg.38]

The chemical basis of this time period may not be uniform for all of the type b metals. For mercury(II) it appears to be related to the occurrence of a minimum amount of what is literally the destruction of tissue and proteins. In the case of cadmium it appears to have a different basis at least in part. Subsequent to the injection of an otherwise lethal dose of a cadmium compound there is a relatively short period when it can be complexed and removed and the animal saved. As the interval between the cadmium injection and that of the antidote (e.g. CaEDTA or CaDTPA) increases, the cadmium becomes more and more difficult to mobilize and a point is soon reached where the antidote is without effect ( 5). In the same fashion, aged cadmium deposits are apparently resistant to mobilization by EDTA ). [Pg.336]

In the present world, the interest to oxygen-free refractory inorganic materials is growing with respect to the fact that it becomes the basis for various materials. The scientific interest is first related to the nitrides and carbonitrides with a number of unique properties such as high refractoriness, thermal resistance, chemical environment resistance, relatively low density, and so on. [Pg.229]

Dreyer, D. L. and B. C. Campbell, Chemical basis of host-plant resistance to aphids. Plant Cell Environ., 10, 353-361 (1987). [Pg.270]

Woodhead, S. and Bernays, E. A. (1978) The chemical basis for resistance of Sorghum bicolor to attack by Locusta migratoria. Ent. exp. appl. 24, 123-44. [Pg.201]

To elucidate the chemical basis of host resistance against Dutch elm disease, FT-IR microspectroscopy (single-point measurements) was performed [195]. Spectra of resistant elm seedlings showed increased formation of lignin and suberin after inoculation with the pathogenic fungus Opiostoma novo-ulmi. [Pg.281]

Fig. 18. Chemistry of PTBOCST chemically amplified resist. Pattemwise exposure creates small quantities of acid. In a subsequent heating step, pendant TBOC groups are cleaved under acid catalysis. The exposed and unexposed areas can then be differentiated on the basis of solubiUty. Fig. 18. Chemistry of PTBOCST chemically amplified resist. Pattemwise exposure creates small quantities of acid. In a subsequent heating step, pendant TBOC groups are cleaved under acid catalysis. The exposed and unexposed areas can then be differentiated on the basis of solubiUty.
Acid-C t lyzed Chemistry. Acid-catalyzed reactions form the basis for essentially all chemically amplified resist systems for microlithography appHcations (61). These reactions can be generally classified as either cross-linking (photopolymerization) or deprotection reactions. The latter are used to unmask acidic functionality such as phenohc or pendent carboxyhc acid groups, and thus lend themselves to positive tone resist apphcations. Acid-catalyzed polymer cross-linking and photopolymerization reactions, on the other hand, find appHcation in negative tone resist systems. Representative examples of each type of chemistry are Hsted below. [Pg.125]

Gold [7440-57-5] Au, is presumably the first metal known and used by humans. It occurs ia nature as a highly pure metal and is treasured because of its color, its extraordinary ductility, and its resistance to corrosion. Early uses ia medicine and dentistry date to the ancient Chinese and Egyptians. In the Middle Ages the demand for gold led to the iatense, unsuccesshil efforts of alchemists to convert base metals iato gold. These pursuits became the basis for chemical science. The search for gold has been an important factor ia world exploration and the development of world trade. [Pg.377]

Synthetic Marble. Synthetic marble-like resin products are prepared by casting or molding a highly filled monomer mixture or monomer—polymer symp. When only one smooth surface is required, a continuous casting process using only one endless stainless steel belt can be used (52,53). Typically on the order of 60 wt % inorganic filler is used. The inorganic fillers, such as aluminum hydroxide, calcium carbonate, etc, are selected on the basis of cost, and such properties as the translucence, chemical and water resistance, and ease of subsequent fabrication (54,55). [Pg.265]

Processing ndProperties. Neoprene has a variety of uses, both in latex and dry mbber form. The uses of the latex for dipping and coating have already been indicated. The dry mbber can be handled in the usual equipment, ie, mbber mills and Banbury mixers, to prepare various compounds. In addition to its excellent solvent resistance, polychloroprene is also much more resistant to oxidation or ozone attack than natural mbber. It is also more resistant to chemicals and has the additional property of flame resistance from the chlorine atoms. It exhibits good resiUence at room temperature, but has poor low temperature properties (crystallization). An interesting feature is its high density (1.23) resulting from the presence of chlorine in the chain this increases the price on a volume basis. [Pg.470]

Resistance to Chemical Attack. The resistance to alkah and acid attack is evaluated on the basis of loss in weight, loss in gloss, or reduced cleanabihty of the surface. [Pg.218]


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See also in sourсe #XX -- [ Pg.326 ]




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Resistance chemical basis

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