Thickness of multilayer

Figure l,a and b present the distribution profiles of diamond concentration and strength through the thickness of multilayered samples. The figure shows that the diamond strength grows from 3 % layer to 12 % layer (fig. I a) and is the maximum one in the layer with the diamond concentration equal to 15-20 % (fig.lb). 

The abscissa represents a statistical thickness of multilayers. Values can be calculated as follows ... 

The semi-quantitative composition profile in Fig. 14.8 shows similar trends for Zr, O and A1 signals to the profile for undoped pre-treatment. Film thickness is in the same range (150 200 nm) for doped and undoped pre-treatments. In general, the thickness of multilayer pre-treatment as in Fig. 14.7B is slightly greater than for the film in Fig. 14.7A. 

Chemical properties of deposited monolayers have been studied in various ways. The degree of ionization of a substituted coumarin film deposited on quartz was determined as a function of the pH of a solution in contact with the film, from which comparison with Gouy-Chapman theory (see Section V-2) could be made [151]. Several studies have been made of the UV-induced polymerization of monolayers (as well as of multilayers) of diacetylene amphiphiles (see Refs. 168, 169). Excitation energy transfer has been observed in a mixed monolayer of donor and acceptor molecules in stearic acid [170]. Electrical properties have been of interest, particularly the possibility that a suitably asymmetric film might be a unidirectional conductor, that is, a rectifier (see Refs. 171, 172). Optical properties of interest include the ability to make planar optical waveguides of thick LB films [173, 174]. 

In the case of multilayer adsorption it seems reasonable to suppose that condensation to a liquid film occurs (as in curves T or of Fig. XVII-13). If one now assumes that the amount adsorbed can be attributed entirely to such a film, and that the liquid is negligibly compressible, the thickness x of the film is related to n by... 

There is little doubt that, at least with type II isotherms, we can tell the approximate point at which multilayer adsorption sets in. The concept of a two-dimensional phase seems relatively sterile as applied to multilayer adsorption, except insofar as such isotherm equations may be used as empirically convenient, since the thickness of the adsorbed film is not easily allowed to become variable. 

Ellipsometry measurements can provide infomiation about the thickness, microroughness and dielectric ftinction of thin films. It can also provide infomiation on the depth profile of multilayer stmctiires non-destmctively, including the thickness, the composition and the degree of crystallinity of each layer [39]. The measurement of the various components of a complex multilayered film is illustrated m figure Bl.26.17 [40]. 

Consider stage i in the desorption process where the thickness of the adsorbed film is and the pores of radius r, have just lost their capillary condensate. The volume of multilayer lining the pores of any radius r, where r > ri, will then be (since the pores are cylindrical) ... 

Equally important as tape casting in the fabrication of multilayer ceramics is thick film processing. Thick film technology is widely used in microelectronics for resistor networks, hybrid integrated circuitry, and discrete components, such as capacitors and inductors along with metallization of MLC capacitors and packages as mentioned above. 

Fig. 4. Multilayered aquifer flow where t represents thickness of confining layers between units 1, 2, and 3.

Using this strategy, constmction of multilayer films of - O. fim thickness by self-assembly of methyl 23-ttichlorosilyltticosanoate (MTST) on siUcon substrates has been demonstrated (Fig. 9) (165). The linear relationship between the film thickness and the layer number showed a slope of 3.5 nm /layer. Filipsometry data, absorbance intensities, and dichroic ratios for the multilayers all suggest that the samples were composed of distinct monolayers. However, ir data indicated that there maybe more tilting or disordering of the alkyl chains in the seven-layer sample than for the monolayer samples. 

Layered Structures. Whenever a barrier polymer lacks the necessary mechanical properties for an appHcation or the barrier would be adequate with only a small amount of the more expensive barrier polymer, a multilayer stmcture via coextmsion or lamination is appropriate. Whenever the barrier polymer is difficult to melt process or a particular traditional substrate such as paper or cellophane [9005-81-6] is necessary, a coating either from latex or a solvent is appropriate. A layered stmcture uses the barrier polymer most efficiently since permeation must occur through the barrier polymer and not around the barrier polymer. No short cuts are allowed for a permeant. The barrier properties of these stmctures are described by the permeance which is described in equation 16 where and L are the permeabiUties and thicknesses of the layers. 

Adsorption of dispersants at the soHd—Hquid interface from solution is normally measured by changes in the concentration of the dispersant after adsorption has occurred, and plotted as an adsorption isotherm. A classification system of adsorption isotherms has been developed to identify the mechanisms that may be operating, such as monolayer vs multilayer adsorption, and chemisorption vs physical adsorption (8). For moderate to high mol wt polymeric dispersants, the low energy (equiUbrium) configurations of the adsorbed layer are typically about 3—30 nm thick. Normally, the adsorption is monolayer, since the thickness of the first layer significantly reduces attraction for a second layer, unless the polymer is very low mol wt or adsorbs by being nearly immiscible with the solvent. 

X-ray Diffraction (XRD) is a powerful technique used to uniquely identify the crystalline phases present in materials and to measure the structural properties (strain state, grain size, epitaxy, phase composition, preferred orientation, and defect structure) of these phases. XRD is also used to determine the thickness of thin films and multilayers, and atomic arrangements in amorphous materials (including polymers) and at inter ces. 

XRD offers unparalleled accuracy in the measurement of atomic spacings and is the technique of choice for determining strain states in thin films. XRD is noncontact and nondestructive, which makes it ideal for in situ studies. The intensities measured with XRD can provide quantitative, accurate information on the atomic arrangements at interfaces (e.g., in multilayers). Materials composed of any element can be successfully studied with XRD, but XRD is most sensitive to high-Z elements, since the diffracted intensity from these is much lar r than from low-Z elements. As a consequence, the sensitivity of XRD depends on the material of interest. With lab-based equipment, surface sensitivities down to a thickness of -50 A are achievable, but synchrotron radiation (because of its higher intensity)... 

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