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Layer deposition spin coating

In a first step, the negative working photoresist SU-8 is spin-coated on to the disk and soft baked [110]. The disk is then UV-exposed to pattern the bottom layer. A silver thin metal layer is thereafter evaporated. The metal layer is spin-coated with an AZ-type photoresist, dried, exposed and developed. In this way, the metal layer can be developed independently from the patterning of the SU-8 layer underneath. The metal layer is patterned by wet-chemical etching. As a next step, a second SU-8 layer is deposited, soft-baked and exposed. Top and bottom layers are now developed. After a hard bake, a second CaF2 disk is attached to the stack and sealed by a light-curing epoxy resin. [Pg.80]

The electrochemically deposited single crystalline ZnO nanowires can be applied in LEDs [147, 148]. ZnO nanowire films can be embedded in an insulating spin-coated polystyrene layer. The spin-coating parameters are carefully fine-tuned to completely fill out the space between the ZnO nanowires and produce only a very thin coverage of the nanowire tips. The polystyrene layer thickness at the tips can be further reduced by the plasma etching treatment to make the n-type ZnO tip junctions outside. A top... [Pg.28]

One of the easiest methods to prepare ZnO films is the simple dissolution of zinc acetate in methanol, and the subsequent deposition of thin layers through spin coating [120]. Due to the poor solubility of zinc acetate, only dilute solutions can be obtained and as a consequence the prepared films are thin however, these coatings are ideal as active layers for sensors operating in the SPR mode, which show sensitivity to a variety of VOCs at room temperature. [Pg.1195]

Deposition of a photoresist layer by spin coating. This layer is required as an etch mask to structme the metal layer. [Pg.235]

Figure 3.12. SEM image of a CuIno.7Gao.3Se2 film deposited using a hydrazine-based spin-coating process. The film is deposited on a 500-nm-thick layer of Mo on a glass substrate. Figure 3.12. SEM image of a CuIno.7Gao.3Se2 film deposited using a hydrazine-based spin-coating process. The film is deposited on a 500-nm-thick layer of Mo on a glass substrate.
Chemical Vapor Deposition Electrochemical Deposition Molecular Beam Epitaxy Atomic Layer Deposition Thermal Oxidation Spin Coating... [Pg.390]


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Coating deposition

Coatings spin-coated

Deposited layers

Layer coating

Layer deposition

Spin coating deposition

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