Photosensitive Compositions

Electroless plating on metal substrates can be improved by addition of pentaerythritol, either to a photosensitive composition of a noble metal salt (99), or with glycerine to nickel plating solutions (100). Both resolution and covering power of the electrolyte are improved. 

PyrogaUol has been cited for use in photosensitive compositions. It is used in the form of sulfonate esters of quinonediazides which hydrolyze when exposed to actinic light to Hberate the acid which, in turn, catalyzes further reaction of novolak resins (60). 

A photosensitive composition, consisting of an aromatic azide compound (4,4 -diazidodi-phenyl methane) and a resin matrix (poly (styrene-co-maleic acid half ester)), has been developed and evaluated as a negative deep UV resist for high resolution KrF excimer laser lithography. Solubility of this resist in aqueous alkaline developer decreases upon exposure to KrF excimer laser irradiation. The alkaline developer removes the unexposed areas of this resist. 

The principles of photolithography are as follows Onto the surface of a semiconductor is spread a thin film of a photosensitive composition that consists of several chemicals. This composition is called photoresist and it is characterized by the effect that it changes its solubility upon irradiation. Thus, when the thin film is irradiated through a mask, the structure of this mask is projected onto the film which changes its solubility at the exposed segments. If the photoresist con-... 

Observations Photosensitive compositions containing polybenzoxazole precursors are... 

High-performance polyimide-positive photosensitive heat resistance resins, (id, were prepared by Yamanaka et al. (3) and used in photosensitive compositions. 

Wada et al. (6) prepared positive-resist acetal photosensitive compositions, (VI), having an Mn < 3000 Da, which were used in pattern-forming processes. 

TABLE 1. Image Quality Testing Results of Negative Working Photosensitive Compositions after Storage Stability Testing"... 

Additional negative photosensitive compositions, (I) and (II), were prepared by Hayashi et al. (1) that had excellent image quality and storage stability properties. 

Photochemical preparation of stable dyes by irradiation of aminotriarylacetonitriles Photosensitive leucocyanide compositions Photoactivation of leucocyanides Solid photosensitive compositions Purification of triarylrnethane leucocyanides Fuchsine cyanide... 

U.S. Patent 3,390,996 Photosensitive composition comprising an organic nitrogen-containing color-generator, a photo-oxidant and a redox couple A. 

Preparation of papers coated on both sides with photosensitive composition. 

Title Positive Photosensitive Composition and Pattern-Forming Method Using the Same... 

When an emitting light at a wavelength of 200 nm is used as the light source, a satisfactory pattern cannot be formed using photosensitive compositions containing aromatic substituents. To address this concern, non-aromatic photosensitive polymeric compositions containing diamantane have been prepared. 

By competitive methods Ishikawa and Noyes (226) (sensitized biacetyl phosphorescence) and Cundall and Davies (159) (butene-2 isomerization) both estimated the triplet lifetime to be of the order of 10 ys. In a reexamination of the butene-2 system, Lee (227) estimated a value of 100 ys, a finding confirmed by Cundall and Dunnicliff (105). An examination of the kinetics of the benzene photosensitized composition of cyclopentanone decomposition allowed a value of longer than 3 ys to be deduced. This type of experiment is far from satisfactory since photochemical processes can Intervene at low pressures, and impurities and the quenching effects of photoproducts can affect the results. These problems can only be overcome by some form of direct measurement. Parmenter and Ring (228) used a flash method in which 20 torrs of benzene and 0.01 torr of biacetyl were submitted to a 20 J,... 

Solvent-soluble PI types are needed for this application. For such PI resins special components, are reported, which are sinnmarized in Table 15.9. Diamines are shown in Figure 15.9 and dianyhdrides are shown in Figure 15.10. Such solvent-soluble Pis are used in photosensitive compositions. They are dissolved in a suitable solvent, e.g., ethyl lactate and... 

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