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Silicon oxide surface

Interesting results have also been obtained with light-induced oscillations of silicon in contact with ammonium fluoride solutions. The quantum efficiency was found to oscillate complementarity with the PMC signal. The calculated surface recombination rate also oscillated comple-mentarily with the charge transfer rate.27,28 The explanation was a periodically oscillating silicon oxide surface layer. Because of a periodically changing space charge layer, the situation turned out to be nevertheless relatively complicated. [Pg.487]

Ryen, C. M. andZhu, X. Y., "Two-Step Approach to the Formation of Organic Monolayers on the Silicon Oxide Surface, Langmuir,Vol. 17,2001,pp- 5576-5580. [Pg.235]

FIG. 4 FTIR-ATR spectra of ethanol on a silicon oxide surface in ethanol-cyclohexane binary liquids at various ethanol concentrations 0.0, 0.1, 0.3, 0.5, 1.0, and 2.0 mol%. [Pg.6]

FIGURE 3.4. Image of gold gear with platinum teeth before freeing from the silicon oxide surface. (Reproduced with permission from Small 2005, I, 202-6. Copyright 2005 Wiley Inter Science.)... [Pg.33]

When fluorine is deposited onto a silicon oxide surface from a plasma process, it cannot be completely removed even after an extensive period in elevated temperature water. [Pg.408]

Example 6.13. A silicon oxide sphere with 20 pm diameter sits on a silicon oxide surface. Estimate the contact radius at negligible external force and calculate the adhesive force. E = 5.4 x 1010 Pa, v = 0.17, 7s = 50 mN/m, density p = 3000 kg/m3. [Pg.114]

Figure 7.16 Left Spreading of a drop of PDMS on a silicon wafer observed with an ellipsometer 19 h after deposition. Redrawn after Ref. [283], On a much smaller scale (right) prewetting layers around droplets of polystyrene on a flat silicon oxide surface are observed. The atomic force microscope image shows an area of (2.5 /um)2 [284]. Figure 7.16 Left Spreading of a drop of PDMS on a silicon wafer observed with an ellipsometer 19 h after deposition. Redrawn after Ref. [283], On a much smaller scale (right) prewetting layers around droplets of polystyrene on a flat silicon oxide surface are observed. The atomic force microscope image shows an area of (2.5 /um)2 [284].
Figure 9.10 Adsorbed amount of water on a silicon oxide surfaces versus relative vapor pressure at 20°C. The continuous line was calculated with the theory of Polanyi and assuming van der Waals forces only (Eq. 9.57). Experimental results as measured on Aerosil 200 were adapted from Ref. [379] (see also Fig. 9.9). The deviation at high pressure is partially due to the porosity of the adsorbent. The equilibrium vapor pressure is P0 = 3.17 kPa. Figure 9.10 Adsorbed amount of water on a silicon oxide surfaces versus relative vapor pressure at 20°C. The continuous line was calculated with the theory of Polanyi and assuming van der Waals forces only (Eq. 9.57). Experimental results as measured on Aerosil 200 were adapted from Ref. [379] (see also Fig. 9.9). The deviation at high pressure is partially due to the porosity of the adsorbent. The equilibrium vapor pressure is P0 = 3.17 kPa.
Figure 10.6 Schematic drawing of silanes bound to a silicon oxide surface. Figure 10.6 Schematic drawing of silanes bound to a silicon oxide surface.
Cation concentration at a silicon oxide surface. The concentration of cations is in-... [Pg.303]

Qnclin S Ravoo BJ Reinhoudt DN, Engineering silicon oxide surfaces using self-assembled monolayers, Angew. Chem. Int. Ed., 2005, 44, 6282-6304. [Pg.705]

Asymmetric cyanosilylation of ketones and aldehydes is important because the cyanohydrin product can be easily converted into optically active aminoalcohols by reduction. Moberg, Haswell and coworkers reported on a microflow version of the catalytic cyanosilylation of aldehydes using Pybox [5]/lanthanoid triflates as the catalyst for chiral induction. A T-shaped borosilicate microreactor with channel dimensions of 100 pm X 50 pm was used in this study [6]. Electroosmotic flow (EOF) was employed to pump an acetonitrile solution of phenyl-Pybox, LnCl3 and benzal-dehyde (reservoir A) and an acetonitrile solution of TMSCN (reservoir B). LuC13-catalyzed microflow reactions gave similar enantioselectivity to that observed in analogous batch reactions. However, lower enantioselectivity was observed for the YbCl3-catalyzed microflow reactions than that observed for the batch reaction (Scheme 4.5). It is possible that the oxophilic Yb binds to the silicon oxide surface of the channels. [Pg.61]

One assembly example is polyethylenamine (PEI)-mediated self-assembly of FePt nanoparticles [56]. PEI is an all -NH-based polymer that can replace oleate/oleylamine molecules around FePt nanoparticles and attach to hydrophilic glass or silicon oxide surface through ionic interactions [52], A PEI/FePt assembly is readily fabricated by dipping the substrate alternately into PEI solution and FePt nanoparticle dispersion. Figure 10 shows the assembly process and TEM images of the 4 nm Fes8Pt42 nanoparticle self-assemblies on silicon oxide surfaces. Characterizations of the layered structures with X-ray reflectivity and AFM indicate that PEI-mediated FePt assemblies have controlled thickness and the surfaces of the assemblies are smooth with root mean square roughness less than 2 nm. [Pg.249]

