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Chemical bond mean strength

Only a small amount of work has been done up to now concerning the prediction of bond strengths and other properties based on the results of the analysis of the resin. Ferg et al. [59] worked out correlation equations evaluating the chemical structures in various UF-resins with different F/U molar ratios and different types of preparation on the one hand and the achievable internal bond as well as the subsequent formaldehyde emission on the other hand. These equations are valid only for well defined series of resins. The basic aim of such experiments is the prediction of the properties of the wood-based panels based on the composition and the properties of the resins used. For this purpose various structural components are determined by means of - C NMR and their ratios related to board results. Various papers in the chemical literature describe examples of such correlations, in particular for UF, MF, MUF and PF resins [59-62]. For example one type of equation correlating the dry internal bond (IB) strength (tensile strength perpendicular to the plane of the panel) of a particleboard bonded with PF adhesive resins is as follows [17]... [Pg.1053]

The activity of a catalyst depends on the nature, the number, the strength and the spatial arrangement of the chemical bonds that are transiently created between the reactants and the surface. The objective of the chemical characterization of the surface is a detailed description of the adsorbate-adsorbent bonds that a given catalyst will develop when contacted with a given reaction mixture. Therefore, chemical characterization should be done in situ in the course of the reaction itself. However, because of experimental limitations, this is seldom possible and catalyst surfaces are usually characterized by means of separate experiments. It is important to characterize the catalyst surface both before and after its use in a reaction. [Pg.539]

Some of the chemical concepts with little or no quantum-mechanical meaning outside the Bohmian formulation but, well explained in terms of the new interpretation, include electronegativity, the valence state, chemical potential, metallization, chemical bonding, isomerism, chemical equilibrium, orbital angular momentum, bond strength, molecular shape, phase transformation, chirality and barriers to rotation. In addition, atomic stability is explained in terms of a simple physical model. The central new concepts in Bohmian mechanics are quantum potential and quantum torque. [Pg.62]

It is known that the contact of two solids resnlts in the appearance of adhesion strength dne to the interaction between snrface atoms. It has been stated that the interaction forces are changed with the distance between the snrfaces of the condensed solids as 1/r [34,35]. Specific attraction forces are eqnal to 0.15 MPa at a distance of abont 10 nm, 30 MPa at 3 nm, and reach 110 MPa at 1 nm. This means that at a distance of the order of atom size, van der Waals forces become very large, that helps redistribution of electrons to form a new chemical bond. [Pg.177]

Chemical bonds, covalent or ionic as shown in Figure 6c and d, at the metal oxide/deposit surface are potentially strong with theoretical values over 10 N m. it is however, impossible to estimate the number of sites and the size of contact areas at the interface where the chemical bonds may be effective. In any case, the cohesive strength of the deposit matrix is the limiting factor since it is lower than that of chemical bonds by several orders of magnitude. In practice, this means that when a strongly adhering deposit is subjected to a destructive force, e.g. sootblower jet, failure occurs within the deposit matrix and there remains a residual layer of ash material firmly bonded to the tube surface. [Pg.313]

Thermodynamic arguments cannot be used to derive the reaction path of dissociating CO. We will show below that the minimum-energy reaction path is that path which leads to maximum electron population of the bond weakening CO 2t orbitals. Dissociation can be studied by means of the AS ED method, introduced by Anderson I and discussed in section (2.2). In order to predict equilibrium distances and dissociation paths, the total bond strength has to be considered to be the sum of a repulsive and an attractive part. In the ASED method the attractive path of the chemical bond strength is computed with the aid of the Extended-Huckel method. Anderson has developed empirical expressions for the repulsive part of the chemical band. If used with care, they yield remarkably useful results. [Pg.222]

In general, what do we mean by a chemical bond What does the bond energy tell us about the strength of a chemical bond Name the principal types of chemical bonds. [Pg.400]


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See also in sourсe #XX -- [ Pg.33 ]




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