Chemical vapor, deposition of

Viswanathan R, Thompson D L and Raff L M 1984 Theoretical investigations of elementary processes in the chemical vapor deposition of silicon from silane. Unimolecular decomposition of SiH J. Chem. Phys. 80 4230 0... [Pg.1041]

Germanium difluoride can be prepared by reduction (2,4) of GeF by metallic germanium, by reaction (1) of stoichiometric amounts of Ge and HF in a sealed vessel at 225°C, by Ge powder and HgF2 (5), and by GeS and PbF2 (6). Gep2 has been used in plasma chemical vapor deposition of amorphous film (see Plasma TECHNOLOGY Thin films) (7). [Pg.182]

Molybdenum hexafluoride is used in the manufacture of thin films (qv) for large-scale integrated circuits (qv) commonly known as LSIC systems (3,4), in the manufacture of metallised ceramics (see MetaL-MATRIX COMPOSITES) (5), and chemical vapor deposition of molybdenum and molybdenum—tungsten alloys (see Molybdenumand molybdenum alloys) (6,7). The latter process involves the reduction of gaseous metal fluorides by hydrogen at elevated temperatures to produce metals or their alloys such as molybdenum—tungsten, molybdenum—tungsten—rhenium, or molybdenum—rhenium alloys. [Pg.212]

J. E. J. Schmit2, Chemical Vapor Deposition of Tungsten andTungsten Silicidesfor VESI FJESI Applications, Noyes PubHcations, Park Ridge, N.J., 1992. [Pg.258]

This reaction, operated at pilot plant scale, has not as of this writing (ca 1997) been commercialized. The same reaction may be used for chemical vapor deposition of titanium boride. [Pg.117]

Boron filaments are formed by the chemical vapor deposition of boron trichloride on tungsten wire. High performance reinforcing boron fibers are available from 10—20 mm in diameter. These are used mainly in epoxy resins and aluminum and titanium. Commercial uses include golf club shafts, tennis and squash racquets, and fishing rods. The primary use is in the aerospace industry. [Pg.184]

Dirubidium phthalocyanine (PcRb2) and dicesium phthalocyanine (PcCs2) can be prepared by chemical-vapor deposition of benzene-1,2,4,5-tctracarbonitrile and the metal chloride.135 In the solid phase, additional rubidium atoms are complexed between peripheral cyano groups. [Pg.728]

Borman, C. G, and Gordon, R. G., Reactive Pathways in the Chemical Vapor Deposition of Tin Oxide Films by Tetramethyltin Oxidation, /. Electrochem. Soc., 136-12 3820-3828 (1989)... [Pg.106]

Kodas, T. T., Baum, T. H., andComita, P. B., Kinetics ofLaser-Induced Chemical Vapor Deposition of Gold, / Appl. Phys., 62(l) 281-286(July 1,1987)... [Pg.179]

Green, M. L., and Levy, R. A., Chemical Vapor Deposition of Metals for Integrated Circuit Applications, /. ofMetals, pp. 62-71 (June 1985)... [Pg.184]

Janson, U., Chemical Vapor Deposition of Boron Carbides, Materials and Manufacturing Processes, 6(3) 481-500 (1991)... [Pg.259]

Mullendore, A., Chemical Vapor Deposition of Boron-based Refractory Solids, AIP Conf. Proc., pp. 4-140, Am Inst, of Physics, New York (1986)... [Pg.259]

Brennfleck, K., Dietrich, M., Fitzer, E., andKehr, D., Chemical Vapor Deposition of Superconducting Niobium Carbonitride Films on Carbon Fibers, Eroc. 7th Int. Conf. on CVD, (T. Sedgwick andH. Lydtin, eds.), pp. 300-314, Electrochem Soc., Pennington, NJ 08534 (1979)... [Pg.261]

Angelini, P., Chemical Vapor Deposition of Silicon Carbide from Methylsilane and Coating of Nuclear Waste Ceramics, Diss. Abstr. Int, 46(9) 170 (Mar. 1986)... [Pg.262]

Hollabaugh, C., Wahman, L., Reiswig, R., White, R., and Wagner, P., Chemical Vapor Deposition of ZrC Made by Reactions of ZrCl4 with CH4 and with C fNuc. TechnoL, 35(2) 527-535 (Sept. 1977)... [Pg.264]

England, K. M., and Mazunder, J., Kinetics and Microstructure of Laser Chemical Vapor Deposition of Titanium Nitride, SPIEProc., 2703 552-562 (Feb. 1996)... [Pg.293]

Kern, W., and Ban, V. S., Chemical Vapor Deposition of Inorganic Thin Films, in Thin Film Processes, (J. Vossen and W. Kern, eds.). Academic Press, New York (1978)... [Pg.294]

Mantyla, T., Vuoristo, P., and Kettunen, P., Chemical Vapor Deposition of Plasma Sprayed Oxide Coatings, Thin Solid Films, 118(4) 437-444(24Aug. 1984)... [Pg.318]

Pierson, H., A Survey of the Chemical Vapor Deposition of Refractory Transition Metal Borides, in Chemical Vapor Deposited Coatings, pp. 27-45, Am. Ceram. Soc. (1981)... [Pg.339]

Pierson, H. O., and Mullendore, A., The Chemical Vapor Deposition of TiB2 from Diborane, Thin Solid Films, 72(3) 511-515(15 0ct. 1980)... [Pg.340]

Gaczi, P. J., and Reynolds, G. J., Identification of Reaction Products in the Low-Pressure Chemical Vapor Deposition of Molybdenum Silicide, J. Electrochem. Soc., 136(9) 2661-2666 (Sept. 1989)... [Pg.341]

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