Figure 10. (A) Schematic illustration of PEI-mediated self-assembly of FePt nanoparticles by alternately adsorbing a layer of PEI and a layer of nanoparticles on a solid surface and TEM images of PEI-mediated assembly of 4 nm Fe58Pt42 nanoparticles on silicon oxide surface (B) one layer of assembly and (C) three layers of assembly [56]. Figure 10. (A) Schematic illustration of PEI-mediated self-assembly of FePt nanoparticles by alternately adsorbing a layer of PEI and a layer of nanoparticles on a solid surface and TEM images of PEI-mediated assembly of 4 nm Fe58Pt42 nanoparticles on silicon oxide surface (B) one layer of assembly and (C) three layers of assembly [56].
K. Shabtai, S. R. Cohen, H. Cohen, and I. Rubinstein, A Composite Gold-Silicon Oxide Surface for Mesoscopic Patterning, J. Phys. Chem. B 107, 5540-5546 (2003). [Pg.57]

According to Loewenstein et the deposition of the contaminant level of metals from cleaning solution onto the silicon or silicon oxide surface occurs by replacing the hydrogen ion on the surface silanol groups ... [Pg.62]

The specific adsorption of an anion at the oxide/electrolyte surface, which changes the surface charge, may be viewed as a surface complexation reaction. Thus, fluoride ions that are adsorbed at the silicon oxide surface centers form Si-F complex ... [Pg.158]

In one example, polystyrene sulfonate (PSS) brushes terminated with trichlorosilane anchor groups are attached both to spherical [51] and to planar silicon oxide surfaces [52-54]. To obtain such structures in the first step a monolayer consisting of neutral polystyrene molecules is formed by reaction of the silane anchor groups with silanol groups on the silicon/silica substrates. The neutral polymer is then transformed into the polyelectrolyte in a second step via a polymer-analogous sulfonation reaction. The thus ob-... [Pg.94]

Onclin, S. Mulder, A. Huskens, J. Ravoo, B. J. Reinhoudt, D. N. Molecular Printboards Monolayers of Beta-Cyclodextrins on Silicon Oxide Surfaces. Langmuir 2004, 20, 5460-5466... [Pg.113]

The surface of all inorganic materials exposed to ambient (humid) air is always covered with a thin layer of water adsorbed from the gas phase. The thickness of the adsorbed water layer varies with the humidity and surface chemistry. This water layer has been shown to reduce wear in MEMS operation. However, the high surface tension of the water film can cause an in-use stiction problem. The gas-phase lubrication concept discussed here employs the same equilibrium adsorption principle as the water adsorption in humid environments. The difference is that our approach utilizes a surfactant-like molecule that can provide low adhesion and good lubrication. The entry summarizes the advantages of gas-phase lubrication for MEMS devices and discusses the effect of alcohol adsorption on the adhesion and lubrication of silicon oxide surfaces. [Pg.1143]

Fig. 4 shows the adsorption isotherm of n-propanol on the QCM sensor at room temperature. The observed trend of the n-propanol film thickness as a function of partial pressure is consistent with the general characteristic of the alcohol adsorption isotherm observed for other systems. The inset in Fig. 4 gives the approximate thickness of the adsorbed alcohol layer on the QCM sensor measured at a partial pressure of 90 10% to the saturation pressure of each alcohol. The actual alcohol thickness on the clean, hydrophilic silicon oxide surface would be slightly larger than that on gold. [Pg.1145]

The -propanol adsorption from the gas phase significantly decreases the adhesion force between the silicon oxide surfaces measured with AFM. Fig. 7 illustrates the adhesion force measured with a single tip (2.2 N/m) at various partial pressures of n-propanol. The adhesion force decreases 40% compared with the dry Ar case upon initial introduction of n-propanol partial pressure. This reduction is not as drastic upon further increase of the n-propanol partial pressure. A sudden change in adhesion with only 10% partial pressure indicates that a few monolayer thick n-propanol film, as shown in Fig. 4, is sufficient to reduce the adhesion between the silicon oxide surfaces. This behavior is in sharp contrast to the relationship between the adhesion force and the water adsorption isotherm. In the case of water, the adhesion force increases several fold when the relative humidity increases from zero to... [Pg.1147]


See other pages where Silicon oxide surface is mentioned: [Pg.5]    [Pg.281]    [Pg.282]    [Pg.395]    [Pg.518]    [Pg.229]    [Pg.242]    [Pg.115]    [Pg.538]    [Pg.306]    [Pg.52]    [Pg.444]    [Pg.448]    [Pg.459]    [Pg.460]    [Pg.461]    [Pg.49]    [Pg.201]    [Pg.336]    [Pg.352]    [Pg.502]    [Pg.295]    [Pg.2513]    [Pg.96]    [Pg.82]    [Pg.63]    [Pg.1143]   
See also in sourсe #XX -- [ Pg.94 , Pg.96 ]




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Oxidation silicon surface

Oxidation silicones

Oxides silicon oxide

Oxidized silicon

Silicon oxidation

Silicon oxides

Silicon surface

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