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Configurational uniformity

Because of their high molecular weight and their defined structure, dendrimers offer themselves for studying the expression of chirality on a macromolecular level. The construction of configurationally uniform macromolecules is otherwise a complex task but can be achieved more easily with dendrimers because of repetitive synthesis from identical (chiral) building blocks. Comparison of optical rotation values and circular dichroism (CD) spectra should demonstrate what influence there is of the chiral building blocks on the structure of the whole dendrimer. [Pg.150]

Here U N) is the interaction potential energy for the complete system at a specific configuration, uniformly the same quantity that has been discussed above. U(TV) is an ejfective potential designed to be used in classical-limit partition function calculations, e.g. Eq. (3.17), p. 40, in order to include quantum mechanical effects approximately. We will call this /(TV) the quadratic Feynman-Hibbs (QFH) model. In Eq. (3.67), Mj is the mass of atom j, and V is the Laplacian of the... [Pg.55]

A configurational Monte Carlo algorithm based on uniform random trial moves and the acceptance probability... [Pg.201]

A special coil configuration is used to heat thin strips of metal that caimot be heated efficiently with a coil that encircles the load, as the strip thickness is small compared to the depth of penetration. The transverse flux induction coil is positioned on either side of a strip to produce a uniformly heated strip with good efficiency in a much smaller space than conventional radiant or convective strip heating furnaces (6). [Pg.129]

CVD reactors can have one of several configurations. Each has particular advantages and disadvantages. Reactors that support wafers horizontally have difficulty controlling the deposition uniformity over all the exposed wafers. Reactors having vertical wafer support produce uniform deposition, but are mechanically complex. Barrel reactors are not suited for extended operation at temperatures greater than 1200°C. [Pg.346]

The stainless steel plates are separated (ca 3 pm between) by nonabsorbent vulcanized gaskets. Various profiles and configurations, including raised knobs, crescents, channels, or diamonds, provide a rapid, uniform heat-transfer plate surface. During operation the plates must be pressed together to provide a seal, and mounted and coimected in such a manner that air is eliminated and that the product drains from the plates without opening. [Pg.357]

The simple d-c diode sputtering configuration has the advantage that (/) large areas can be sputtered rather uniformly over long periods of time (2) the target can be made conformal with the substrate (J) the target-to-substrate distance can be made smaU compared to thermal vaporization and (4) the... [Pg.518]

Flux is maximized when the upstream concentration is minimized. For any specific task, therefore, the most efficient (minimum membrane area) configuration is an open-loop system where retentate is returned to the feed tank (Fig. 8). When the objective is concentration (eg, enzyme), a batch system is employed. If the object is to produce a constant stream of uniform-quahty permeate, the system may be operated continuously (eg, electrocoating). [Pg.298]

Cell geometry, such as tab/terminal positioning and battery configuration, strongly influence primary current distribution. The monopolar constmction is most common. Several electrodes of the same polarity may be connected in parallel to increase capacity. The current production concentrates near the tab connections unless special care is exercised in designing the current collector. Bipolar constmction, wherein the terminal or collector of one cell serves as the anode and cathode of the next cell in pile formation, leads to gready improved uniformity of current distribution. Several representations are available to calculate the current distribution across the geometric electrode surface (46—50). [Pg.514]

A line configuration in a system of uniform size in which expansion or contraction must be absorbed largely in a short offset from the major portion of the run... [Pg.994]


See other pages where Configurational uniformity is mentioned: [Pg.350]    [Pg.121]    [Pg.145]    [Pg.188]    [Pg.7]    [Pg.155]    [Pg.160]    [Pg.350]    [Pg.121]    [Pg.145]    [Pg.188]    [Pg.7]    [Pg.155]    [Pg.160]    [Pg.719]    [Pg.554]    [Pg.601]    [Pg.166]    [Pg.250]    [Pg.207]    [Pg.312]    [Pg.495]    [Pg.37]    [Pg.272]    [Pg.89]    [Pg.135]    [Pg.340]    [Pg.459]    [Pg.329]    [Pg.183]    [Pg.157]    [Pg.215]    [Pg.513]    [Pg.143]    [Pg.526]    [Pg.368]    [Pg.228]    [Pg.519]    [Pg.520]    [Pg.179]    [Pg.216]    [Pg.217]    [Pg.308]    [Pg.87]    [Pg.1050]    [Pg.1229]    [Pg.1652]   
See also in sourсe #XX -- [ Pg.188 ]




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Designs configuration with uniform current

Uniform-director configuration

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