PnBMA

Fig. 12 Surface expression of block segments in block copolymer gradient libraries after treatment to two solvents. See text for details a illustration of surface expression of PnBMA black) and PDMAEMA blue) block copolymer brush segments after water and hexane treatments b water contact angle data from three PnBMA-b-PDMAEMA block copolymer gradient libraries after hexane filled symbols) and water open symbols) treatments. (Derived from [58] with permission)...

Figure 15. Influence of the Polyester Yellow dye film absorbance and polymer binder material on the marking threshold energy. PnBMA = poly(n-butyl methacrylate) PiBMA = poly(isobutyl methacrylate) PS = polystyrene PsBMA = poly (sec-butyl methacrylate) PVB = polyvinylbutyl PMMA = polymethyl methacrylate PVAC = polyvinylacetate, S-iBMA = poly(styrene-co-isobutyl methacrylate), PC = polycarbonate S-AN — poly(styrene-co-...

Although an accessible temperature range is restricted by complication of subphase water evaporation, there have been some reports on temperature-dependent investigations with homopolymers. Yoo and Yu [105] studied PVAc and poly( -butyl methacrylate)(P BMA) as the prototype of good solvent and poor solvent cases. Both were over a range of 15 °C, 10-25 °C and 15-30 °C respectively, and PnBMA required the inclusion of // assum-... 

For demonstration, the SEC behavior of different polymethacrylates is given in Fig. 6. On silica gel as the stationary phase and methyl ethyl ketone as the eluent, all polymethacrylates elute in the SEC mode. The calibration curves of elution volume vs. molar mass for poly(methyl methacrylate) (PMMA), poly(ferf-butyl methacrylate) (PtBMA), poly( -butyl methacrylate) (PnBMA) and po-ly(decyl methacrylate) (PDMA) reflect the inability of the system to separate dif-... 

The authors reported the investigation of random copolymers of styrene and -butyl methacrylate, containing the parent homopolymers PS and PnBMA. While in SEC 1 fractions of different molecular size were obtained, a separation with respect to chemical composition into fractions of PnBMA, P(St/nBMA) and PS could be achieved in SEC 2, the elution order being PnBMAsynergistic effect of different separation mechanisms including size exclusion, adsorption and partition. 

This paper reviews the application of IGC in determining interaction parameters for three polymer blend systems polystyrene-poly(n-butyl methacrylate) (PS-PnBMA), polystyrene-poly(2,6-dimethyl-1,4-phenylene oxide) (PS-PPO), and poly(vinylidene fluoride)-poly(methyl methacrylate) (PVF2-PMMA)... 

Materials. All solutes were chromatographic quality or reagent grade and were used without further purification. The polystyrene samples (PS Mw = 110,000, Mw/Mn <1.06 PSl Mn = 1709, Mw/Mn <1.06) were obtained from Polysciences and Pressure Chemical Co., respectively. Poly(n-butyl methacrylate) (PnBMA ... 

TABLE I. Polymer-Polymer Interaction Parameters (X23 ) for Various PSL-PnBMA Blends at 140°C... 

The JG and the a-Relaxations of Poly(n-butyl methacrylate) in Poly(n-butyl-methacrylate-stat-styrene) Random Copolymers. The copolymers of poly(n-butyl methacrylate) (PwBMA) and polystyrene (PS) is one example [338,339]. Here PnBMA is the lower Tg component A. Neat PnBMA has n = 0.47 and a JG relaxation. On increasing the styrene content from 0 to 66 mol% in the copolymer, a monotonic increase of nA of the PnBMA component leads to a concomitant increase in the separation of the JG relaxation from the segmental relaxation, both of the PwBMA component. This changes were observed in the dielectric relaxation experiment. 

Several different types of block copolymers have been synthesized using RAFT methodologies. A difunctional ABA block copolymer of pnBMA and pMMA with Mn=112,200 and Mw/Mn=1.14 was prepared using a dithiobenzoate-based transfer agent [53]. Moad et al. [53] and Mayadunne et al. [54, 85] showed the versatility of RAFT by combining MMA or nBMA with St, M A with ethyl acrylate [53], and St with nBA, for block copolymers in an ABA fashion using a new transfer agent based on a trithiocarbonate structure (Fig.30) [85]. They illustrat-... 

Figure 2. Conflict requirement between the sensitivity and dryetching durability in positive electron resists based on methacrylate polymers. Sputter etching rates were measured under the same conditions using CF, gas. Key 1, poly(p-methoxypheny1 methacrylate) 2, poly(phenyI methacrylate) (PPhMA) 3, poly(3-phenylpropyl meyhacrylate) 4, poly(benzyl methacrylate) 5, poly(p-methoxybenzyl methacrylate) 6, poly(p-fluorophenyl methacrylate 7, poly(trichloropheny1 methacrylate) 8, poly(methyl methacrylate) (PMMA) 9, poly(tert-buty1 methacrylate) 10, poly(ethyl methacrylate) 11, poly(isobutyl methacrylate) 12, poly(n-butyl methacrylate) (PnBMA) 13, poly(dimethyltetrafluoro methacrylate) (FPM) 14, poly(trichloromethyl methacrylate) (EBR-1) and 15, poly(hexafluorobutyl methacrylate) (FBM).

Among the poly(n-alkyl methacrylate)s, the most studied ones are PMMA (poly-(methyl methacrylate)) [40, 50-51,102-104], PEMA (poly(ediyl methacrylate)) [40, 50-51,103-108] and PnBMA (poly(n-butyl methacrylate)) [40, 51, 103-106, 109], mainly by DRS and NMR (studies previous to 1965 have been reviewed in [2]). The development of the NMR technique and the increase of the frequency window in DRS brought new insights into the molecular dynamics of these materials (see [110] for details and references therein). 

The activation energy of 38 kJ mof was also foimd for the series PMMA, PEMA and PnBMA in ongoing studies in MD research group, in the... 

As host polymer matrices we used poly(alkyl methacrylate)s with various ester groups (methyl PMMA, ethyl PEMA, isopropyl PiPMA, normalpropyl PnPMA, isobutyl PiBMi normjdbutyl PnBMA), poly(methyl acrylate), polyethylene (PE), poly(vinyl chloride) (PVQ, poly(vinylidene chloride) (PVDQ, j lyfvinyl alcohol) (PVOH), polystyrene (PS), polycarbonate (PQ, phenolphthalein polyedier-ketone (PEK-Q, and phenolphthalein polyether-sulfone (PES-C). 

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