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Chemical bonding strength

A term that is widely used (and sometimes abused) in discussions about metal-water interactions is hydrophilicity. By this term is meant the strength of interaction between a metal surface and water molecules in contact with it, and the term usually implies chemical bond strength. However, there is a problem with the way hydrophilicity scales are built up. Various quantities (capacitance, adsorption energy, etc.) are used to rank the metals, and the hydrophilicity scale may differ for different parameters. [Pg.191]

Many of the parameters above are by themselves interrelated. Thus, the heat of sublimahon characterizing the chemical bond strength in the crystal lathee correlates with the temperature of fusion and with the compressibility of a metal. Therefore, finding a correlahon with a new parameter does not necessarily imply the gain of new, independent information concerning the nature of catalyhc achon. [Pg.526]

A good indication of the importance of chemical bond strengths in determining hardness is the correlation between the heats of formation of compounds and their hardnesses. An example for III-V compounds is shown in Figure 5.13.The heat of formation density is equivalent to the bond modulus. This provides further evidence of the importance of chemical bond strength in determining hardness. [Pg.77]

In general, there are insufficient data available for quantitative estimates to be made of the hardnesses of intermetallic compounds. However, in some cases trends can be verified. Figure 8.11 illustrates one of these. It indicates that hardnesses and heats of formation tend to be related. In this case for a set of transition metal aluminides. The correlation in this case might have been improved if the heats per molecular volume couls have been plotted, but thr molecular volumes were not available. Nevertheless, the correlation is moderately good indicating that hardness and chemical bond strengths are related as in other compounds. [Pg.116]

Methods for relating hardness values to other physical properties are presented, particularly chemical bond strengths. There is no universal method for doing this, although there have been attempts by other authors to do it with varying degrees of success. For example, see Gao, 2004. [Pg.143]

There are alternative ways of viewing the previous problem that are closer to the idealized concept of chemical bond strength. Consider reaction 5.20, where all the chromium-ligand bonds are cleaved simultaneously. The enthalpy of this disruption reaction at 298.15 K, calculated as 497.9 10.3 kJ mol-1 by using enthalpy of formation data [15-17,31], can be given as a sum of three chromium-carbonyl and one chromium-benzene bond enthalpy contributions (equation 5.21). [Pg.68]

Virtually unlimited however, a given molecule may be effectively adsorbed only over a small range Wide range, related to the chemical bond strength— typically 40-800 kJ/mol... [Pg.32]

Electronic relaxation times fall in the range 10-7 to 10 13 s (Fig. 3.4), whereas the exchange time can be indefinitely long or as short as 10-10 s, depending on the chemical bond strength. As far as rotation is concerned, the rotational correlation time can be predicted for spherical rigid particles [1-3]. [Pg.81]

Yoshida, H., Yamamoto, T., Ikuhara, Y., and Sakuma, T., A change in the chemical bonding strength and high-temperature creep resistance in A1203 with lanthanoid oxide doping Phil. Mag, 2002, A82, 511-25. [Pg.457]

The accuracy of the various relativistic, non-relativistic, correlated and non-correlated methods in comparison with experimental results is shown in Table 1 for AuH, a sort of a test molecule (see also [63,64]). The data of Table 1 demonstrate the importance of relativistic and electron correlation effects. Thus, relativistic effects diminish the equilibrium bond length (Re) by 0.26 A (the HF-DF difference without correlation) or by 0.21 A (the HF+MP2 - DF+MP2 difference with correlation), and enlarge the binding energy (De) by 0.70 eV (the HF-DF difference without correlation) or by 2.21 eV (the HF+MP2 - DF+MP2 difference with correlation). Correlation diminishes Re on the DF level by 0.07 eV, but enhances De by 1.34 eV. Thus, even for AuH correlation amounts almost to 50% of the chemical bond strength. No additivity of correlation and relativistic effects was shown. [Pg.43]

In addition, the Mulliken population analysis [2] is common in the field of molecular orbital calculations, and the nature of the chemical bond between atoms has been treated well by using a standard concept of covalent or ionic bond. However, with this analysis it is still difficult to compare quantitatively the chemical bond strength among a variety of materials. To solve this problem, the chemical bond should be estimated quantitatively in an energy scale. [Pg.146]

The bond energy is a direct measure of chemical bond strength. Its value is determined by the work necessary to destruct the bond between the atoms of molecular structure (or the gain of energy in the formation process of this structure from atoms). If the molecule contains two or more similar bonds, the break-off energy of this bond differs from its average energy (by all bonds). [Pg.13]

P) is positive the reaction is endothermic at T and/ . These definitions of exothermic and endothermic are equivalent to the ones given earlier in terms of chemical bond strengths. (Convince yourself)... [Pg.443]

What causes the phenomenon of stress and strain reduction and why is the reduction in impact and work properties so visible at small or negligible changes in elastic modulus and ultimate strengths As discussed previously, mechanical properties deal with stress and strain relationships that are simply functions of chemical bond strength. At the molecular level, strength is related to both covalent and hydrogen intrapolymer bonds. At the microscopic level, strength... [Pg.237]

