Coating chemical vapor deposition

Coatings Chemical-vapor deposition (CVD) Physical-vapor deposition (PVD) Thermal spray... 

Elkasabi Y, et al. Towards multipotent coatings chemical vapor deposition and bio-functionaUzation of carbonyl-substituted copolymers. Macromol Rapid Commun 2008 29(ll) 855-70. 

Fluorination of tungsten and rhenium produces tungsten hexafluoride, WF, and rhenium hexafluoride [10049-17-9J, ReF, respectively. These volatile metal fluorides are used in the chemical vapor deposition industry to produce metal coatings and intricately shaped components (see Thin films,... 

Titanium carbide may also be made by the reaction at high temperature of titanium with carbon titanium tetrachloride with organic compounds such as methane, chloroform, or poly(vinyl chloride) titanium disulfide [12039-13-3] with carbon organotitanates with carbon precursor polymers (31) and titanium tetrachloride with hydrogen and carbon monoxide. Much of this work is directed toward the production of ultrafine (<1 jim) powders. The reaction of titanium tetrachloride with a hydrocarbon-hydrogen mixture at ca 1000°C is used for the chemical vapor deposition (CVD) of thin carbide films used in wear-resistant coatings. 

If the rf source is applied to the analysis of conducting bulk samples its figures of merit are very similar to those of the dc source [4.208]. This is also shown by comparative depth-profile analyses of commercial coatings an steel [4.209, 4.210]. The capability of the rf source is, however, unsurpassed in the analysis of poorly or nonconducting materials, e.g. anodic alumina films [4.211], chemical vapor deposition (CVD)-coated tool steels [4.212], composite materials such as ceramic coated steel [4.213], coated glass surfaces [4.214], and polymer coatings [4.209, 4.215, 4.216]. These coatings are used for automotive body parts and consist of a number of distinct polymer layers on a metallic substrate. The total thickness of the paint layers is typically more than 100 pm. An example of a quantitative depth profile on prepainted metal-coated steel is shown as in Fig. 4.39. 

In spray pyrolysis, very fine droplets are sprayed onto a heated substrate. The limitations of this process are the same as for spin-on coating. The same is often the case for preparing solid electrolytes by chemical vapor deposition (CVD) processes, which in addition are more expensive, and the precursors are often very toxic. 

CHEMISTRY OF SUPERCONDUCTOR MATERIALS edited by Terrell A. Vanderah CONTACTS TO SEMICONDUCTORS edited by Leonard J. Brillson DIAMOND CHEMICAL VAPOR DEPOSITION by Huimin Liu and David S. Dandy DIAMOND FILMS AND COATINGS edited by Robert F. Davis... 

Chemical vapor deposition (C VD) is a versatile process suitable for the manufacturing of coatings, powders, fibers, and monolithic components. With CVD, it is possible to produce most metals, many nonmetallic elements such as carbon and silicon as well as a large number of compounds including carbides, nitrides, oxides, intermetallics, and many others. This technology is now an essential factor in the manufacture of semiconductors and other electronic components, in the coating of tools, bearings, and other wear-resistant parts and in many optical, optoelectronic and corrosion applications. The market for CVD products in the U.S. and abroad is expected to reach several billions dollars by the end of the century. 

Carlsson, J. O., Chemical Vapor Deposition, Handbook of Deposition Technologies for Films and Coatings, (R. Bunshah, ed.), Noyes Publications, Westwood, NJ (1994)... 

Angelini, P., Chemical Vapor Deposition of Silicon Carbide from Methylsilane and Coating of Nuclear Waste Ceramics, Diss. Abstr. Int, 46(9) 170 (Mar. 1986)... 

Fukutomi, M., Kitajima, M., Okada, M., and Wanatabe, R., Silicon Carbide Coating on Molybdenum by Chemical Vapor Deposition and its Stability under Thermal Cycle Conditions, J Nucl Mater., 87(1) 107-116 (Nov. 1979)... 

Boving, H. J., and Hintermarm, H. E., Properties and Performance of Chemical Vapor Deposited TiC-Coated Ball Bearing Components, Thin SolidFilms, 153 253-266 (1987)... 

Mantyla, T., Vuoristo, P., and Kettunen, P., Chemical Vapor Deposition of Plasma Sprayed Oxide Coatings, Thin Solid Films, 118(4) 437-444(24Aug. 1984)... 

Pierson, H., A Survey of the Chemical Vapor Deposition of Refractory Transition Metal Borides, in Chemical Vapor Deposited Coatings, pp. 27-45, Am. Ceram. Soc. (1981)... 

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