Poly styrene-co-

As an indication of the changes in deformation modes that can be produced in ionomers by increase of ion content, consider poly(styrene-co-sodium methacrylate). In ionomers of low ion content, the only observed deformation mode in strained thin films cast from tetra hydrofuran (THF), a nonpolar solvent, is localized crazing. But for ion contents near to or above the critical value of about 6 mol%, both crazing and shear deformation bands have been observed. This is demonstrated in the transmission electron microscope (TEM) scan of Fig. 3 for an ionomer of 8.2 mol% ion content. Somewhat similar deformation patterns have also been observed in a Na-SPS ionomer having an ion content of 7.5 mol%. Clearly, in both of these ionomers, the presence of a... 

Figure 3 TEM micrograph of a deformed thin film of an 8.2 mol% poly(styrene-co-sodium methacrylate) ionomer cast from THE.

Different polymer-nano-ZnO hybrid systems based on epoxyl2 [42], poly(styrene-co-acrylic acid) [43], polyurethane [44], etc. have been reported by several other researchers. 

Maleimides Alkyl and aryl maleimides in small concentrations, e.g., 5-10 wt% significantly enhance yield of cross-link for y-irradiated (in vacuo) NR, cw-l,4-polyisoprene, poly(styrene-co-butadiene) rubber, and polychloroprene rubber. A-phenyhnaleimide and m-phenylene dimaleimide have been found to be most effective. The solubihty of the maleimides in the polymer matrix, reactivity of the double bond and the influence of substituent groups also affect the cross-fink promoting ability of these promoters [82]. The mechanism for the cross-link promotion of maleimides is considered to be the copolymerization of the rubber via its unsaturations with the maleimide molecules initiated by radicals and, in particular, by allyfic radicals produced during the radiolysis of the elastomer. Maleimides have also been found to increase the rate of cross-linking in saturated polymers like PE and poly vinylacetate [33]. 

Anandhan, S., De, P.P., Bhowmick, A.K., Bandyopadhyay, S., and De, S.K., Thermoplastic elastomeric blend of nitrile rubber and poly(styrene-co-acrylonitrile). n. Replacement of nitrile rubber by its vulcanizate powder, J. Appl. Polym. Set, 90, 2348, 2003. 

FIG. 20-92 SEM image of a poly(styrene-co-divinylbenzene) gigaporous particle synthesized from suspension polymerization and schematic of a gigaporous particle showing through-pores and diffusion pores [Gu et al., China Partic-uology, 3, 349 (2005)]. 

Chromatography by ion exchange on a sulfonated poly(styrene-co-divinyl benzene) phase has been proposed as a replacement for titrimetry.57 Eluted by a dilute solution of a neutral salt such as sodium ethanesulfonate, the conductance of the protons can be measured in the absence of a suppressor from sub-millimolar to molar concentration. The response factors of mono-, di-, and trichloroacetic acid and of o-phthalic acid were large and essentially equivalent to ethanesulfonic acid, while the response factor of acetic acid was far smaller. A syringe pump has generated pressures as high as 72,000 psi (5000 bar) in a capillary column packed with 1 p particles, generating a fraction capacity of 300 peaks in 30 minutes.58... 

A mixed-mode method called liquid chromatography under limited conditions of adsorption has been described and applied to analyzing co-polymer composition of poly(styrene)-co-(methylmethacrylate).41 The polymer, dissolved in a good solvent, was injected onto a GPC column and eluted with a poor solvent. The polymer partially adsorbed to the column, allowing the plug of injection solvent to catch up with the adsorbed polymer and desorb it. 

Bruder and Brenn (1992) studied the spinodal decomposition in thin films of a blend of deuterated polystyrene (dPS) and poly(styrene-co-4-bromostyrene) (PBrxS) by TOF-ERDA. They examined the effect of different substrates on the decomposition process. In one series of experiments, a solution of the polymers in toluene was spread on a silicon wafer to form a film of thickness 550 nm which was then heated in vacuum at 180°C for various times. 

The same authors proposed an alternative methods for obtaining soluble poly(/i-vinylborazine) homopolymers and poly(styrene-co-B-vinylborazine) copolymers 28 In fact, gentle polymerization conditions in solution at 80°C using Azobisisobutyronitrile (AIBN) (1.6 mol%) as an initiator provided soluble homopolymers. The polymer displays typical Mw and Mn values of —18,000 and 11,000, respectively, whereas an increase in the AIBN concentration results in a decrease in the molecular weight, contrary to what is usually observed in free-radical polymerization. 

The copolymers were obtained following this method by exploiting the similarity of 5-vinylborazine and styrene. Several poly(styrene-co-B-vinylborazine) copolymers soluble in ethers were formed in solution at 80°C using AIBN.28... 

