Laser-chemical processes at surfaces nanoscale patterning

3 Laser-chemical processes at surfaces nanoscale patterning 

It is well known that laser-induced processes led to the development of new techniques in microelectronics and semiconductor processes (see Osgood and Deutsch (1985)). Typical examples are laser lithography or direct writing, which produce submicrometre features on the desired substrate. 

An obvious trend in microelectronics is to increase the number of components on a chip, which in turn requires making each component to be as small as possible. This requirement has driven considerable attention and demand in nanotechnology and, therefore, in nano-fabrication using patterns at the nanoscale dimension. 

The main goal of nanoscale science is to control the assembly of solid materials, by its growth, removal or etching at an extremely high spatial resolution, i.e. that of a single atom. To accomplish such a goal. 

In Chapter 27 we studied the photochemistry of the adsorbate state, and we discussed the occurrence of localized atomic scattering as a key feature characterizing the photofragmentation dynamics of adsorbed molecules. Furthermore, it was shown how the concept of localized atomic scattering extended to that of localized atomic reaction, in which the new bond created at the surface takes place in an adjacent location to the old (broken) bond. 

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LASER-CHEMICAL PROCESSES AT SURFACES NANOSCALE PATTERNING... 

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