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Determination of Plasma Parameters

The determination of plasma parameters using He-like spectra is based on a self-consistent modeling of the theoretical spectra. The following variables take part in the variation procedure based on least-squares fitting electron and ion temperatures, toroidal plasma velocity, concentrations of H-, He-and Li-like ions. In addition, a background function was used to subtract the plasma background from the experimental spectra. The background consists of continuum radiation from the plasma and detector noise. [Pg.192]

The line shapes are described by Voigt functions, which reflect the Lorentzian line profiles due to natural line width and Gaussian profiles due to Doppler broadening. The instrumental broadening by the rocking curve of the crystal, de-focusing and the finite resolution of the detector is described well by a Voigt profile shape too [3[. [Pg.192]

The analysis of the spectra and the fitting procedure is straight forward due to the properties of the He-like systems. The information on the different plasma parameters is obtained from well separated portions on the [Pg.192]


Configuration of plasma source used for film coating on inner surface of tubes is discussed below. Following this, methodology used for the determination of plasma parameters, rate constants and high probable plasma chemical reactions are discussed. [Pg.228]

During the last 25 years X-ray spectroscopy has been intensively developed for plasma diagnostics. Since the first application of X-ray spectrometers on the early fusion devices such as PLT and TFR, it has been used to determine basic plasma parameters such as the temperature of ions and electrons. It is now frequently being applied not only to low density plasmas in tokamaks and astrophysical objects [1], but also to laser-produced plasma [2]. It has been shown, that the precision of plasma parameters as obtained from X-ray spectroscopy is competitive to the standard methods for plasma diagnostics, such as Thomson scattering and charge exchange spectroscopy for electron and ion temperature, respectively [3]. [Pg.183]

Oxidative Biotransformation in Microsomes The rapid determination of pharmacokinetic parameters, solubility, permeability, and in vitro stability in plasma or liver tissue can often provide a reasonable explanation of the mechanisms limiting oral bioavailability. An approach that is often used is to extrapolate the in vitro rate of metabolism to estimate the hepatic clearance using in vitro-in vivo correlation methods.82-86 These methods use in vitro kinetic parameters, usually Vmllx/Km or in vitro t ji, to determine the intrinsic clearance, which is then scaled to hepatic clearance using the amount of tissue in the in vitro incubation, the weight of the liver, and the well-stirred model for hepatic clearance. [Pg.90]

The siuface kinetics of etching (Section 8.2.7) is controlled by concentrations of ions and active neutrals near the surface. Determination of these parameters reqttires a detailed consideration of etching discharges (Sections 8.2.8 and 8.2.9). Some nseful relations, however, can be derived from general kinetics of the low-pressme discharges applied for etching. In this section, we make such estimations for the concentration and flux of ions concentration and flux of neutral chemically active etchants will be estimated in the next section. A balance of charged particles in plasma between electrodes with area A (characteristic radius R) and narrow gap / between them (/ R), controlled by ionization and losses to the electrodes,... [Pg.520]

The rapid determination of pharmacokinetic parameters, solubility, permeability, and in vitro stability in plasma or liver tissue can often provide a reasonable explanation of the mechanisms limiting oral bioavailability. The... [Pg.232]

Chemical kinetics of methane and acetylene dissociation and other gas phase reactions are studied for him coating applications under atmospheric pressure plasma conditions. In order to determine the plasma parameters, OES, V-I measurement, micro-photography and numerical simulations are used. From the determined EVDF and n, electron impact plasma chemical reaction rates are determined. On the basis of rate of different possible reaction. [Pg.246]

On the other hand, it is also quite important to study reaction kinetics in nitrogen plasmas to understand quantitative amount of various excited species including reactive radicals. Many theoretical models have been proposed to describe the number densities of excited states in the plasmas. Excellent models involve simultaneous solvers of the Boltzmann equation to determine the electron energy distribution function (EEDF) and the vibrational distribution function (VDF) of nitrogen molecules in the electronic ground state. Consequently, we have found noteworthy characteristics of the number densities of excited species including dissociated atoms in plasmas as functions of plasma parameters such as electron density, reduced electric field, and electron temperature (Guerra et al, 2004 Shakhatov Lebedev, 2008). [Pg.284]

