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Fabric technologies fundamentals

S. Nonogaki, T. Ueno, and T. Ito, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, p. 133, Marcel Dekker, New York (1998). [Pg.465]

Excellent treatment of this subject has been provided elsewhere. See, for example, S. Nonogaki, T. Ueno, and T. Ito, Microlithography Fundamentals in Semiconductor Devices and Fabrication Technology, Chapter 5, Marcel Dekker, New York (1998). Here we emphasize only the key facts. A.G. Emslie, F.T. Bonner, and L.G. Peck, Flow of a viscous liquid on a rotating disk, J. Appl. Phys. 29, 858 862 (1958). [Pg.469]

Thus we shall review recent progress in these detectors, assess their present status, and analyze prospects for their future improvement, emphasizing the relationships of detector performance parameters to semiconductor material parameters and to fundamental limits. There shall be little discussion of detector fabrication technology. Of particular interest shall be the potential performance of the various detector materials if their properties can be optimized, and the comparison of photovoltaic and photoconductive effects in these materials. We shall treat only infrared detectors detectors of optical radiation in the visible region of the electromagnetic spectrum were reviewed recently by Seib and Aukerman [4.1]. Useful recent general references for this chapter are the reviews of infrared detectors and their applications by Dimmock [4.2] and of narrow-gap semiconductors by Hannan and Melngailis [4.3]. [Pg.101]

If we look at the definitions of generation and recombination rates (1.85) and (1.86) we conclude that we may try to minimize Shockley-Read, Auger and radiative component of generation and recombination. It was already mentioned in Sect. 1.4.3 that SR processes are not fundamental and that a convenient fabrication technology could reduce them to a low enough level. On the other hand. Auger processes (and especially recombination) are strongly dependent on carrier... [Pg.39]

In this chapter, the fundamentals of the membraneless laminar flow-based fuel cells (LLFCs) operation are first explained. Then, design and exploited fabrication technologies of membraneless LFFCs and the effect of flow architectures of electrodes and their arrangements on cell performance are discussed. Subsequently, reader can find more details about the proposed fuels, oxidants, and electrolytes for membraneless LLFCs. Finally, some discussions on material constraints and selections are provided. [Pg.211]

The mam design principle and characteristics of each Super LWR NPP component is presented in this section. Attention is focused on the design characteristics of the pressure containment and RPV which are fundamentally different from existing FPPs and LWRs. As for the supercritical turbine, the feedwater heaters and the feedwater pumps, the design principle is similar to that of FPPs. Their fabrication technologies are mature with full of operating experience. [Pg.223]

M. Lewin, in M. Lewin and S. B. SeUo, eds.. Handbook of Tiber Science and Technology Uol. 1 Chemical Processing Fibers and Fabrics. Fundamentals and Preparation PartB, Marcel Dekker Inc., New York, 1984, pp. 92—256. [Pg.152]

Fundamental research to support materials assembly and fabrication probably centers on the seienee and technology of adhesion, although research on mechanical assembly driven by ehemieal aetion, sueh as the self-assembly of large molecules or particles, also holds promise for solving some fabrieation problems. [Pg.89]

The U.S. - Australia Symposium on Radiation Effects on Polymeric Materials contained research presentations on fundamental radiation chemistry and physics as well as on technological applications of polymer irradiation. This paper represents a hybrid contribution of these two areas, examining a field of extensive technological importance. Spin casting of radiation sensitive polymer resists for microelectronic fabrication was studied using photophysical techniques that are sensitive to the fundamental radiation response in the ultraviolet range. [Pg.95]


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