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Surface reflection amplitude

Once the complex reflectivity amplitude is known, the relation (2.121) determines e(a>). Nevertheless, the absolute reflectivity, unimportant as regards 0(cu) [see (2.120)] becomes essential for the permittivity. Earlier work on a number of crystal samples showed us that the maximum reflectivity at 4 K was greater than 90%. However, due to free sample mounting, the front face of the crystal is not perfectly planar, and accurate direct measurements of the absolute reflectivity are impossible. Fortunately, surface structures II and III allow probing the bulk reflectivity around 3982 A High-resolution spectra (0.3 cm 1) of structure II (cf. Section III) show the absence of any constructive intereference. This, together with numerical simulations,121 indicates that the bulk reflectivity should be very close to 100% (within 2%) at the maximum. [Pg.87]

Here r,(co) shows the effect of the surface reflectivity, which appears as a lorentzian line, centered at the surface resonance, if we neglect the variation of rv(co) with co around the surface resonance ( lOcnU1). The surface excitations are renormalized relative to the bulk-free surface, leading for coupled surface excitons to a frequency shift ds and to a new radiative width rs, both quantities simply related to the complex amplitude of the bulk reflectivity ... [Pg.142]

Therefore, as a general trend, Ts decreases when the energy gap between surface and bulk states is made weaker Figs. 3.1-3 provide a perfect illustration of the expression (3.26) for the bulk effect on the surface emission. A more detailed analysis of the bulk effect will be given below. However, this reduction of the surface radiative width may be interpreted classically as the destructive interference between the emission of the surface and that of its electrostatic image in the bulk.140 The bulk reflectivity amplitude rv(to) is quasi-metallic near resonance and at low temperatures. [Pg.143]

In the case of the mechanically polished surface, the amplitude of roughness was several atomic diameters of Cu (Fig. 2.29c, d), whereas the mechanically and electrochemically polished stuface exhibited smoothness on the atomic level (Fig. 2.29e, f). The increase in the specular reflection of 20-25 % is due to this fact. It is interesting to note (Fig. 2.29g) that the structure of the bright surface was not oriented. This is in accordance with the assumption that the dissolution process under polishing conditions is a random process. [Pg.77]

Considering the effect of reflection at the surface, the amplitude of the first motion Ao(x,t) in the far-field due to an applied force /(t) is derived from Eq. 8.4 and represented as. [Pg.180]

Assume that a plane wave E = Aq txp[i(a)t — kx)] is incident at the angle a on a plane transparent plate with two parallel, partially reflecting surfaces (Fig. 4.35). At each surface the amplitude A/ is split into a reflected component Ar = Ai fR and a refracted component At = A Vl — E, neglecting absorption. The reflectivity R — 7r/// depends on the angle of incidence a and on the polarization of the incident wave. Provided the refractive index n... [Pg.130]

In order to examine the importance of the third wave and higher order waves it is necessary to introduce reflection factors r and r and transmission factors T and t. r is the ratio of the reflected amplitude to the incident amplitude of the wave in air when it is reflected by the soap film surface, r is the reflection factor for an incident wave from the soap film medium, t is the ratio of the amplitude of the transmitted wave to that of the incident wave in propagating from air to the soap film and t is the factor for transmission from the soap film to the air. If Ai is the amplitude of the incident wave and 8 is the phase difference between successive rays emerging from the film, the total amplitude reflected from the soap film will be obtained by adding the contributions from each reflected ray. This is... [Pg.57]

Total reflection at an interface is a special case of reflection, which is described by Fresnel s equations. Physically, they originate from the necessity to fulflll certain boundary conditions of the electromagnetic field. The surface reflection depends on the refractive indices, on the angle of incidence and on the polarization of the light. For normal incidence, the reflectivity, that is, the ratio of field amplitudes, is given by (Equation 16.4) ... [Pg.340]

Since the intensity of the light is proportional to the square of the amplitude, the reflectance, i.e. the fraction of reflected power, is given by the square of this value. Taking 7tA= 1 and n = 1.5, we thus find a surface reflectance of 4% for a typical air-glass interface. [Pg.340]

Recently, a potential source of artifacts was pointed out [19] due to a standing electromagnetic wave that forms on all reflective surfaces. The amplitude of this wave depends strongly on the wavelength of the incident radiation and confounds the observed intensities. However, we have shown [16] that the errors for thin flat cells are relatively small, and can be further reduced by data preprocessing methods. [Pg.184]

An extension of optical treatments to include anisotropy in the optical constants provides a means to estimate chain orientation and surface concentration from reflection-absorption intensities. Models of this kind are based on a definition of optical constants as in Figure 1. The ambient superphase and liquid sublease are isotropic, and the monolayer has the indicated anisotropic optical constants. Fina and Tung (26) originally used such a model to predict the dependence of the reflection-absorption of a monolayer on the chain orientation. The reflected amplitudes for a three phase system are found from the well known relationship ... [Pg.47]

The use of the surface ultrasonic waves seems to be convenient for these purposes. However, this method has not found wide practical application. Peculiarities of excitation, propagation and registration of surface waves created before these time great difficulties for their application in automatic systems of duality testing. It is connected with the fact that the surface waves are weakened by soil on the surface itself In addition, the methods of testing by the surface waves do not yield to automation due to the difficulties of creation of the acoustic contact. In particular, a flow of contact liquid out of the zone of an acoustic line, presence of immersion liquid, availability of chink interval leads to the adsorption and reflection of waves on tlie front meniscus of a contact layer. The liquid for the acoustic contact must be located only in the places of contact, otherwise the influence on the amplitude will be uncontrolled. This phenomenon distorts the results of testing procedure. [Pg.876]

Randomness.—The word random is used frequently to describe erratic and apparently unpredictable variations of an observed quantity. The noise voltage measured at the terminals of a hot resistor, the amplitude of a radar signal that has been reflected from the surface of the sea, and the velocity measured at some point in a turbulent air flow are all examples of random or unpredictable phenomena. [Pg.99]

Intensity-modulated photocurrent spectroscopy has been used in combination with microwave reflectivity measurements to investigate hydrogen evolution at a p-type silicon45 and an n-type silicon.46 The measurement of amplitude and phase under harmonic generation of excess carriers, performed by Otaredian47 on silicon wafers in an attempt to separate bulk and surface recombination, should also be mentioned here. [Pg.509]

FIGURE 27.8 Specular reflectivity for a clean Au(lOO) surface in vacuum at 310 K ( ). The solid line is calculated for an ideally terminated lattice. The dashed line is a fit to the data with a reconstmcted surface with a 25% increase in the surface density combined with a surface relaxation that increases the space between the top and next layers by 19%. In addition, the data indicate that the top layer is buckled or cormgated with a buckling amplitude of 20%. (From Gibbs et al., 1988, with permission from the American Physical Society.)... [Pg.476]


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