Plasma technologies plasmas

CAD software packages [COMPUTER-AIDED DESIGN AND MANUFACTURING(CAD/CAM)] (Vol7) -use of plasma technology [PLASMA TECFINOLOGY] (Vol 19)... 

In plasma chemical vapor deposition (PCVD), the starting materials are typically SiCl, O2, 2 6 GeCl (see Plasma technology). Plasma chemical vapor deposition is similar to MCVD in that the reactants are carried into a hoUow siUca tube, but PCVD uses a moving microwave cavity rather than a torch. The plasma formed inside the microwave cavity results in the deposition of a compact glass layer along the inner wall of the tube. The temperatures involved in PCVD are lower than those in MCVD, and no oxide soots are formed. Also, the PCVD method is not affected by the heat capacities or thermal conductivities of the deposits. 

Flatpanels in plasma technology (Plasma-Display-Panel, PDP) Filling gas... 

Downstream region (plasma technology) Plasma outside the plasma generation region. See Remote plasma source Afterglow region. 

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