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Metallized Film

Madey and co-workers followed the reduction of titanium with XPS during the deposition of metal overlayers on TiOi [87]. This shows the reduction of surface TiOj molecules on adsorption of reactive metals. Film growth is readily monitored by the disappearance of the XPS signal from the underlying surface [88, 89]. This approach can be applied to polymer surfaces [90] and to determine the thickness of polymer layers on metals [91]. Because it is often used for chemical analysis, the method is sometimes referred to as electron spectroscopy for chemical analysis (ESCA). Since x-rays are very penetrating, a grazing incidence angle is often used to emphasize the contribution from the surface atoms. [Pg.308]

Madey T E, Guan J, Nien C-H, Dong C-Z, Tao H-S and Campbell R A 1996 Faceting induced by ultrathin metal films on W(111) and Mo(111) structure, reactivity, and electronic properties Surf. Rev. Lett. 3 1315... [Pg.318]

Fischer U Ch 1985 Optical characteristics of 0.1 pm circular apertures in a metal film as light sources for scanning ultramicroscopy J. Vac. Sc/. Technol. B 3 386... [Pg.1730]

Instead of an absorbing dye layer between the mica. Levins et al [57] used thin metallic films and developed a method for FECO analysis using an extended spectral range. [Pg.1735]

Delchar T. Eberhagen A and Tompkins F C 1963 A static capacitor method for the measurement of the surface potential of gases on evaporated metal films J. Sci. Instrum. 40 105-7... [Pg.1898]

Turbadar T 1959 Complete adsorption of light by thin metal films Proc. Phys. See. 73 40-4... [Pg.2850]

Because of its small size and portabiHty, the hot-wire anemometer is ideally suited to measure gas velocities either continuously or on a troubleshooting basis in systems where excess pressure drop cannot be tolerated. Furnaces, smokestacks, electrostatic precipitators, and air ducts are typical areas of appHcation. Its fast response to velocity or temperature fluctuations in the surrounding gas makes it particularly useful in studying the turbulence characteristics and rapidity of mixing in gas streams. The constant current mode of operation has a wide frequency response and relatively lower noise level, provided a sufficiently small wire can be used. Where a more mgged wire is required, the constant temperature mode is employed because of its insensitivity to sensor heat capacity. In Hquids, hot-film sensors are employed instead of wires. The sensor consists of a thin metallic film mounted on the surface of a thermally and electrically insulated probe. [Pg.110]

Rhenium hexafluoride is used for the deposition of rhenium metal films for electronic, semiconductor, laser parts (6—8), and in chemical vapor deposition (CVD) processes which involve the reduction of ReF by hydrogen at elevated (550—750°C) temperatures and reduced (<101.3 kPa (1 atm)) pressures (9,10). [Pg.233]

Rhenium hexafluoride is a cosdy (ca 3000/kg) material and is often used as a small percentage composite with tungsten or molybdenum. The addition of rhenium to tungsten metal improves the ductility and high temperature properties of metal films or parts (11). Tungsten—rhenium alloys produced by CVD processes exhibit higher superconducting transition temperatures than those alloys produced by arc-melt processes (12). [Pg.233]

The wide range of soHd lubricants can generally be classified as either inorganic compounds or organic polymers, both commonly used in a bonded coating on a matching substrate, plus chemical conversion coatings and metal films. Since solid-film lubricants often suffer from poor wear resistance and inabihty to self-heal any breaks in the film, search continues for improved compositions. [Pg.249]

Under severe conditions and at high temperatures, noble metal films may fail by oxidation of the substrate base metal through pores in the film. Improved life may be achieved by first imposing a harder noble metal film, eg, rhodium or platinum—iridium, on the substrate metal. For maximum adhesion, the metal of the intermediate film should ahoy both with the substrate metal and the soft noble-metal lubricating film. This sometimes requires more than one intermediate layer. For example, silver does not ahoy to steel and tends to lack adhesion. A flash of hard nickel bonds weh to the steel but the nickel tends to oxidize and should be coated with rhodium before applying shver of 1—5 p.m thickness. This triplex film then provides better adhesion and gready increased corrosion protection. [Pg.251]

