Cathode magnetron

Figure 3.9 Angled view of the toroidal glow on cathode magnetron.

Cathodic magnetron discharge (CM-A), where the cathode magnetron (CM) is used against a planar electrode without magnetron (A). 

Figure 15.1 Schematic view of cathode-magnetron DC glow discharge of argon in the interelectrode space interelectrode distance = 102 mm, the luminous regions are shown shaded.

Figure 15.6 The distribution profile of in the interelectrode space on the center plane in the CM-A mode (cathode magnetron) discharge 2seem, SOmtorr, 10 W, electrode separation distance 76 mm.

Electron temperature and electron density as a function of axial distance (from cathode) are depicted for two radial positions (same as for cathode magnetron depicted in Figure 15.8) in Figure 15.12. Radial distributions at two axial positions are shown in Figure 15.13. Negative glow is pushed toward the cathode and... 

Comparison of Cathode Magnetron, Anode Magnetron, Nonmagnetron Discharges... 

Figure 15.9 Radial distribution of electron temperature and electron density for two axial positions in cathode magnetron DC glow discharge of Ar 10 W, 2 seem, SOmtorr, and 76 mm electrode distance.

The radial distribution of electron temperature and electron density shown in Figures 15.16 and 15.17 clearly show the difference due to the presence of the cathode magnetron toroidal glow. In cathode magnetron discharge, there are two... 

One possible solution to this problem has been worked out by Lafferty 109), who focussed the ions from a hot-cathode magnetron gauge onto an ion multiplier system. Even for an emission current of only 10 7 amp, the multiplier current was estimated at 2 x 10-9 amp at 4 x 10-15mm. 

Marumo Y, Yang Z, Chung YW. Optimization of properties of carbon nitride and CN /TiN coatings prepared by single-cathode magnetron sputtering. Surf Coat Technol 86-87 586, 1996. 

D.M. Mattox, R.E. Cuthrell, C.R. Peeples, PL. Dreike, Design and performance of a moveable-post Cathode Magnetron Sputtering System for making PBFAII accelerator ion sources, Surf. Coat. Technol. 33 (1987) 425. 

It is possible for a surface in contact with a plasma to generate a positive self-bias. This occurs when electrons are kept from the surface by a magnetic field but positive ions reach the surface by diffusion. An example is in the post cathode magnetron sputtering configuration with a floating substrate fixture, which can attain a positive self-bias. 

For example, the residual film stress in post cathode magnetron-sputtered deposited films depends on the relative orientation of the him with respect to the post cathode orientation and the sputtering pressureJ A major problem with energetic neutral bombardment of the growing him is that it is very dependent on pressure and is often not recognized nor controlled. 

R.E. Cuthrell, D.M. Mattox, C.R. Peeples, P.L. Dreike, K.L. Lamppa, Residual stress anisotropy, stress control and resistivity in post cathode magnetron sputter-deposited molybdenum films, J. Vac. Sci. Technol. A6 (1988) 2914. 

The residual film stress anisotropy can be very sensitive to geometry and gas pressure during sputter deposition. This is due to the anisotropic distribution of sputtered atom flux, anisotropic bombardment by high energy reflected neutrals, and the effect of gas phase and surface collisions at higher pressures. Figure 10.11 shows the effect of gas pressure on residual film stress in post cathode magnetron sputter deposition of molybdenum,... 

Figure 10.11 Effect of Gas Pressure on Residual Film Stress in a Post Cathode Magnetron Sputter-deposited Molybdenum Film. Reproduced from Mattox and Cuthrell (1988)[ 1...

---