Implantation reactions

Implantation reactions are interesting because of their similarity as regards reaction mechanisms to hot atom reactions. (However, some features are specific to recoil implantation reactions.) Ion implantation-induced chemical reactions have such features as well, but difficulty hes in keeping surface temperature as low as possible and in obtaining radioactive beams without contamination by other stable isotopes (which may result in severe damage in the target substance). These demerits restricted usefidness of ion implantation. Recoil implantation can be performed simply in the mixture of a recoil source and a catcher (receptor) material. In some cases, thin films of source and catcher could be combined in order to control recoil energy. 

Ion implantation reaction using a mass spectrometer was first studied by Italian researchers Croatto and Giacomello. Since then implantation of Cr in K2Cr04 (Andersen and Sorensen 1966), and S" in alkali halides (Freeman et al. 1967 Andersen and Ebbesen 1971 Kasrai et al. 1971), Co in trans- and cis-[Co(en)2Cl2]N03 (Andersen and Ostergaard 1968 Wolf and Fritsch 1969) and Cu in copper phthalocyanine (Andersen and Ostergaard 1968) were investigated. 

A thin film technique to control implantation energy is introduced in the study of energy dependence of product yield of implantation reaction (Miyakawa et al. 1992). For example, onto a palladium layer deposited on a mylar film, Rh(acac)3 is evaporated and this set of double layers of Pd-Rh(acac)3 is irradiated with y-rays. In the Pd layer, Rh is produced by... 

Aqueous Corrosion. Several studies have demonstrated that ion implantation may be used to modify either the local or generalized aqueous corrosion behavior of metals and alloys (119,121). In these early studies metallic systems have been doped with suitable elements in order to systematically modify the nature and rate of the anodic and/or cathodic half-ceU reactions which control the rate of corrosion. 

Catalysis. Ion implantation and sputtering in general are useful methods for preparing catalysts on metal and insulator substrates. This has been demonstrated for reactions at gas—soHd and Hquid—soHd interfaces. Ion implantation should be considered in cases where good adhesion of the active metal to the substrate is needed or production of novel materials with catalytic properties different from either the substrate or the pure active metal is wanted (129—131). Ion beam mixing of deposited films also promises interesting prospects for the preparation of catalysts (132). 

Ion implantation has also been used for the creation of novel catalyticaHy active materials. Ruthenium oxide is used as an electrode for chlorine production because of its superior corrosion resistance. Platinum was implanted in mthenium oxide and the performance of the catalyst tested with respect to the oxidation of formic acid and methanol (fuel ceU reactions) (131). The implantation of platinum produced of which a catalyticaHy active electrode, the performance of which is superior to both pure and smooth platinum. It also has good long-term stabiHty. The most interesting finding, however, is the complete inactivity of the electrode for the methanol oxidation. 

The first synthetic polyglycoHc acid suture was introduced in 1970 with great success (21). This is because synthetic polymers are preferable to natural polymers since greater control over uniformity and mechanical properties are obtainable. The foreign body response to synthetic polymer absorption generally is quite predictable whereas catgut absorption is variable and usually produces a more intense inflammatory reaction (22). This greater tissue compatibihty is cmcial when the implant must serve as an inert, mechanical device prior to bioresorption. 

Requirements. Requirements for dental implant materials are the same as those for orthopedic uses. The first requirement is that the material used ia the implant must be biocompatible and not cause any adverse reaction ia the body. The material must be able to withstand the environment of the body, and not degrade and be unable to perform the iatended function. 

Kalbitzer and his colleagues used the Si (p, y) resonant nuclear reaction to profile the range distribution of 10-MeV Si implanted into Ge. Figure 8 shows their experimental results (data points), along with theoretical predictions (curves) of what is expected. 

Recent applications of e-beam and HF-plasma SNMS have been published in the following areas aerosol particles [3.77], X-ray mirrors [3.78, 3.79], ceramics and hard coatings [3.80-3.84], glasses [3.85], interface reactions [3.86], ion implantations [3.87], molecular beam epitaxy (MBE) layers [3.88], multilayer systems [3.89], ohmic contacts [3.90], organic additives [3.91], perovskite-type and superconducting layers [3.92], steel [3.93, 3.94], surface deposition [3.95], sub-surface diffusion [3.96], sensors [3.97-3.99], soil [3.100], and thermal barrier coatings [3.101]. 

Reaction of the host tissue to metallic implants is affected by many factors including shape and size of the implant, movement between the implant and tissue, extent of corrosion attack, general degradation of the implant, and the biological activity of the resulting by-products of corrosion or degradation. 

Unsaturated polyester resins (UPRs) Uralkyd resins, 202 Urea-methylol reaction, 410 Urethane alkyds, 241 Urethane coatings, 202 Urethane elastomers, implanted, 207 Urethane foams, tests for, 244 Urethane gels, 205 Urethane-grade ATPEs, 223 Urethane-grade polyol types, 212 Urethane-grade raw materials, 246 Urethane hydrogel, preparation of, 250-251... 

The rate of in vivo biodegradation of subcutaneous implanted films was very high for chitin compared with that for deacetylated chitin. No tissue reaction was foimd with highly deacetylated chitosans, although they contained abundant primary amino groups [240]. 

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