Therefore, in order to absorb and desorb hydrogen smoothly without the onset of any disproportionation reaction, the A/B compositional ratio should be controlled in a proper manner, depending on the chemical bond strength between... [Pg.207]

The semi-empirical CNDO/2 method has been applied64 to an analysis of the electronic structure and conformation of disulphur decafluoride. The results, in good agreement with the available experimental data, enable the calculation of the electronic terms which determine the shape of the potential surface and a discussion of the electronic non-equivalence of the axial and equatorial fluorine atoms, the chemical bond strength, and the anomalous S—S bond length in the S2F10 molecule. [Pg.413]

The separation of these cumulative effects is not an easy task, but is necessary for the determination of thermodynamic parameters, such as chemical bond strengths. Measuring very dilute water solutions at 3.9 °C, where the thermal expansion coefficient of water vanishes (or at slightly lower temperatures in more concentrated aqueous solutions, such as buffer solutions) can be used to separate the so-called structural volume changes from the thermal effects due to radiationless deactivation.253,254 In this way, it is also possible to determine the entropy changes concomitant with the production or decay of relatively short-lived species (e.g. triplet states), a unique possibility offered by these techniques.254 255... [Pg.132]

Chapter 11 presents and discusses porous SiC use in catalysis for which the large porous film surface areas are again clearly useful. SiC s high chemical bond strength allows its use at high temperature and renders it resistant to oxidative erosion. [Pg.339]

Phonon velocity is constant and is the speed of sound for acoustic phonons. The only temperature dependence comes from the heat capacity. Since at low temperature, photons and phonons behave very similarly, the energy density of phonons follows the Stefan-Boltzmann relation oT lvs, where o is the Stefan-Boltzmann constant for phonons. Hence, the heat capacity follows as C T3 since it is the temperature derivative of the energy density. However, this T3 behavior prevails only below the Debye temperature which is defined as 0B = h( DlkB. The Debye temperature is a fictitious temperature which is characteristic of the material since it involves the upper cutoff frequency ooD which is related to the chemical bond strength and the mass of the atoms. The temperature range below the Debye temperature can be thought as the quantum requirement for phonons, whereas above the Debye temperature the heat capacity follows the classical Dulong-Petit law, C = 3t)/cb [2,4] where T is the number density of atoms. The thermal conductivity well below the Debye temperature shows the T3 behavior and is often called the Casimir limit. [Pg.631]

According to q.(2.31) only the correction due to double counting of the electron- electron interactions on the same atom has to be explicitly accounted for. Within the Extended-Huckel method this correction is usually ignored. As we will sec later, depending on orbital occupation the contribution to the chemical bond strength... [Pg.32]

Changing the hybridization from spz to sp2 increases the s character of the chemical bond. This enhances the attractive contribution of the chemical bond strength and shortens the Si-Si bonds. The surface Si atom is pulled into the plane formed by its nearest-neighbor surface atoms. This changes sp to sp2 hybridization see Fig.(2.29). The p orbital of the unsaturated Si atom perpendicular to the surface can now become stabilized by overlap with the Si-Si bonds between the next-neighbor Si atom. Such hybridization has been observed for quartz by... [Pg.70]

Ek]uations (2.245) which we derived within the weak adsorption limit are useful to illustrate more explicitly the consequences of image potential charges for the chemical bond strength. [Pg.140]

Thermodynamic arguments cannot be used to derive the reaction path of dissociating CO. We will show below that the minimum-energy reaction path is that path which leads to maximum electron population of the bond weakening CO 2t orbitals. Dissociation can be studied by means of the AS ED method, introduced by Anderson I and discussed in section (2.2). In order to predict equilibrium distances and dissociation paths, the total bond strength has to be considered to be the sum of a repulsive and an attractive part. In the ASED method the attractive path of the chemical bond strength is computed with the aid of the Extended-Huckel method. Anderson has developed empirical expressions for the repulsive part of the chemical band. If used with care, they yield remarkably useful results. [Pg.222]

When the stress at the crack tip reaches the strength of the material as calculated from chemical bond strength, bonds will break and the crack will lengthen, leading to fracture. The critical stress for a material with a crack is found to be (Section S4.2.2) ... [Pg.304]


See other pages where Chemical bonding strength is mentioned: [Pg.445]    [Pg.198]    [Pg.184]    [Pg.148]    [Pg.266]    [Pg.443]    [Pg.132]    [Pg.46]    [Pg.307]    [Pg.135]    [Pg.174]    [Pg.198]    [Pg.256]    [Pg.403]    [Pg.98]    [Pg.101]    [Pg.3766]    [Pg.202]    [Pg.123]    [Pg.138]    [Pg.139]    [Pg.295]    [Pg.302]    [Pg.480]   
See also in sourсe #XX -- [ Pg.41 ]




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