Aluminum oxide, deposition

Earlier observations by Cesario et al. [60] of a decay in fluorescence for arrays of Au nanoparticles spaced above a Ag film by a Si02 layer of increasing thickness, were interpreted as due to the finite vertical extent of the evanescent fields associated with a surface plasmon. In this model the coupling results in an enhanced interaction between individual localized plasmons at individual nanostructures [61] and thus an enhancement in the radiative efficiency increasing the spacer layer thickness moves the nanowires out of the evanescent field of the surface plasmon. A possible physical mechanism for the experimentally observed decay involves nonradiative decay of the excited states. The aluminum oxide deposited in these experiments was likely to be nonstoichio-metric, and defects in the oxide could act as recombination centers. Thicker oxides would result in higher areal densities of defects, and decay in fluorescence. A definitive assignment of the mechanism for the observed fall off of fluorescence would require determination of the complex dielectric function of our oxides (as deposited onto an Ag film), and inclusion in the field-square calculations. Finally it should be noted that at very small thicknesses quenching of the fluorescence is expected [38,62] consistent with observations of an optimum nanowire-substrate spacer thickness. 

Boehmite (OC-Aluminum Oxide-Hydroxide). Boehmite, the main constituent of bauxite deposits in Europe, is also found associated with gibbsite in tropical bauxites in Africa, Asia, and Austraha. Hydrothemial transformation of gibbsite at temperatures above 150 °C is a common method for the synthesis of weU-cry stalhzed boehmite. Higher temperatures and the presence of alkali increase the rate of transfomiation. Boehmite ciy stals of 5—10 ]liii size (Fig. 3) are produced by tliis method. Fibrous (acicular) boehmite is obtained under acidic hydrothemial conditions (6). Excess water, about 1% to 2% higher than the stoichiometric 15%, is usually found in hydrothemiaHy produced boehmite. 

Starting with a ceramic and depositing an aluminum oxide coating. The aluminum oxide makes the ceramic, which is fairly smooth, have a number of bumps. On those bumps a noble metal catalyst, such as platinum, palladium, or rubidium, is deposited. The active site, wherever the noble metal is deposited, is where the conversion will actually take place. An alternate to the ceramic substrate is a metallic substrate. In this process, the aluminum oxide is deposited on the metallic substrate to give the wavy contour. The precious metal is then deposited onto the aluminum oxide. Both forms of catalyst are called monoliths. 

An alternate form of catalyst is pellets. The pellets are available in various diameters or extruded forms. The pellets can have an aluminum oxide coating with a noble metal deposited as the catalyst. The beads are placed in a tray or bed and have a depth of anywhere from 6 to 10 inches. The larger the bead (1/4 inch versus 1/8 inch) the less the pressure drop through the catalyst bed. However, the larger the bead, the less surface area is present in the same volume which translates to less destruction efficiency. Higher pressure drop translates into higher horsepower required for the oxidation system. The noble metal monoliths have a relatively low pressure drop and are typically more expensive than the pellets for the same application. 

The reinforcing fibers are usually CVD SiC or modified aluminum oxide. A common matrix material is SiC deposited by chemical-vapor infiltration (CVI) (see Ch. 5). The CVD reaction is based on the decomposition of methyl-trichlorosilane at 1200°C. Densities approaching 90% are reported.b l Another common matrix material is Si3N4 which is deposited by isothermal CVI using the reaction of ammonia and silicon tetrachloride in hydrogen at 1100-1300°C and a total pressure of 5 torr.l" " ] The energy of fracture of such a composite is considerably higher than that of unreinforced hot-pressed silicon nitride. 

Suh JS, Lee JS (1997) Surface enhanced Raman scattering for CdS nanowires deposited in anodic aluminum oxide nanotemplate. Chem Phys Lett 281 384-388... 

Xu D, Chen D, Xu Y, Shi X, Guo G, Gui L, Tang Y (2000) Preparation of II-VI group semiconductor nanowire arrays by dc electrochemical deposition in porous aluminum oxide templates. Pure Appl Chem 72 127-135... 

Porous aluminum oxide can be used as a template for the production of nanowires and nanotubes. For example, metals can be deposited on the pore walls by the following procedures deposition from the gas phase, precipitation from solution by electrochemical reduction or with chemical reducing agents, or by pyrolysis of substances that have previously been introduced into the pores. Wires are obtained when the pore diameters are 25 nm, and tubes from larger pores the walls of the tubes can be as thin as 3 nm. For example, nanowires and nanotubes of nickel, cobalt, copper or silver can be made by electrochemical deposition. Finally, the aluminum oxide template can be removed by dissolution with a base. 