Reference 37 provides excellent overviews of metallic films, materials science of thin magnetic recording materials, and the potential technological significance. [Pg.394]

Etch Profiles. The final profile of a wet etch can be strongly influenced by the crystalline orientation of the semiconductor sample. Many wet etches have different etch rates for various exposed crystal planes. In contrast, several etches are available for specific materials which show Httle dependence on the crystal plane, resulting in a nearly perfect isotropic profile. The different profiles that can be achieved in GaAs etching, as well as InP-based materials, have been discussed (130—132). Similar behavior can be expected for other crystalline semiconductors. It can be important to control the etch profile if a subsequent metallisation step has to pass over the etched step. For reflable metal step coverage it is desirable to have a sloped etched step or at worst a vertical profile. If the profile is re-entrant (concave) then it is possible to have a break in the metal film, causing an open defect. [Pg.381]

Thin films of photochromic silver complex oxides were prepared by anodic oxidation of silver metal films (15). Complex oxides, such as Ag2V04, Ag SiO, and Ag2P04, darkened by exposure to visible light, but required heating to 150—250°C for thermal bleaching. [Pg.162]

A primary advantage of electroless solutions is the abUity to produce conductive metallic films on properly prepared nonconductors, along with the abUity to uniformly coat any platable object. The most complex geometric shapes receive a uniform plated film. Film thicknesses range from <0.1 /tm, where only conductivity or reflectivity is wanted, to >1 mm for functional appHcations. [Pg.106]

Electroless plating rates ate affected by the rate of reduction of the dissolved reducing agent and the dissolved metal ion which diffuse to the catalytic surface of the object being plated. When an initial continuous metal film is deposited, the whole surface is at one potential determined by the mixed potential of the system (17). The current density is the same everywhere on the surface as long as flow and diffusion are unrestricted so the metal... [Pg.106]

Electroless reactions must be autocatalytic. Some metals are autocatalytic, such as iron, in electroless nickel. The initial deposition site on other surfaces serves as a catalyst, usually palladium on noncatalytic metals or a palladium—tin mixture on dielectrics, which is a good hydrogenation catalyst (20,21). The catalyst is quickly covered by a monolayer of electroless metal film which as a fresh, continuously renewed clean metal surface continues to function as a dehydrogenation catalyst. Silver is a borderline material, being so weakly catalytic that only very thin films form unless the surface is repeatedly cataly2ed newly developed baths are truly autocatalytic (22). In contrast, electroless copper is relatively easy to maintain in an active state commercial film thicknesses vary from <0.25 to 35 p.m or more. [Pg.107]

Architectural Glass. The other important commercial glass-platiag appHcation is for production of architectural reflective glasses. Translucent metal films are used for decoration and for reduction of environmental heat gain. Electroless plating is used by one producer for this type of product (48). [Pg.113]

The metallized film capacitors have the characteristic of self-healing. On a small dielectric failure the capacitor element is not rendered completely unserviceable. After clearing the fault, the affected capacitor element returns to the circuit and the capacitor unit functions normally. Only the punctured area is eliminated from the element and causes a negligibly small reduction in its capacitance value. Such a characteristic is termed self-healing and such capacitors are known as the self-healing type. [Pg.814]


See other pages where Metallized Film is mentioned: [Pg.272]    [Pg.317]    [Pg.318]    [Pg.450]    [Pg.926]    [Pg.943]    [Pg.1163]    [Pg.1781]    [Pg.1827]    [Pg.1948]    [Pg.2747]    [Pg.2838]    [Pg.237]    [Pg.841]    [Pg.88]    [Pg.382]    [Pg.359]    [Pg.179]    [Pg.400]    [Pg.251]    [Pg.251]    [Pg.134]    [Pg.30]    [Pg.391]    [Pg.435]    [Pg.117]    [Pg.334]    [Pg.562]    [Pg.53]    [Pg.117]    [Pg.106]    [Pg.811]   
See also in sourсe #XX -- [ Pg.5 ]




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