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Plated substrates

Table 12.2 Corrosion potentials of substrates of coppter and steel, plated and unplated in same plating solutions. Deposition potential is accompanied by current density (A/m ) in parentheses the plated substrate s coating thickness was 2 5 fim. The final column gives the potential below which hydrogen evolution is possible only in the cuprocyanide is it observed... Table 12.2 Corrosion potentials of substrates of coppter and steel, plated and unplated in same plating solutions. Deposition potential is accompanied by current density (A/m ) in parentheses the plated substrate s coating thickness was 2 5 fim. The final column gives the potential below which hydrogen evolution is possible only in the cuprocyanide is it observed...
Carbon dioxide has been proposed as an additive to improve the performance of lithium batteries [60]. Aurbach et al. [61] studied the film formed on lithium in electrolytes saturated with C02, and using in situ FTIR found that Li2C03 is a major surface species. This means that the formation of a stable Li2C03 film on the lithium surface may improve cyclability [62], Osaka and co-workers [63] also studied the dependence of the lithium efficiency on the plating substrate in LiC104-PC. The addition of C02 resulted in an increase in the efficiency when the substrate was Ni or Ti, but no effect was observed with Ag or Cu substrates. [Pg.349]

The silver deposition experiments of Sonnenfeld and Schardt (94) provide a representative example. After the deposition of silver on HOPG, the freshly plated surface was imaged in the presence of aqueous 0.05 M AgClO (Fig. 7)(94). Assuming a positive tip polarity is used, the STM tip will function as an anode and its potential will be that necessary to oxidize water, Ea jj2q/02 - -+0.95 V (pH - 7). The substrate cathode will drive the reduction of silver ion at the silver plated substrate at a formal potential of Ec Ag+/Ag V. Thus, an imaging window of AEp - 230 mV is... [Pg.195]

Boron in high modulus and strength properties is available with this type of fiber. A vapor deposition process is the principal method to produce boron filaments, using /2 mil tungsten wire as a plating substrate. [Pg.463]

The technique of electroless plating is in principle attractive for industrial applications because of its unique advantages over conventional electrolytic plating. These advantages include (1) the ability to deposit a metal on catalyzed nonconductive substrates, (2) the ability to plate substrates with complex shapes at a uniform metal thickness, and (3) the ability to selectively deposit a metal on catalyzed areas of the substrate surface only. Because of these advantages, industry has found a number... [Pg.110]

Catalyst-assisted CVD processes can also be used to fabricate delicate microcomponents. Coiled fibres of carbon and refractory carbides are examples of such components which may be used in functional applications such as microsprings, microsensors and fillers of electromagnetic shielding materials. The microstructure of some coiled fibres is shown in Figure 3.39a. The device for the production of coiled fibre fabrication is shown in Figure 3.39b. A graphite plate substrate is placed at the central part of a horizontal CVD reaction chamber, and a metal... [Pg.119]

The distribution of polymer deposition from the glow discharge of ethylene is shown in Figure 5. In this figure, the deposition rate is plotted against the distance from the center of the electrode. The deposition rate profile shows a strong peak at a location that corresponds with the intense glow. A much sharper peak occurs at the position of the electrode surface. The peaks for the deposition on an aluminum plate substrate placed between electrodes is much less pronounced (Fig. [Pg.46]

Displacement of the free end of a steel plate substrate occurs due to shrinkage stresses in a RubCon layer. Knowing the value of this displacement, it is possible to determine shrinkage stresses with the formula ... [Pg.41]

Ni-P plated substrate of A1 alloy (Hard disc) Polymer with low dielectric constant... [Pg.755]

The design of subtle specific methods for depositing metal NPs, e.g. [144,145] is another way to control the location of the metal deposit within the CP layer. One proposed approach involves the deposition of a thin, sacrificial Au layer on a Pt substrate, electropolymerization of PANI on the Au-plated substrate, gold oxidation in chloride solution, and finally reduction of the AuCU eomplexes entrapped in the PANI structure. Thus gold/ polyaniline free-standing eomposite films are produced [144,145]. [Pg.309]

Let US consider a method of determining internal stresses that lacks the above shortcomings hy applying it to an adhesive-bonded joint represented by a three-layer plate (substrate-adhesive-substrate). The adhesive layer shrinkage causes deformation of the whole plate. The resistance forces appearing in this case can be represented as a system of normal forces and bending moments, which act layer by layer throughout the plate, and stresses can be represented as... [Pg.241]

Electrodeposition technique can also be utilized during catalyst preparation. Cu plate substrate was electrodeposited with Co-W-P catalyst. The catalyst had an amorphous structure. The highest hydrogen production rate was observed as 5000 mL min at 30°C. Moreover, the activa-... [Pg.173]

Fig. 16.12 SECM TG-SC images displaying the substrate curroit for ORR of an array composed by 3 different types of shape-controlled gold particles supported rai a glassy carbon plate. Substrate potential held constant at (a) 0.35 V, (b) 0.45 V, and (c) 0.55 V vctsus RHE in an oxygen-free 0.1 M NaOH solution. Tip-substrate distance = 25 pm. Oxygen flux generated at the tip at a constant current of 150 nA. Scan rate = 125 pm s (extracted from [70])... Fig. 16.12 SECM TG-SC images displaying the substrate curroit for ORR of an array composed by 3 different types of shape-controlled gold particles supported rai a glassy carbon plate. Substrate potential held constant at (a) 0.35 V, (b) 0.45 V, and (c) 0.55 V vctsus RHE in an oxygen-free 0.1 M NaOH solution. Tip-substrate distance = 25 pm. Oxygen flux generated at the tip at a constant current of 150 nA. Scan rate = 125 pm s (extracted from [70])...
As component lead pitch decreases, so does the amount of solder-per-joint contribution from the solder land metallurgy. Au concentration becomes increasingly difficult to control because its plated thickness cannot be easily regulated to accommodate the reduced surface area and lower solder volumes that accompany finer-pitch component requirements. After all, Au deposit thickness is dependent on its deposition grain size and plated porosity. The porosity must be overcome in order for the Au to serve its function in preventing oxidation of the underlying nickel on a Ni-plated substrate. [Pg.1050]


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See also in sourсe #XX -- [ Pg.356 ]




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Copper alloy substrate, plating

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