Anode magnetron cathodic polymerization

Figure 4.3 Change of the luminous gas phase of trimethylsilane (TMS) with reaction time for cathodic polymerization with two magnetron-anodes, 5 W left column closed system from the initial pressure of SOmtorr, right column flow system at SOmtorr, top row 5 s, middle row 60s, bottom row 180s.

Can the anode magnetron be used in the precleaning process of the metallic substrate that is used as the cathode in the cathodic plasma polymerization In a more broad sense, can the surface of metal (cathode) be cleaned by argon direct current (DC) discharge sputtering ... 

ANODE MAGNETRON FOR CATHODIC POLYMERIZATION 4.1. Effect of Magnetic Field Configuration... 

The distribution of the deposition rate in an AMC plasma polymerization system with PM, OM, or NM anodes is shown in Figure 15.25. These results show that the anode magnetron shifts the deposition pattern to high in the center of the cathode. The edge effect diminishes but a small peak appears in the center. The distribution with OM configuration seems to be more uniform than that with PM configuration, but because of the uniformity the deposition rate at center portion is slightly lower. 

In plasma polymerization, the character of the dissociation glow that occurs near the surface of the cathode is more important than ion bombardment in determining the deposition rate and its distribution described in previous chapters. The edge effect seems to be less pronounced in LCVD than in the sputtering of the cathode material. The anode magnetrons seem to overcompensate the edge effect in LCVD. 

The effects of anode magnetron in sputter cleaning and in cathodic plasma polymerization could be summarized as follows. 

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