Germanium reactions

Germanium forms divalent compounds with all the halogens. Germaniunil 1) chloride can be prepared by passing the vapour of germanium(IV) chloride (see below) over heated germanium. The reaction is reversible and disproportionation of germanium(II) chloride is complete at about 720 K at atmospheric pressure ... 

Germanium(II) chloride is hydrolysed by water the reaction can be represented as... 

Germanium difluoride can be prepared by reduction (2,4) of GeF by metallic germanium, by reaction (1) of stoichiometric amounts of Ge and HF in a sealed vessel at 225°C, by Ge powder and HgF2 (5), and by GeS and PbF2 (6). Gep2 has been used in plasma chemical vapor deposition of amorphous film (see Plasma TECHNOLOGY Thin films) (7). 

Germanium monoxide [20619-16-3], GeO, can best be prepared in pure form by heating a mixture of Ge and Ge02, in the absence of oxygen. At temperatures above 7I0°C, GeO sublimes from the mixture and condenses as a glassy deposit in the cooler part of the reaction vessel. Germanium monoxide is stable at room temperature. 

The reaction of HCl and silicon, germanium, and boron hydrides is cataly2ed by aluminum chloride and is useful for preparing chloro-substituted silanes andgermanes. 

The standard electrode potential for zinc reduction (—0.763 V) is much more cathodic than the potential for hydrogen evolution, and the two reactions proceed simultaneously, thereby reducing the electrochemical yield of zinc. Current efficiencies slightly above 90% are achieved in modem plants by careful purification of the electrolyte to bring the concentration of the most harmful impurities, eg, germanium, arsenic, and antimony, down to ca 0.01 mg/L. Addition of organic surfactants (qv) like glue, improves the quaUty of the deposit and the current efficiency. 

DiaLkyl peroxides may be prepared by reaction of alcohols or alkyl trifluoromethanesulfonates with organomineral peroxides of siUcon, tin, and germanium (44,108), where Q = Sn and Ge ... 

Chain reactions of heterocycles with participation of silicon and germanium hydrides 98AG(E)3072. 

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