Hexafluoride metal

A study of the uranium hexafluoride-metal fluoride complexes was undertaken by Sheft et al. (77) by the use of radioactive fluorine-18 exchange methods. The exchangeability of fluorine between uranium hexafluoride and metal fluorides can be used as a measure of the extent to which reaction occurs. If a complex compound actually forms between uranium hexafluoride and a metal fluoride, then the fluorine atoms become equivalent and randomization of the radioactivity occurs. Complete exchange of the fluorine atoms is found to occur between sodium fluoride labeled... 

The reactivity of fluorine compounds varies from extremely stable, eg, compounds such as sulfur hexafluoride [2551-62 ] nitrogen trifluoride [7783-54-2] and the perfluorocarbons (see Fluorine compounds, organic) to extremely reactive, eg, the halogen fluorides. Another unique property of nonionic metal fluorides is great volatiUty. Volatile compounds such as tungsten hexafluoride [7783-82-6] molybdenum hexafluoride [7783-77-9] ... 

Fluorination of tungsten and rhenium produces tungsten hexafluoride, WF, and rhenium hexafluoride [10049-17-9J, ReF, respectively. These volatile metal fluorides are used in the chemical vapor deposition industry to produce metal coatings and intricately shaped components (see Thin films,... 

Molybdenum hexafluoride is used in the manufacture of thin films (qv) for large-scale integrated circuits (qv) commonly known as LSIC systems (3,4), in the manufacture of metallised ceramics (see MetaL-MATRIX COMPOSITES) (5), and chemical vapor deposition of molybdenum and molybdenum—tungsten alloys (see Molybdenumand molybdenum alloys) (6,7). The latter process involves the reduction of gaseous metal fluorides by hydrogen at elevated temperatures to produce metals or their alloys such as molybdenum—tungsten, molybdenum—tungsten—rhenium, or molybdenum—rhenium alloys. 

Rhenium hexafluoride is readily prepared by the direct interaction of purified elemental fluorine over hydrogen-reduced, 300 mesh (ca 48 pm) rhenium powder at 120°C. The reaction is exothermic and temperature rises rapidly. Failure to control the temperature may result in the formation of rhenium heptafluoride. The latter could be reduced to rhenium hexafluoride by heating with rhenium metal at 400°C. 

Rhenium hexafluoride is used for the deposition of rhenium metal films for electronic, semiconductor, laser parts (6—8), and in chemical vapor deposition (CVD) processes which involve the reduction of ReF by hydrogen at elevated (550—750°C) temperatures and reduced (<101.3 kPa (1 atm)) pressures (9,10). 

Rhenium hexafluoride is a cosdy (ca 3000/kg) material and is often used as a small percentage composite with tungsten or molybdenum. The addition of rhenium to tungsten metal improves the ductility and high temperature properties of metal films or parts (11). Tungsten—rhenium alloys produced by CVD processes exhibit higher superconducting transition temperatures than those alloys produced by arc-melt processes (12). 

At elevated temperatures SF forms the respective fluorides and sulfides with many metals (25). In quart2, it starts to decompose at 500°C (1) in copper or stainless steel, it is less stable (26). The stabiUty of SF at 200 and 250°C in the presence of aluminum, copper, siUcon steel, and mild steel is shown in Table 2 (14). Careful exclusion of moisture from the system improves the stabiUty of sulfur hexafluoride in the presence of most materials. 

Specifications. The use of tungsten hexafluoride in CVD appHcations in the manufacture of high density siUcon chips requires a high purity product, essentially free of all metallic contaminants. Several grades of WF are available. Table 2 shows the specifications for three grades of WF. ... 

Elemental tellurium and the stable teUurides of heavy nonferrous metals are relatively inert and do not represent a significant health hazard (43—47). Other, more reactive teUurides, including soluble and volatile teUurium compounds such as hydrogen teUuride [7783-09-7] teUurium hexafluoride [7783-80-4] and alkyl teUurides, should be handled with caution. Some of these materials can enter the body by absorption through the skin or by inhalation and ingestion of dust or fumes. No serious consequences or deaths have been reported in workers exposed to teUurium and its compounds in industry (48). 