Virklund, C., Nordstrom, A., Irgum, K. (2001). Preparation of porous poly(styrene-co-divinylbenzene) Monoliths with controlled pore size distributions initiated by stable free radicals and their pore surface functionalization by grafting. Macromolecules 34, 4361-... 

A combination of TEMPO living free radical (LFRP) and anionic polymerization was used for the synthesis of block-graft, block-brush, and graft-block-graft copolymers of styrene and isoprene [201]. The block-graft copolymers were synthesized by preparing a PS-fo-poly(styrene-co-p-chloromethylstyrene) by LFRP [Scheme 110 (1)], and the subsequent re-... 

Attractive interactions are also the reason for the self-assembly of PS-fo-PB-fo-PMMA at the interface of poly(styrene-co-acrylonitrile), SAN, and poly(2,6-dimethylphenylene ether), PPE. In this blend, PS and PPE are miscible on one side and PMMA and SAN are miscible on the other one, with negative / parameters. This blend, in which the rubbery domain is located at the interface between SAN/PMMA and PPE/PS, was originally prepared by coprecipitation of all components from a common solution [195]. From a processing point of view, in this system the difficulty was to get the dispersion of PPE in SAN via melt mixing of SAN, PPE and the triblock terpolymer. 

A method for microwave-assisted transesterifications has been described by Van-den Eynde and Rutot [73], The authors investigated the microwave-mediated deriva-tization of poly(styrene-co-allyl alcohol) as a key step in the polymer-assisted synthesis of heterocycles. Several /i-ketoesters were employed in this procedure and multigram quantities of products were obtained when neat mixtures of the reagents in open vessels were subjected to microwave irradiation utilizing a domestic micro-wave oven (Scheme 7.65). The successful derivatization of the polymer was confirmed by IR, 1H NMR, and 13C NMR spectroscopic analyses. The soluble supports... 

It should be noted that the Hantzsch-1,4-DHP synthesis can be conducted with a soluble polymer. Successful derivatization of poly(styrene-co-allyl alcohol) under the action of microwave irradiation with a variety of ethyl oxopropanoates and ethyl 3-aminobut-2-enoates were reported by Vanden Eynde s group [27]. 

Scheme 12.18 Derivatization of poly(styrene-co-allyl alcohol) with R = Me, Ph, OEt /7-dicarbonyl compounds.

In figure 1 we present the experimental and calculated mK values of the copolymer poly(styrene-co-p-bromostyrene). From this study (3) we were able to show unequivocally that the tacticity of this polystyrene sample is pr — 0.55, where pr is the probability of racemic dyad replication. 

Polystyrene-co-butylacrylate, 7 608t Poly (styrene-co-divinylbenzene), 73 113 Poly(styrene-co-vinylpyridinium methyl iodide) ionomer system, 74 480 Poly(styrenedivinylbenzene) (PSDVB) liquid chromatography stationary phase, 4 623... 

A photosensitive composition, consisting of an aromatic azide compound (4,4 -diazidodi-phenyl methane) and a resin matrix (poly (styrene-co-maleic acid half ester)), has been developed and evaluated as a negative deep UV resist for high resolution KrF excimer laser lithography. Solubility of this resist in aqueous alkaline developer decreases upon exposure to KrF excimer laser irradiation. The alkaline developer removes the unexposed areas of this resist. 

The photosensitive azide compound was 4,4 -diazidodiphenyl methane (m.p. 44.0 t). The poly(styrene-co-maleic acid half ester) was used as a resin matrix. 

Figure 1. Chemical structures of (a) 4,4 -diazidodi-phenyl methane and (b) poly(styrene-co-maleic acid half ester).

A negative deep UV resist, consisting of a photosensitive 4,4 -diazidodiphenyl methane and a poly-(styrene-co-maleic acid half ester) resin, has been found to meet the requirements needed for KrF excimer laser lithography. 

Fig. 1 Chemical structures of the polymers commonly used for preparation of beads poly (styrene-co-maleic acid) (=PS-MA) poly(methyl methacrylate-co-methacrylic acid) (=PMMA-MA) poly(acrylonitrile-co-acrylic acid) (=PAN-AA) polyvinylchloride (=PVC) polysulfone (=PSulf) ethylcellulose (=EC) cellulose acetate (=CAc) polyacrylamide (=PAAm) poly(sty-rene-Wocfc-vinylpyrrolidone) (=PS-PVP) and Organically modified silica (=Ormosil). PS-MA is commercially available as an anhydride and negative charges on the bead surface are generated during preparation of the beads...

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