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Integrated circuit production

Image linearity with CODACON schemes is very good and extension to larger areas should be possible without loss of position resolution. Fabrication of the CODACON pattern, however, requires multilayer integrated circuit production techniques. A MCP/linear CODACON system of the type described (wth a Csl photocathode on the MCP front face) has been used for FUV (1500 A-1800 A) spectroscopy of Jupiter (47) and a two dimensional system of this type is being constructed for a similar application (76). [Pg.268]

Nematic and cholesteric liquid crystals can be used for the nondestructive study of electrical defects in transistors and integrated circuits [81, 82], for the detection defects in film capacitors prepared by vacuum deposition [83], for the visualization of electrically active defects or rapidly diffusing dopants, as well as for quality control at various stages of integrating circuits production [84-86]. The most suitable effect for this purpose would appear to be the B effect [85] and the fiexoelectric effect in spatially nonuniform field [84, 86], which permits the distribution of the electrical potential in operating the integrated circuits to be visualized. [Pg.453]

The thin films used in electronic device fabrication can have a thickness in the range of 0.02 am (200 A), which means that sub-micrometre particles can have a disastrous effect on device yields. In fact, particle generated pinholes in thin gate oxide films are one of the major causes of low yields in most integrated circuit production. [Pg.252]

Even the tight controls in siUcon integrated circuit manufacturing are not yet sufficient to produce absolutely identical sensors on a single wafer. Cahbration of the final product is usually necessary, often by adjusting the value of a circuit element on the IC such as a resistor. The caUbration process can be automated, but it stiU adds to the cost of batch-fabricated sensors. Clever means of self-caUbration, particularly in field use, are constantiy being sought. [Pg.391]

The 1995 world production of high purity siUcon was estimated at about 13,000 metric tons. The average selling price was about 48.00/kg. Principal supphers are Hsted in Table 7. This quantity of siUcon supported a siUcon device market, ie, primarily diodes, transistors, and integrated circuits, of about... [Pg.533]

ALLOYS, PURE silicon) and in epitaxial siUcon deposition (see Electronic materials Integrated circuits Semiconductors) as selective reducing agents as monomers and as elastomer intermediates (see Elastomers, SYNTHETIC). Not least is the use of these materials as intermediates for production of other silanes and sihcones. [Pg.21]

Multilayered structures play an important role in the production of, e.g., biomaterials, catalysts, corrosion protectors, detectors/diodes, gas and humidity sensors, integral circuits, optical parts, solar cells, and wear protection materials. One of the most sophisticated developments is a head-up-display (HUD) for cars, consisting of a polycarbonate substrate and a series of the layers Cr (25 nm), A1 (150 nm), SiO, (55 nm), TiO, (31 nm), and SiO, (8 nm). Such systems should be characterized by non-destructive analytical methods. [Pg.411]

Like XPS, the application of AES has been very widespread, particularly in the earlier years of its existence more recently, the technique has been applied increasingly to those problem areas that need the high spatial resolution that AES can provide and XPS, currently, cannot. Because data acquisition in AES is faster than in XPS, it is also employed widely in routine quality control by surface analysis of random samples from production lines of for example, integrated circuits. In the semiconductor industry, in particular, SIMS is a competing method. Note that AES and XPS on the one hand and SIMS/SNMS on the other, both in depth-profiling mode, are complementary, the former gaining signal from the sputter-modified surface and the latter from the flux of sputtered particles. [Pg.42]

The production of integrated circuits has, in the 40 years since their invention, become the most complex and expensive manufacturing procedure ever it even leaves the production of airliners in the shade. One circuit requires a sequence of several dozen manufacturing steps, with positioning of successive optically defined layers accurate to a fraction of a micrometer, all interconnected electrically, and... [Pg.262]

The advent of the integrated circuit and its foundry has now firmly integrated materials scientists into modern electronics, their function both to optimise production processes and to resolve problems. To cite Just one example, many materials scientists have worked on the problem of clectronugraiion in the thin metallic conductors built into integrated circuits, a process which eventually leads to short circuits and circuit breakdown. At high current densities, migrating electrons in... [Pg.263]

Recent texts have assembled impressive information about the production, characterisation and properties of semiconductor devices, including integrated circuits, using not only silicon but also the various compound semiconductors such as GaAs which there is no room to detail here. The reader is referred to excellent treatments by Bachmann (1995), Jackson (1996) and particularly by Mahajan and Sree Harsha (1999). In particular, the considerable complexities of epitaxial growth techniques - a major parepisteme in modern materials science - are set out in Chapter 6 of Bachmann s book and in Chapter 6 of that by Mahajan and Sree Harsha. [Pg.264]

Also called conformal coating. It encloses a product in a closed envelope of plastic by immersing the product (solenoids, ornament, sensors, motor components, integrated circuits, and other articles.) in an unheated or... [Pg.529]


See other pages where Integrated circuit production is mentioned: [Pg.277]    [Pg.325]    [Pg.390]    [Pg.111]    [Pg.320]    [Pg.325]    [Pg.118]    [Pg.168]    [Pg.3867]    [Pg.1046]    [Pg.176]    [Pg.132]    [Pg.1017]    [Pg.277]    [Pg.325]    [Pg.390]    [Pg.111]    [Pg.320]    [Pg.325]    [Pg.118]    [Pg.168]    [Pg.3867]    [Pg.1046]    [Pg.176]    [Pg.132]    [Pg.1017]    [Pg.920]    [Pg.2804]    [Pg.132]    [Pg.165]    [Pg.346]    [Pg.525]    [Pg.106]    [Pg.469]    [Pg.511]    [Pg.224]    [Pg.217]    [Pg.231]    [Pg.23]    [Pg.121]    [Pg.123]    [Pg.128]    [Pg.446]    [Pg.9]    [Pg.65]    [Pg.702]    [Pg.365]    [Pg.114]    [Pg.115]    [Pg.284]    [Pg.194]   
See also in sourсe #XX -- [ Pg.29 ]




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