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Polymer diblock copolymer

Pischei LB, Theodorou DN (1995) Self-consistent field model of the polymer/diblock copolymer/poiymer interface. J Chem Soc Faraday Trans 91 2381-2402... [Pg.203]

Figure B3.6.5. Phase diagram of a ternary polymer blend consisting of two homopolymers, A and B, and a synnnetric AB diblock copolymer as calculated by self-consistent field theory. All species have the same chain length A and the figure displays a cut tlirough the phase prism at%N= 11 (which corresponds to weak segregation). The phase diagram contains two homopolymer-rich phases A and B, a synnnetric lamellar phase L and asynnnetric lamellar phases, which are rich in the A component or rich in the B component ig, respectively. From Janert and Schick [68]. Figure B3.6.5. Phase diagram of a ternary polymer blend consisting of two homopolymers, A and B, and a synnnetric AB diblock copolymer as calculated by self-consistent field theory. All species have the same chain length A and the figure displays a cut tlirough the phase prism at%N= 11 (which corresponds to weak segregation). The phase diagram contains two homopolymer-rich phases A and B, a synnnetric lamellar phase L and asynnnetric lamellar phases, which are rich in the A component or rich in the B component ig, respectively. From Janert and Schick [68].
Block copolymers are closer to blends of homopolymers in properties, but without the latter s tendency to undergo phase separation. As a matter of fact, diblock copolymers can be used as surfactants to bind immiscible homopolymer blends together and thus improve their mechanical properties. Block copolymers are generally prepared by sequential addition of monomers to living polymers, rather than by depending on the improbable rjr2 > 1 criterion in monomers. [Pg.434]

Fig. 8. General structures of polymeric dispersants (a) liomopolymer, (b) random copolymer, (c) diblock copolymer, and (d) comb polymer, where A = anchor group, B = soluble repeat unit, and C = repeat unit with solubility different from B. The repeat units may occur in sequences hundreds of... Fig. 8. General structures of polymeric dispersants (a) liomopolymer, (b) random copolymer, (c) diblock copolymer, and (d) comb polymer, where A = anchor group, B = soluble repeat unit, and C = repeat unit with solubility different from B. The repeat units may occur in sequences hundreds of...
ABA and ) n block polymers exhibit higher melt viscosities than do AB diblock copolymers with similar molecular weights. The former two... [Pg.187]

The model has also been found to work well in describing the mechanics of the interface between the semicrystalline polymers polyamide 6 and polypropylene coupled by the in-situ formation of a diblock copolymer at the interface. The toughness in this system was found to vary as E- where E was measured after the sample was fractured (see Fig. 8). The model probably applied to this system because the failure occurred by the formation and breakdown of a primary craze in the polypropylene [14],... [Pg.231]

Char, K., Brown, H.R. and Deline, V.R., Effects of a diblock copolymer on adhesion between immiscible polymers, 2. PS-PMMA copolymer between PPO and PMMA. Macromolecules, 26(16), 4164-4171 (1993). [Pg.242]

These effects have been found by Creton et al. [79] who laminated sheets of incompatible polymers, PMMA and PPO, and studied the adhesion using a double cantilever beam test to evaluate fracture toughness Fc. For the original laminate Fc was only 2 J/m, but when interface reinforced with increasing amounts of a symmetrical P.M.M.A.-P.S. diblock copolymer of high degree of polymerisation (A > A e), the fracture toughness increased to around 170 J/m, and then fell to a steady value of 70 J/m (Fig. 9). [Pg.339]

It is well known that block copolymers and graft copolymers composed of incompatible sequences form the self-assemblies (the microphase separations). These morphologies of the microphase separation are governed by Molau s law [1] in the solid state. Nowadays, not only the three basic morphologies but also novel morphologies, such as ordered bicontinuous double diamond structure, are reported [2-6]. The applications of the microphase separation are also investigated [7-12]. As one of the applications of the microphase separation of AB diblock copolymers, it is possible to synthesize coreshell type polymer microspheres upon crosslinking the spherical microdomains [13-16]. [Pg.601]

Characterization and control of interfaces in the incompatible polymer blends were reported by Fayt et al. [23]. They used techniques such as electron microscopy, thermal transition analysis, and nonradiative energy transfer (NRET), etc. They have illustrated the exciting potentialities offered by diblock copolymers in high-performance polymer blends. [Pg.640]

A very specific surface structure is observed after the annealing of a PS/polybuta-diene (PB) diblock copolymer, PS-b-PB, shown in Fig. 7 b. The surface is very smooth directly after preparation of the film from solution (similar to Fig. 7 a). By annealing at 120 °C the surface structure shown in Fig. 7 b evolves, which we believe is due to the formation of layers of PS and PB parallel to the surface. The outermost layer might not be completely filled due to lack of material leading to steps at the surface. Similar behavior is observed with other diblock copolymers such as PS-b-PMMA [61]. Enrichment of one component is also observed at the surface of a polymer solution [115,116] by X-ray fluorescene and evanescent wave techniques. [Pg.382]