In TBP extraction, the yeUowcake is dissolved ia nitric acid and extracted with tributyl phosphate ia a kerosene or hexane diluent. The uranyl ion forms the mixed complex U02(N02)2(TBP)2 which is extracted iato the diluent. The purified uranium is then back-extracted iato nitric acid or water, and concentrated. The uranyl nitrate solution is evaporated to uranyl nitrate hexahydrate [13520-83-7], U02(N02)2 6H20. The uranyl nitrate hexahydrate is dehydrated and denitrated duting a pyrolysis step to form uranium trioxide [1344-58-7], UO, as shown ia equation 10. The pyrolysis is most often carried out ia either a batch reactor (Fig. 2) or a fluidized-bed denitrator (Fig. 3). The UO is reduced with hydrogen to uranium dioxide [1344-57-6], UO2 (eq. 11), and converted to uranium tetrafluoride [10049-14-6], UF, with HF at elevated temperatures (eq. 12). The UF can be either reduced to uranium metal or fluotinated to uranium hexafluoride [7783-81-5], UF, for isotope enrichment. The chemistry and operating conditions of the TBP refining process, and conversion to UO, UO2, and ultimately UF have been discussed ia detail (40). 

Uranium hexafluoride [7783-81-5], UF, is an extremely corrosive, colorless, crystalline soHd, which sublimes with ease at room temperature and atmospheric pressure. The complex can be obtained by multiple routes, ie, fluorination of UF [10049-14-6] with F2, oxidation of UF with O2, or fluorination of UO [1344-58-7] by F2. The hexafluoride is monomeric in nature having an octahedral geometry. UF is soluble in H2O, CCl and other chlorinated hydrocarbons, is insoluble in CS2, and decomposes in alcohols and ethers. The importance of UF in isotopic enrichment and the subsequent apphcations of uranium metal cannot be overstated. The U.S. government has approximately 500,000 t of UF stockpiled for enrichment or quick conversion into nuclear weapons had the need arisen (57). With the change in pohtical tides and the downsizing of the nation s nuclear arsenal, debates over releasing the stockpiles for use in the production of fuel for civiUan nuclear reactors continue. 

Electroplating. Aluminum can be electroplated by the electrolytic reduction of cryoHte, which is trisodium aluminum hexafluoride [13775-53-6] Na AlE, containing alumina. Brass (see COPPERALLOYS) can be electroplated from aqueous cyanide solutions which contain cyano complexes of zinc(II) and copper(I). The soft CN stabilizes the copper as copper(I) and the two cyano complexes have comparable potentials. Without CN the potentials of aqueous zinc(II) and copper(I), as weU as those of zinc(II) and copper(II), are over one volt apart thus only the copper plates out. Careful control of concentration and pH also enables brass to be deposited from solutions of citrate and tartrate. The noble metals are often plated from solutions in which coordination compounds help provide fine, even deposits (see Electroplating). 

The octahedral hexafluorides are obtained directly from the elements and both are volatile, extremely reactive and corrosive solids, RhFg being the least stable of the platinum metal hexafluorides and reacting with glass even when carefully dried. They are thermally unstable and must be frozen out from the hot gaseous reaction mixtures, otherwise they dissociate. 

Switchgear is frequently described by the medium used in the interrupting device and method of mounting. The principal types of medium presently in operation are bulk oil, minimum oil, air, sulfur hexafluoride gas (SFg) and vacuum. The most common mounts for indoor industrial switchgear are cubicle and metal clad. The main features of and the perceived advantages and disadvantages of the different types of medium are reviewed below, while international standards applicable to switchgear are listed in Table 16.2. 

Like several other heavy metals, osmium forms a volatile (bright yellow) hexafluoride (m.p. 33.2°C, b.p. 47°C)... 

Isotope photoseparation techniques for actinides probably will include only gaseous systems, hexafluorides and metal vapors. Hence, aqueous actinide photochemistry is not likely to influence isotope separations. However, the intense interest in laser separation techniques for the gaseous systems promotes interest in the aqueous systems. 

Sulphur hexafluoride steel for moist gas Most common metals. ... 

Analysis of the halohydrocarbons, halocarbons, and sulfur hexafluoride is usually achieved by gas chromatography that is equipped with an electron capture detector. Complex metal anions, such as cobalt hexacyanide, are used as nonradioactive tracers in reservoir studies. The cobalt in the tracer compound must be in the complex anion portion of the molecule, because cationic cobalt tends to react with materials in the reservoir, leading to inaccurate analytic information [1226]. 

One of the most important examples of the fluorination of oxides is the fluorination of uranium dioxide. Uranium tetrafluoride (UF4) is the intermediate compound which is reduced to uranium metal. The gaseous higher fluoride, uranium hexafluoride (UF6) is used for the separation of uranium isotopes to obtain enriched uranium (i.e., uranium containing a higher proportion of the isotope, U235, than natural uranium). 

Sulphur dioxide Sulphur hexafluoride C T O Most common metals for dry gas. Lead, carbon, aluminium and stainless steel for moist gas Most common metals. Copper, stainless steel and aluminium are resistant to the decomposition products at 150°C Zinc... 

See Tetramethoxysilane Metal hexafluorides See other METAL ALKOXIDES... 

---