Polishes composition

Khaladji J., Peltier M., Rare Earth Polishing Compositions, U. S. Patent 4.942,691, 24 July 1990. 

Use Organic synthesis and chemical intermediate solvent for waxes, vegetable oils, natural and synthetic resins, cellulose esters and ethers polishing compositions brake fluids solvent degreasing antiseptic. 

OTHER COMMENTS used as a solvent for waxes, vegetable oils, resins, cellulose esters, ethers, brake fluids, polishing compositions, and degreasing operations useful as a chemical intermediate in organic synthesis also used as an antiseptic. 

Table 4 Effect of the weight percent of G5 glass on the polished composite wettability (mean values standard deviation)...

This section includes a discussion of formulated products which contain wax. A fluorinated copolymer was used in a wax composition for car body refinishing. A mixture of ethyl acetate, toluene and heptane is used as a solvent. A cleaning and polishing composition for automobiles is also based on a fluorinated polymer and contains hydrocarbon solvent at up to 70%. Universal auto lotion is a water/solvent emulsion of wax. It contains isoparaffinic... 

Takenouchi, K. Polishing composition for use in a wiring step in semiconductor device and a method of polishing therewith. Eur. Pat. Appl. EP 1642949, 2006 Chem. Abstr. 2006,144, 331448. 

US Patent 6562719 (Kondo) further describes the use of ethanol, isopropyl alcohol, ethylene glycol, and methyl ethyl ketone in abrasive-ffee polishing compositions that do not contain abrasive. These compounds were added to increase the solubility of benzotriazole (BTA), an inhibitor. 

Tantalum (Ta) and tantalum nitride (TaN) are particularly suitable materials for use in the damascene process as adhesion-promoting and/or diffusion barrier layers for copper-based devices. However, the properties of Ta and of TaN differ from those of copper, being considerably more chemically inert, such that abrasive-free polishing compositions useful for the polishing of copper are often unsuitable for the removal of underlying Ta and TaN. Hence, independent chemistries are often developed to clear Ta/TaN without further dishing of interconnect metal (Cu) or dielectric loss. 

Fig. 4.3 Reflected light micrographs of polished composite specimens show the carbon fibers (white) and their orientation within the polymer matrix. Black regions are voids. In (A) various layers are oriented normal to one another while in (B) two uniaxially fiber tows are shown.

First, the main difference between NC and UNCD films has to be considered. The decrease of the crystal grain size from NC to UNCD films increases the number of grain boundary interfaces. This also results in a decrease of thermal conductivity and an increase of the optical absorption of UNCD films compared to NC films. At the same time, the friction coefficient of UNCD films is lower than that of NC films. Both types of CVD films can be used for MEMS (microelectromechan-ical systems), NEMS (nanoelectromechanical systems), and also for electrochemical applications. " DND is applied as an abrasive for ultrafine mechanical polishing of hard surfaces of materials. Present-day polishing compositions based on detonation ND offer the possibility of obtaining... 

In order to reduce tackiness and increase the period of service of the coating, silicone wax polishing compositions are used (0.5-2% wax, 1.5-3% dimethylsilicone, solvent turpentine) [231]. 

Floor polish compositions Methyl vinyl United States 3,532,656 1970 Gulf Research... 

Moodychffe, T. I. Werkowski, L. M. Wax-free furniture polish composition containing petroleum distillates. U.S. Pat. Appl. Publ. US 2003075073, 2003 Chem. Abstr. 2003, 138, 339S(n. 

However, in order to have good compositional contrast, it is extremely important to minimise other factors affecting contrast, particularly topography (surface roughness), by polishing the sample. If the sample is not well polished, compositional features will be obscured as discussed in Section 8.4. 

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