Tungsten hexafluoride oxidant

CVD processing can be used to provide selective deposition on certain areas of a surface. Selective tungsten CVD is used to fill vias or holes selectively through siUcon oxide layers in siUcon-device technology. In this case, the siUcon from the substrate catalyzes the reduction of tungsten hexafluoride, whereas the siUcon oxide does not. Selective CVD deposition can also be accompHshed using lasers or focused electron beams for local heating. 

Tungsten tetrabromide oxide, 0294 Uranium hexachloride, 4192 Uranium hexafluoride, 4375 Vanadium dichloride, 4118... 

Oj+[PtF5] (c). On the other hand, tungsten hexafluoride does not oxidize nitric oxide. Since /(NO) = 213 kcal. mole and the lattice energy for a salt NO+[MFj]" would be 125 kcal. mole", then the minimum electron affinity of MFj, for salt formation, is required to be 90 kcal. mole". ... 

Tungsten hexafluoride, WF (mp 2.5 °C, bp 17 °C) [529], resembles M0F5 and M0OCI3 in its oxidative properties. However, less exotic reagents such as ozone, ammonium cerium sulfate, or zinc dichromate may be used for a similar purpose. 

METHYL ORTHOSILICATE (681-84-5) Forms explosive mixture with air (flash point 68°F/20°C). Reacts with water, forming methanol and silicic acid. Violent reaction with strong oxidizers, metallic hexafluorides (e.g., molybdenum hexafluorides, tungsten hexafluorides, uranium hexafluorides, etc.). Incompatible with strong acids, nitrates. 

Oxidative cleavage of hydrazones. Dimethylhydrazones and tosylhydrazones are reductively cleaved to carbonyl compounds by either M0OCI3 or MoFo. Yields are generally in the range of 70-90%. Cf. Tungsten hexafluoride, this volume. 

HYDRAZONE, OXIMES Molybdenum(V) trichloride oxide. Tungsten hexafluoride. 

One-electron oxidation of hexafluorobenzene by co-condensation of the arene and tungsten hexafluoride onto the salt Oa+AsFa" at —196 °C leads to the reaction ... 

Chlorotrifluoroethylene polymer vapor degreasing 2,3-Dihydrodecafluoropentane Trichlorotrifluoroethane vapor permeability enhancer, copolymer film Diacetone acrylamide vapor plating, cobalt Cobalt acetylacetonate vapor pressure depressant, aerosols 1,1,1-Trichloroethane vapor-phase deposition, tungsten Tungsten hexafluoride varistor mfg., electronics Cobalt (II, III) oxide varnish Isobutyric acid varnish ingredient 2,2, 4,4, 5,5 -Hexachlorobiphenyl varnish ingredient, rosin Rosin... 

Phosphorus trichloride Silicon tetrachloride Sulfuryl chloride Thionyl chloride Titanium tetrachloride Tungsten hexafluoride gas Vanadium tetrachloride 365 Inorganic Acid Oxides Sulfur dioxide Sulfur trioxide 370 Inorganic Acids... 

The reaction between molybdenum hexacarbonyl and elemental fluorine at —65° results in the formation of Mo2F9, which upon thermal degradation produces molybdenum pentafluoride as one of the products.1 Other syntheses of molybdenum pentafluoride include the reduction of molybdenum hexafluoride with phosphorus trifluoride,2 tungsten hexacarbonyl, or molybdenum metal at high temperatures3 and the oxidation of powdered molybdenum metal with elemental fluorine at 900°.3 The present method consists in the reaction of molybdenum hexafluoride with powdered molybdenum metal at 60° and results in the formation of pure molybdenum pentafluoride in yields of 80% and greater. 

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