Chemical vapor deposition of inorganic

Kern, W., and Ban, V. S., Chemical Vapor Deposition of Inorganic Thin Films, in Thin Film Processes, (J. Vossen and W. Kern, eds.). Academic Press, New York (1978)... 

Matthews JS, Rees WS (2000) Group 2 element precimsors for the chemical vapor deposition of electronic materials. Advances in Inorganic Chemistry, Vol 50 50,173-192... 

Silicon is the most abundant solid element in the earth s crust and probably in the universe as a whole [19]. Silicon inorganic materials are all around us, sand, rocks, glasses, cements and mortars all have high silicon content and either occur naturally or are produced by well established processes which have often evolved through thousands of years. During the last few decades new classes of synthetic silicon inorganic materials have been discovered, developed and commercialized. All of the families are based on new chemical processes. The production of polycrystalline silicon with controlled purity by the chemical vapor deposition of trichlorosilane is probably one of the first examples of carefully synthesized silicon inorganic material. This silicon is the basis of the semiconductor industry. 

Itoh et al. and Wang et al. have created an organic/inorganic hybrid nanofilm from the chemical vapor deposition of M0O3, followed by the ion-exchange-induced intercalation... 

These processes are very rapid and allow the preparation of inorganic supports in one step. This technique allows large-scale manufacturing of supports such as titania, fumed silica, and aluminas. Sometimes the properties of the material differ from the conventional preparation routes and make this approach unique. Multicomponent systems can be also prepared, either by multimetallic solutions or by using a two-nozzle system fed with monometallic solutions [22]. The as-prepared powder can be directly deposited onto substrates, and the process is termed combustion chemical vapor deposition [23]. 

The approaches used for preparation of inorganic nanomaterials can be divided into two broad categories solution-phase colloidal synthesis and gas-phase synthesis. Metal and semiconductor nanoparticles are usually synthesized via solution-phase colloidal techniques,4,913 whereas high-temperature gas-phase processes like chemical vapor deposition (CVD), pulsed laser deposition (PLD), and vapor transfer are widely used for synthesis of high-quality semiconductor nanowires and carbon nanotubes.6,7 Such division reflects only the current research bias, as promising routes to metallic nanoparticles are also available based on vapor condensation14 and colloidal syntheses of high-quality semiconductor nanowires.15... 

Chemical vapor deposition (CVD) is a process whereby a thin solid film is synthesized from the gaseous phase by a chemical reaction. It is this reactive process that distinguishes CVD from physical deposition processes, such as evaporation, sputtering, and sublimation.8 This process is well known and is used to generate inorganic thin films of high purity and quality as well as form polyimides by a step-polymerization process.9-11 Vapor deposition polymerization (VDP) is the method in which the chemical reaction in question is the polymerization of a reactive species generated in the gas phase by thermal (or radiative) activation. 

It should also be mentioned here that a number of publications deal with the true parallel synthesis of inorganic solids by sputtering and chemical vapor deposition however, these approaches are of major use for other fields in materials science than for catalysis. For a broad overview of synthetic and screening efforts refer to [49],... 

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