Ultraviolet lithography

For sufficiently long irradiation times (15-30 min), a yellow precipitate appeared at the bottom of the vial. XRD showed that the precipitate was cubic CdS. Formation of CdS precipitates for long irradiation times suggested that the absorption band in the 270-290 nm region was due to very small CdS nanoparticles. Formation of CdS in the illuminated solutions is likely related to the photodissociation of the Cd—thiolate complexes. It is known that the outer ligands of Cd thiolates [25, 26] and thiols bound to the surface of CdS particles [27] are detached by exposure to ultraviolet UghL 

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Extrapolating properties, defined, 16 729 Extra spring copper alloys, 7 723t Extreme ambient conditions, lubrication and, 15 252-256 Extreme-case analysis, 9 547 Extreme environments, solid and liquid lubricants for, 15 256 Extremely low toxic substances, 23 113 Extreme pressure (EP) lubrication regime, 15 214. See also EP entries Extreme purity gases, analyses of, 13 468 Extreme ultraviolet lithography, 15 189-191... 

Ultraviolet light stabilizers, for PVC polymers, 25 675 Ultraviolet lithography, extreme,... 

M.W. Horn, S.W. Pang, and M. Rothschild, Plasma deposited organosilicon thin films as dry resists for deep ultraviolet lithography, J. Vac. Sci. Technol. B 8, 1493 (1990). 

B.V. Yakshinksiy, R. Wasielewski, E. Loginivoa, M.N. Hedhili, and T.E. Madey, DIET pro cesses on ruthenium surfaces related to extreme ultraviolet lithography, Surf. Sci. 602(20), 3220... 

La Fontaine, EUV optics, in Extreme Ultraviolet Lithography, B. Wu, A. Kumar, Eds., Chapter 4, McGraw Hill, New York (2009). 

Montcalm, S. Bajt, P.B. Mirkarimi, E. Spiller, F.J. Weber, and J.A. Folta, Multilayer reflective coatings for extreme ultraviolet lithography, Proc. SPIE 3331, 42 51 (1998). 

B.J. Lin, Sober view on extreme ultraviolet lithography, J. Microlith., Microfab., Microsyst. 5, 033005 (2006). 

Hollenshead and L. Klehanoff, Modeling extreme ultraviolet/H20 oxidation of ruthenium optic coatings, J. Vac. Sci. Technol. B 24,118 130 (2006) Y. Gomei, H. Takase, T. Aoki, Y. Kakutani, and M. Niihe, Scaling law in acceleration test of extreme ultraviolet lithography projection optics mirror contamination, J. Vac. Sci. Technol. B 23, 2848 2851 (2005) A.N. Broers, W.W. Molzen, J.J. Cuomo, N.D. Wittels, Electron beam fabrication of 80A metal structures, Appl. Phys. Lett. 29, 596 598 (1976). 

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