The patients, whether on Allopurinol or placebo, received identical-looking tablets. The study was not a double-blind one, as the doctors who were following the patients knew the group to which eveiy patient belonged. No special dietary restrictions were imposed on the patients. The patients were seen at least once a month. Each time, in addition to body weight and blood pressure, blood was drawn for plasma uric acid, electrolytes, and plasma urea. The patients collected, for every monthly visit, a 24-hour urine collection for creatinine clearance. Once every three months, maximal urine osmolality was determined, and blood drawn for determination of plasma cholesterol, glucose, Hb., serum iron, total iron binding capacity, in addition to the other monthly determined parameters. [Pg.216]

Various data sources (44) on plasma parameters can be used to calculate conditions for plasma excitation and resulting properties for microwave coupling. Interactions ia a d-c magnetic field are more compHcated and offer a rich array of means for microwave power transfer (45). The Hterature offers many data sources for dielectric or magnetic permittivities or permeabiHty of materials (30,31,46). Because these properties vary considerably with frequency and temperature, available experimental data are iasufficient to satisfy all proposed appHcations. In these cases, available theories can be appHed or the dielectric parameters can be determined experimentally (47). [Pg.340]

In addition to the elimination rate constant, the half-life (T/i) another important parameter that characterizes the time-course of chemical compounds in the body. The elimination half-life (t-1/2) is the time to reduce the concentration of a chemical in plasma to half of its original level. The relationship of half-life to the elimination rate constant is ti/2 = 0.693/ki,i and, therefore, the half-life of a chemical compound can be determined after the determination of k j from the slope of the line. The half-life can also be determined through visual inspection from the log C versus time plot (Fig. 5.40). For compounds that are eliminated through first-order kinetics, the time required for the plasma concentration to be decreased by one half is constant. It is impottant to understand that the half-life of chemicals that are eliminated by first-order kinetics is independent of dose. ... [Pg.272]

Ideally, it would be desirable to determine many parameters in order to characterize and mechanistically define these unusual reactions. This has been an important objective that has often been considered in the course of these studies. It would be helpful to know, as a function of such parameters of the plasma as the radio-frequency power, pressure, and rate of admission of reactants, (2) the identity and concentrations of all species, including trifluoromethyl radicals, (2) the electronic states of each species, (3) the vibrational states of each species, and (4) both the rotational states of each species and the average, translational energies of, at least, the trifluoromethyl radicals. [Pg.190]

In practice, one will seek to obtain an estimate of the elimination constant kp and the plasma volume of distribution Vp by means of a single intravenous injection. These pharmacokinetic parameters are then used in the determination of the required dose D in the reservoir and the input rate constant k (i.e. the drip rate or the pump flow) in order to obtain an optimal steady state plasma concentration... [Pg.472]

We now turn our attention to the graphical determination of the various parameters of our two-compartmental model, i.e. the plasma volume of distribution Vp,... [Pg.480]

The quantities AUMC and AUSC can be regarded as the first and second statistical moments of the plasma concentration curve. These two moments have an equivalent in descriptive statistics, where they define the mean and variance, respectively, in the case of a stochastic distribution of frequencies (Section 3.2). From the above considerations it appears that the statistical moment method strongly depends on numerical integration of the plasma concentration curve Cp(r) and its product with t and (r-MRT). Multiplication by t and (r-MRT) tends to amplify the errors in the plasma concentration Cp(r) at larger values of t. As a consequence, the estimation of the statistical moments critically depends on the precision of the measurement process that is used in the determination of the plasma concentration values. This contrasts with compartmental analysis, where the parameters of the model are estimated by means of least squares regression. [Pg.498]

Luft and Tsuo have presented a qualitative summary of the effects of various plasma parameters on the properties of the deposited a-Si H [6]. These generalized trends are very useful in designing deposition systems. It should be borne in mind, however, that for each individual deposition system the optimum conditions for obtaining device quality material have to be determined by empirical fine tuning. The most important external controls that are available for tuning the deposition processs are the power (or power density), the total pressure, the gas flow(s), and the substrate temperature. In the following the effects of each parameter on material properties will be discussed. [Pg.108]


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Parameter determination

Plasma determination

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