Nanoscale patterning

V. LANGMUIR-BLODGETT FILMS WITH NANOSCALE PATTERNS... 

McAlpine, M. C. Friedman, R. S. Lieber, C. M. 2005. High-performance nanowire electronics and photonics and nanoscale patterning on flexible plastic substrates. Proc. IEEE 93 1357-1363. 

Loo, Y. L. Willett, R. L. Baldwin, K. W. Rogers, J. A. 2002. Additive, nanoscale patterning of metal films with a stamp and a surface chemistry mediated transfer process Applications in plastic electronics. Appl. Phys. Lett. 81 562-564. 

J. W. Lyding, T.-C. Shen, J. S. Hubacek, J. R. Tucker and G. C. Abeln, Nanoscale patterning and oxidation of H-passivated Si(100)-2 x 1 surfaces with an ultrahigh vacuum scanning tunneling microscope, Appl. Phys. Lett. 64, 2010 (1994). 

Yoder, N. C., Kalsani, V., Schuy, S., et al. (2007) Nanoscale patterning in mixed fluorocarbon-hydrocarbon phospholipid bilayers. Journal of the American Chemical Society, 129(29), 9037-9043. 

With such a UV-curable nanoimprint resist, both micro- and nanoscale patterns can be easily achieved at room temperature and at a pressure of less than 0.1 MPa by using a conventional contact exposure tool. In Fig. 7A, recessed hole pattern of 20 pm in diameter and protruded pillar pattern of 1 pm in diameter... 

McClelland, G.M. Hart, M.W. Rettner, C.T. Best, M.E. Carter, K.R. Terris, B.D. Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold. Appl. Phys. Lett. 2002, 81 (8), 1483-1485. 

Niwa D, Omichi K, Motohashi N, Homma T, Osaka T (2004) Formation of micro and nanoscale patterns of monolayer templates for position selective immobilization of oligonucleotide using ultraviolet and electron beam lithography. Chem Lett 33 176-177... 

Tschierske, C., Liquid crystal engineering - new complex mesophase structures and their relations to polymer morphologies, nanoscale patterning and crystal engineering , Chem. Soc. Rev. 2007, 36, 1930-1970. 

While NIL and S-FIL have been shown to be effective tools for creating nanoscale patterns, it is important to keep in mind that the patterned polymer layers utilized in both techniques are sacrificial structures. Additional etchback steps are required to transfer the patterns into the substrate. Further, metal contacts and other functional materials have to be deposited separately to create functional devices. 

Gblzhauser, A., W. Geyer, V. Stadler et al. 2000. Nanoscale patterning of self-assembled monolayers with electrons. J Vac Sci Technol B 18 3414—3418. 

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