The use of aluminum-based masks in photolithography has been proposed.347 According to the scheme employed, aluminum is deposited onto a polished glass sheet. The regions of the mask that should be light transparent are then converted into porous oxide. As the operation of aluminum anodization exhibits a much better vertical anisotropy than chemical etching, the masks obtained reproduce the parameters of standard masks more precisely than the chromium masks usually used. 

Choi, J. G., Rhee, H. K., and Moon, S. H. 1985. IR and TPD study of fresh and carbon-deposited aluminum oxide-supported cobalt catalysts. Appl. Catal. 13 269-80. 

Figure 4.6. Cross-sectional SEM images of an A1PO film deposited on Si02 and cured at (a) 275 °C, and (b) flash annealed to 600 °C. [Reproduced with permission. Meyers, S. T. Anderson, J. T. Hong, D. Hung, C. M. Wager, J. F. Keszler, D. A. 2007. Solution processed aluminum oxide phosphate thin-film dielectrics. Chem. Mater. 19 4023-4029. Copyright 2007 American Chemical Society.]...

The organic deposition sources are made of a variety of materials including ceramics (e.g., boron nitride, aluminum oxide, and quartz) or metallic boats (e.g., tantalum or molybdenum). Deposition is carried out in high vacuum at a base pressure of around 10-7 torr. The vacuum conditions under which OLEDs are fabricated are extremely important [41] and evaporation rates, monitored using quartz oscillators, are typically in the range 0.01 0.5 nm/s in research and development tools. In manufacturing, higher rates or multiple sources may be used to reduce tact times. 

Aluminum coating (for surface fluorescence quenching see Section 13.5.5) can be accomplished in a standard vacuum evaporator the amount of deposition can be made reproducible by completely evaporating a premeasured constant amount of aluminum. After deposition, the upper surface of the aluminum film spontaneously oxidizes in air very rapidly. This aluminum oxide layer appears to have some similar chemical properties to the silicon dioxide of a glass surface it can be derivatized by organosilanes in much the same manner. 

TiN film of approximately 300 A is typically used in the back-end interconnect process, as both the cap layer for the aluminum metal deposition sequence and an antireflective coating for the subsequent photolithography step. Since this TiN cannot be a substrate for oxide thickness measurement in ILD, the aluminum beneath the TiN must be used as the substrate. In other words, the TiN is a component of the film to be measured. Thus, its refractive index or thickness must be known to determine the unknown oxide thickness. However, the refractive index of TiN is not constant, but varies with thickness. As a result, the TiN thickness must be precisely controlled to enable the validity of the substrate modeling. 

Lu P, Demirkan K, Opila RL, Walker AV (2008) Room-temperature chemical vapor deposition of aluminum and aluminum oxides on alkanethiolate self-assembled monolayers. J Phys Chem C 112(6) 2091-2098... 

WohlfartP, WeiB J, Kashammer J, Kreiter K, Winter C, Fischer RA, Mittler-Neher S (1999) MOCVD of aluminum oxide/hydroxide onto organic self-assembled monolayers. Chem Vap Deposition 5(4) 165-170... 

Fig. 1.19. Metal insuiator-metal tunneling junction. The junction is made through the following steps, (a) The substrate, a glass slide with indium contacts, (b) An aluminum strip is vacuum deposited, (c) The aluminum strip is heated in air to form a very thin (—30 A) aluminum oxide (AI2O3). (d) A lead film is deposited across the aluminum strip, forming an Al-Al203-Pb sandwich. (After Giaever and Megerle, 1961.)...

A variety of nanomaterials have been synthesized by many researchers using anodic aluminum oxide film as either a template or a host material e.g., magnetic recording media (13,14), optical devices (15-18), metal nanohole arrays (19), and nanotubes or nanofibers of polymer, metal and metal oxide (20-24). No one, however, had tried to use anodic aluminum oxide film to produce carbon nanotubes before Kyotani et al. (9,12), Parthasarathy et al. (10) and Che et al. (25) prepared carbon tubes by either the pyrolytic carbon deposition on the film or the carbonization of organic polymer in the pore of the film. The following section describes the details of the template method for carbon nanotube production. 

In addition to the impregnation method with furfuryl alcohol, Kyotani et al. attempted to deposit pyrolytic carbon on the inside of the straight channels of anodic oxide film in the following way (9,12). They used two types of anodic aluminum oxide films with different channel diameters (30 and 230 nm). Each anodic oxide film... 

---