Lithography imprint

Hua, E et al. 2004. Polymer imprint lithography with molecular-scale resolution. Nano Lett. 4 2467-2471. 

Wang, Q.H.,etal., Understanding and controlling the substrate effect on graphene electron-transfer chemistry via reactivity imprint lithography. Nature Chemistry, 2012. 4(9) p. 724-732. 

Dauksher W, Le N, Ainley E, Nordquist K, Gehoski K, Young S, Baker J, Convey D, Mangat P. Nano-imprint lithography templates, imprinting and wafer pattern transfer. Microelectronic Engineering 2006, 83, 929-932. 

S. Y. Chou, Nano-imprint lithography and lithographically induced self-assembly, MRS Bull 26 (2001) 512. 

Fig. 8. Schematic of the procedure used for fabrication of nanoscale molecular-switch devices by imprint lithography [62]. (a) Deposition of a molecular film on Ti/Pt nanowires and their micron-scale connections to contact pads, (b) Blanket evaporation of a 7.5 nm Ti protective layer, (c) Imprinting of 10 nm Pt layers with a mold that was oriented perpendicular to the bottom electrodes and aligned to ensure that the top and bottom nanowires crossed, (d) Reactive ion etching with CF4 and O2 (4 1) to remove the blanket Ti protective layer.

Imprint lithography also have several limitations for many applications because it can in principle only be used for small periodic structures. A general fabrication technology for all kinds of applications should be able to realize various combinations and distributions of large as well as small features [50]. Beside the imprint technology it is also possible to use the mold as an ink stamp (Nano Imprint Lithography (NIL). The ink is a chemical solution with certain properties and is applied to the substrate. Consequently it left the chemical on the contact area and after that it can be used as a mask. 

White D, Wood OIL Novel alignment system for imprint lithography. J Vacuum Sci Technol B 2000 18 (6) 3552-3556. 

S.Y. Chou, PR. Krauss and P.J. Renstrom, Imprint lithography with 25-nanometer resolution. Science, 272 (1996) 85—87. 

Figures 7(b) and (cl) illustrate the thermal signatures of two different polymers mr-I8030, Figure 7(b), is a polymer designed for nano-imprint lithography and NEB 22, Figure 7(d), is a negative e-beam photoresist formulated by Sumimoto Chemical. The glass transition temperature, T, is observed on the reversing curve at...

Most of the device fabrications require several lithography steps and precise overlay. A derivative of imprint lithography, S-FIL, provides an effective solution to address registration issues. It uses a transparent fused silica template, facilitating the viewing of alignment marks on the template and wafer simultaneously. 

Fig. 1 Schematic of (A) nanoimprint lithography and (B) step-and-flash imprint lithography. (View this art in color at www.dekker.com.)...

But this is usually not the case. The reason is that in imprint lithography, mold durability is maintained by choosing the proper polymer resist layer thickness such that the mold protrusion will not contact the hard substrate directly. In other words, a thin viscous polymer fluid exists between the mold protrusions and the substrate surface and acts as a soft cushion, which effectively protects the nanofeatures on the mold. The trade-off of this is the existence of a residual resist layer that is present in the recessed regions, which has to be removed by a separate plasma etching step before pattern definition can be completed. 

Chou, S.Y. Krauss, P.R. Imprint lithography with sub-lOnm feature size and high throughput. Microelectr. Eng. 1997, 35 (1 ), 237-240. 

Ruchhoeft, P. Colburn, M. Choi, B. Nounu, H. Johnson, S. Bailey, T. Damle, S. Stewart, M. Ekerdt, J. Sreenivasan, S.V. Wolfe, J.C. Willson, C.G. Patterning curved surfaces template generation by ion beam proximity lithography and relief transfer by step and flash imprint lithography. J. Vacuum Sci. Technol. B. 1999,17 (6), 2965-2969. 

Guo, L.J. Krauss, P.R. Chou, S.Y. Nanoscale silicon field effect transistors fabricated using imprint lithography. Appl. Phys. Lett. 1997, 71 (13), 1881-1883. 

Hirai, Y. Harada, S. Kikuta, H. Tanaka, Y. Okano, M. Isaka, S. Kobayasi, M. Imprint lithography for curved cross-sectional structure using replicated Ni mold. J. Vacuum Sci. Technol. B. 2002, 20 (6), 2867-2871. 

McClelland, G.M. Hart, M.W. Rettner, C.T. Best, M.E. Carter, K.R. Terris, B.D. Nanoscale patterning of magnetic islands by imprint lithography using a flexible mold. Appl. Phys. Lett. 2002, 81 (8), 1483-1485. 

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