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Cylindrical magnetron

The parallel and perpendicular components (with respect to the surface of a cylindrical magnetron) at a current of 3 A are shown in Figure 14.9. The parallel components are measured at 3 and 6 mm from the surface, and the perpendicular components are measured at 0 and 3 mm. The profile of magnetic field is quite symmetrical. Since the magnetron has a cylindrical shape, it is anticipated that the profile is symmetrical along the circumference. [Pg.286]

Wright M, Beardow T (1986) Design advances and applications of the rotatable cylindrical magnetron. J Vac Sci Technol A 4(3) 388-392... [Pg.1143]

Thornton, J. A., Tabock, J. and Hoffman, D. W. (1979), Internal stresses in metallic films deposited by cylindrical magnetron sputtering. Thin Solid Films 64, 111-119. [Pg.798]

Utilization of sputtered material can be high - e.g. rotatable cylindrical magnetron. In situ surface preparation is easily incorporated into the processing. [Pg.277]

J.A. Thornton, A.S. Penfold, Cylindrical magnetron sputtering, in J.L. Vossen, W. Kern (Eds.), Thin Film Processes, Academic Press, 1978, (Section II-2). [Pg.281]

R. Wei, S.L. Lee, RF plasma enhanced cylindrical magnetron sputter deposition, in Proceedings of the 51st Aimual Technical Conference, Society of Vacuum Coaters, 2008, p. 559. [Pg.281]

Fig. 3. Schematics of magnetic confinement geometries (a) planar and (b) cylindrical geometries for magnetron sputtering sources (24) (c) open-ended... Fig. 3. Schematics of magnetic confinement geometries (a) planar and (b) cylindrical geometries for magnetron sputtering sources (24) (c) open-ended...
In a biosensor application, Wolfson and his research group [10] employed microfabrication techniques to produce miniature electrodes for potential implantable, non-enzyme-based glucose sensors. Thin-film techniques, such as DC magnetron-sputtered processing, were used to deposit platinum film or platinum film enhanced with titanium film on quartz substrates. The geometric shapes of the quartz substrate include cylindrical rods and rectangular plates in a... [Pg.430]

Design of a cylindrical-post magnetron sputtering source. [Pg.253]

A study of microwave curing (70) effectiveness was made with a magnetron at 28 W power and a frequency of 2.45 Ghz in an 18 cm diameter cylindrical tunable cavity. With this system, samples can be cured in 10 min to approximately 99% conversion as measured by DSC. By way of comparison, for thermal samples, heating at 195 °C for two hours and postcure at 240 °C for one hour was required for cure to this extent. [Pg.562]

If the anode block of M-type linear magnetron is bent and made re-entrant, in which the end of the structure is connected to the beginning of the structure as shown in Fig. 6.20, then the magnetron is termed a radial magnetron. In the radial magnetron, there is no nonemitting sole. The cathode is an emitting hot cathode. Electrons emitted from the hot cathode are pulled toward the anode by the radial electric field. Therefore, the radial force is expressed in a cylindrical coordinate coaxially set up with the radial... [Pg.507]

Hoffman, D. W. and Thornton, J. A. (1980), Compressive stress and inert gas in molybdenum films sputtered from a cylindrical post magnetron with neon, argon, krypton and xeon. Journal of Vacuum Science and Technology 17, 380-383. [Pg.785]

The schematic representation of the self-designed experimental set-up applied for automatic and online measurement of dielectric properties of well conducting liquids in a definite temperature range is shown in Figure 1. It is composed of the following devices and instruments cylindrical sample holder unit, thermostat, peristaltic pump, waveguide, temperature sensor, displaceable piston, stepper motor, magnetron, detectors, control unit, and a PC. [Pg.192]


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See also in sourсe #XX -- [ Pg.277 ]




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