Condensation polymers, solution

P. W. Morgan, Condensation Polymers by Interfacial and Solution Methods olm. Wiley Sons, Inc., New York, 1965. 

When the full distribution is needed, it is measured by size-exclusion chromatography (also called gel permeation chromatography). This is a solution technique that requires dissolution of the polymer in a reasonable solvent such as tetrahydrofuran or tetrachlorlobenzene. For polymers that require exotic solvents or solution temperatures above about 150°C, a simple measurement of solution viscosity can be a useful surrogate for the actual molecular weight. The viscosity of the pure polymer (i.e., a polymer melt viscosity) can also be used. Such simplified techniques are often satisfactory for routine quality control, particularly for condensation polymers such as PET that vary in average molecular weight but usually have a polydispersity of 2. 

Two macromolecular computational problems are considered (i) the atomistic modeling of bulk condensed polymer phases and their inherent non-vectorizability, and (ii) the determination of the partition coefficient of polymer chains between bulk solution and cylindrical pores. In connection with the atomistic modeling problem, an algorithm is introduced and discussed (Modified Superbox Algorithm) for the efficient determination of significantly interacting atom pairs in systems with spatially periodic boundaries of the shape of a general parallelepiped (triclinic systems). 

Similar molecular weight poly(DMA-co-EPl), 1750 daltons, ca. 13 repeat units, and poly(TMDAB-co-DCB), 1500 daltons, ca. 11 repeat units were compared. The two condensation polymers appeared to be about equally effective in preventing the swelling of Wyoming bento-nite. Any small differences are probably due to repeat unit chemical structure differences rather than the small variations in polymer molecular weight. The presence of the hydroxyl group and the smaller N - N distance in poly(DMA-co-EPl) could affect polymer conforma-tion in solution, geometry of the polymer - clay complex, and surface properties of the polymer - clay complex as compared to poly(TMDAB-co-DCB). 

The workhorse of the VLSI industry today is a composite novolac-diazonaphthoquinone photoresist that evolved from similar materials developed for the manufacture of photoplates used in the printing industry in the early 1900 s (23). The novolac matrix resin is a condensation polymer of a substituted phenol and formaldehyde that is rendered insoluble in aqueous base through addition of 10-20 wt% of a diazonaphthoquinone photoactive dissolution inhibitor (PAC). Upon irradiation, the PAC undergoes a Wolff rearrangement followed by hydrolysis to afford a base-soluble indene carboxylic acid. This reaction renders the exposed regions of the composite films soluble in aqueous base, and allows image formation. A schematic representation of the chemistry of this solution inhibition resist is shown in Figure 6. 

Polysulfone supports are well suited for the fifth method listed in Table 1. In this approach. Method E, the support film is saturated with a water solution containing diamines, polyamines or diphenols, plus other additives such as acid acceptors and surfactants. The saturated film is contacted with a nonmlscible solvent containing di- or triacyl chloride reactants. A condensation polymer forms at the interface. The film is dried to bond the thin Interfacial film to the support surface. In some... 

Morgan, P.W. 1965. Condensation Polymers by Interface and Solution Methods. Wiley, New York. Morgan, P.W. and Kwolek, S.L. 1959. The nylon rope trick. J. Chem. Ed., 36 182. 

Most heterochained polymers, including condensation polymers, are susceptible to aqueous-associated acid or base degradation. This susceptibility is due to a combination of the chemical reactivity of heteroatom sites and the materials being at least wetted by the aqueous solution allowing contact between the proton and hydroxide ion. Both these factors are related to the difference in the electronegatives of the two different atoms resulting in the formation of a dipole that acts as a site for nucleophilic or electrophilic chemical attack and that allows polar materials to come in contact with it. Such polymers can be partially protected by application of a thin film of hydrocarbon polymer that acts to repel the aqueous solutions. 

Morgan, P. W., Condensation Polymers By Interfacial and Solutions Methods, Chap. IV, Wiley-Interscience, New York, 1965. 

Morgan PW (1965) Condensation polymers by interfacial and solution methods. Interscience, New York... 

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