When dealing with polymer blends or blockcopolymers, surface enrichment or microstructures may be observed as already discussed in Sect. 3.1. Quite similar effects may be expected for buried interfaces e.g. between polymer and substrate where one component may be preferentially enriched. In a system of PS, PVP and diblock copolymer PS-6-PVP it has been shown by FRS that the copolymer enrichment is strongly concentration dependent [158]. In a mixed film of PS(D) and end-functionalized PS on a silicon wafer the end-functionalized chains will be attached to the silicon interface and can be detected by NR [159],... [Pg.387]

Vinyl copolymers contain mers from two or more vinyl monomers. Most common are random copolymers that are formed when the monomers polymerize simultaneously. They can be made by most polymerization mechanisms. Block copolymers are formed by reacting one monomer to completion and then replacing it with a different monomer that continues to add to the same polymer chain. The polymerization of a diblock copolymer stops at this point. Triblock and multiblock polymers continue the polymerization with additional monomer depletion and replenishment steps. The polymer chain must retain its ability to grow throughout the process. This is possible for a few polymerization mechanisms that give living polymers. [Pg.470]

Kennedy J.P. and Shim J.S., Star-block polymers having multiple polyisobutylene containing diblock copolymers arm radiating from a siloxane core and a method of synthesis thereof. Disclosure 318, US Patent, Notice of Allowance, 2001. [Pg.155]

Minich E.A., Nowak A.P., Deming T.J., and Pochan, D.J. Rod-rod and rod-coil self-assembly and phase behavior of pol3fpeptide diblock copolymers. Polymer, 45, 1951, 2004. [Pg.158]

The formation of nanopattemed functional surfaces is a recent topic in nanotechnology. As is widely known, diblock copolymers, which consist of two different types of polymer chains cormected by a chemical bond, have a wide variety of microphase separation structures, such as spheres, cylinders, and lamellae, on the nanoscale, and are expected to be new functional materials with nanostructures. Further modification of the nanostructures is also useful for obtaining new functional materials. In addition, utilization of nanopartides of an organic dye is also a topic of interest in nanotechnology. [Pg.203]

Laser ablation of polymer films has been extensively investigated, both for application to their surface modification and thin-film deposition and for elucidation of the mechanism [15]. Dopant-induced laser ablation of polymer films has also been investigated [16]. In this technique ablation is induced by excitation not of the target polymer film itself but of a small amount of the photosensitizer doped in the polymer film. When dye molecules are doped site-selectively into the nanoscale microdomain structures of diblock copolymer films, dopant-induced laser ablation is expected to create a change in the morphology of nanoscale structures on the polymer surface. [Pg.204]

Secondly, we describe the site-selective introduction of a functional molecule, tetrakis-5,10,15,20-(4-carboxyphenyl)porphyrin (TCPP), into the microphase separation structure of a diblock copolymer film of PS-fo-P4VP. Since porphyrin derivatives show various functionalities such as sensitization, redox activity, and nonlinear optical effect, a polymer nanodot array containing a porphyrin at a high concentration would be applicable to a light-harvesing and charge transporting nanochannel. [Pg.204]

Further modification of the above nanostructures is useful for obtaining new functional materials. Thirdly, we apply the dopant-induced laser ablation technique to site-selectively doped thin diblock copolymer films with spheres (sea-island), cylinders (hole-network), and wormlike structures on the nanoscale [19, 20]. When the dye-doped component parts are ablated away by laser light, the films are modified selectively. Concerning the laser ablation of diblock copolymer films, Lengl et al. carried out the excimer laser ablation of diblock copolymer monolayer films, forming spherical micelles loaded with an Au salt to obtain metallic Au nanodots [21]. They used the laser ablation to remove the polymer matrix. In our experiment, however, the laser ablation is used to remove one component of block copolymers. Thereby, we can expect to obtain new functional materials with novel nanostmctures. [Pg.205]

Position-Selective Arrangement of Nanosize Polymer Microspheres Onto a PS-b-P4VP Diblock Copolymer Film with Nanoscale Sea-island Microphase Structure... [Pg.205]

Figure 12.1 AFM images of a PS-b-P4VP (301 000 19600) film (a) before and (b) after immersion in methanol for 75 min and the height profiles. S. Machida, H. Nakata, K. Yamada, A. Itaya Position-selective arrangement of nanosized polymer microsphere on diblock copolymer film with sea-island microphase structure.Jpn. /. Appl. Phys. 2006, 45, 4270—4273. Copyright Wiley InterScience. Reproduced with permission. Figure 12.1 AFM images of a PS-b-P4VP (301 000 19600) film (a) before and (b) after immersion in methanol for 75 min and the height profiles. S. Machida, H. Nakata, K. Yamada, A. Itaya Position-selective arrangement of nanosized polymer microsphere on diblock copolymer film with sea-island microphase structure.Jpn. /. Appl. Phys. 2006, 45, 4270—4273. Copyright Wiley InterScience. Reproduced with permission.

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