Plasma chemistry/technology

H. V. Boenig, A., Advances in Eow-Temperature Plasma Chemistry, Technology, Applications, Vol. 1—4, Technomic Publishing Co., Lancaster, Pa., 1984,... 

Boenig FI V 1988 Fundamentals of Plasma Chemistry and Technology (Lanoester, PA Teohnomio)... 

Born in London, Paul May grew up in Redditch, Worcestershire. He went on to study at Bristol University, where he graduated with a first class honours in chemistry in 1985. He then joined GEC Hirst Research Centre in Wembley where he worked on semiconductor processing for three years, before returning to Bristol to study for a PhD in plasma etching of semiconductors. His PhD was awarded in 1991, and he then remained at Bristol to co-found the CVD diamond research group. In 1992 he was awarded a Ramsay Memorial Fellowship to continue the diamond work, and after that a Royal Society University Fellowship. In October 1999 he became a full-time lecturer in the School of Chemistry at Bristol. He is currently 36 years old. His scientific interests include diamond films, plasma chemistry, interstellar space dust, the internet and web technology. His recreational interests include table-tennis, science fiction, and heavy metal music. 

Galkin, N.P. (1961), Chemistry and Technology of Fluorine-Compounds of Uranium, Gos-Atom-Izdat, Moscow. Gallagher, M.J., Friedman, G., Dolgopolsky, A., Gutsol, A., Fridman, A. (2005), 17th Int. Symposium on Plasma Chemistry (ISPC-17), p. 1056, Toronto, Canada. 

As a result of the increased interest in low-pressure plasma science, researchers and engineers ate faced with the problem of evaluating the broad and varied literatine from a common basis of fundamental plasma chemistry. The book that you hold in yom hands meets this challenge This book represents the first comprehensive contribuhon that presents the fundamentals of plasma chemistry and the scientific basis of most modern applications of plasma technologies. This book is written by n dishnguished colleague and friend,... 

Venugopalan, M. Internal. Workshop on Plasma Chemistry in Technology, Ashkelon, Israel, Apr. 1981... 

Present Status and Future Trends in Plasma Chemistry and Arc Technology, NSF Workshop (Oskam, H., Pfender, E., ed.), Univ. Minnesota, Minneapolis, 1980... 

Yan, H.J., Guo, W.Y, 1989. A study on change of fiber structure caused by plasma action. In Proceedings of the Fourth Annual International Conference of Plasma Chemistry and Technology, pp. 181-188. 

Chemical vapor deposition is a synthesis process in which the chemical constituents react in the vapor phase near or on a heated substrate to form a solid deposit. The CVD technology combines several scientific and engineering disciplines including thermodynamics, plasma physics, kinetics, fluid dynamics, and of course chemistry. In this chapter, the fundamental aspects of these disciplines and their relationship will be examined as they relate to CVD. 

A. A. Howling, J.-L. Dorier, and C. Hollenstein, App/. Phys. Lett. 62, 1341 (1993). A. Bouchoule, Ed., Dusty Plasmas Physics. Chemistry, and Technological Impact in Plasma Processing. Wiley, New York, 1999. 

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