Interfaces, clean

The mobile phases used to provide separations that interface cleanly with the MS are of great importance. Both isocratic and gradient elution can be used. High purity (HPLC grade) water, acetonitrile, and Ci to C4 alcohols are compatible with APTelectrospray and APCI. Less polar solvents such as hexane, cyclohexane, toluene, and ethyl acetate are also compatible with APCI. In general, it is advisable to always have an organic solvent present in the mobile phase to reduce surface tension, which enhances the formation of smaller, more uniform droplets and also aids vaporization and ionization and hence provides greater sensitivity. 

One should ensure a good peak/noise ratio, for example measure more sensitively (the peak/noise ratio will become more favorable), optimal state of detector parts (e.g., no deposit in the UV cell, no blind mirror), no corroded circuit boards, no deposits on the MS interface, clean electrode surface in an electrochemical detector. When necessary, the electronic noise of AD converters and other interfaces should be reduced by using electronic dampers. 

The cleaning process proceeds by one of three primary mechanisms solubilization, emulsification, and roll-up [229]. In solubilization the oily phase partitions into surfactant micelles that desorb from the solid surface and diffuse into the bulk. As mentioned above, there is a body of theoretical work on solubilization [146, 147] and numerous experimental studies by a variety of spectroscopic techniques [143-145,230]. Emulsification involves the formation and removal of an emulsion at the oil-water interface the removal step may involve hydrodynamic as well as surface chemical forces. Emulsion formation is covered in Chapter XIV. In roll-up the surfactant reduces the contact angle of the liquid soil or the surface free energy of a solid particle aiding its detachment and subsequent removal by hydrodynamic forces. Adam and Stevenson s beautiful photographs illustrate roll-up of lanoline on wood fibers [231]. In order to achieve roll-up, one requires the surface free energies for soil detachment illustrated in Fig. XIII-14 to obey... 

Ultra-high vacuum (UHV) surface science methods allow preparation and characterization of perfectly clean, well ordered surfaces of single crystalline materials. By preparing pairs of such surfaces it is possible to fonn interfaces under highly controlled conditions. Furthennore, thin films of adsorbed species can be produced and characterized using a wide variety of methods. Surface science methods have been coupled with UHV measurements of macroscopic friction forces. Such measurements have demonstrated that adsorbate film thicknesses of a few monolayers are sufficient to lubricate metal surfaces [12, 181. 

Extended defects range from well characterized dislocations to grain boundaries, interfaces, stacking faults, etch pits, D-defects, misfit dislocations (common in epitaxial growth), blisters induced by H or He implantation etc. Microscopic studies of such defects are very difficult, and crystal growers use years of experience and trial-and-error teclmiques to avoid or control them. Some extended defects can change in unpredictable ways upon heat treatments. Others become gettering centres for transition metals, a phenomenon which can be desirable or not, but is always difficult to control. Extended defects are sometimes cleverly used. For example, the smart-cut process relies on the controlled implantation of H followed by heat treatments to create blisters. This allows a thin layer of clean material to be lifted from a bulk wafer [261. 

Dispersion is the process of wetting the surface of the metal, thereby penetrating the oil film. Surfactants can reduce the surface tension and interfacial tension of the cleaning solution at the metal—Hquid interface. As the cleaner undercuts and penetrates the oil, the cleaner breaks the oil into small droplets which then float to the surface. 

Metals for Schottl Contacts. Good Schottky contacts on semiconductor surfaces should not have any interaction with the semiconductor as is common in ohmic contacts. Schottky contacts have clean, abmpt metal—semiconductor interfaces that present rectifying contacts to electron or hole conduction. Schottky contacts are usuaHy not intentionaHy annealed, although in some circumstances the contacts need to be able to withstand high temperature processing and maintain good Schottky behavior. 

Soap is one example of a broader class of materials known as surface-active agents, or surfactants (qv). Surfactant molecules contain both a hydrophilic or water-liking portion and a separate hydrophobic or water-repelling portion. The hydrophilic portion of a soap molecule is the carboxylate head group and the hydrophobic portion is the aUphatic chain. This class of materials is simultaneously soluble in both aqueous and organic phases or preferential aggregate at air—water interfaces. It is this special chemical stmcture that leads to the abiUty of surfactants to clean dirt and oil from surfaces and produce lather. 

Coalescence The coalescence of droplets can occur whenever two or more droplets collide and remain in contact long enough for the continuous-phase film to become so thin that a hole develops and allows the liquid to become one body. A clean system with a high interfacial tension will generally coalesce quite rapidly. Particulates and polymeric films tend to accumulate at droplet surfaces and reduce the rate of coalescence. This can lead to the ouildup of a rag layer at the liquid-hquid interface in an extractor. Rapid drop breakup and rapid coalescence can significantly enhance the rate of mass transfer between phases. 

The chemical and electronic properties of elements at the interfaces between very thin films and bulk substrates are important in several technological areas, particularly microelectronics, sensors, catalysis, metal protection, and solar cells. To study conditions at an interface, depth profiling by ion bombardment is inadvisable, because both composition and chemical state can be altered by interaction with energetic positive ions. The normal procedure is, therefore, to start with a clean or other well-characterized substrate and deposit the thin film on to it slowly at a chosen temperature while XPS is used to monitor the composition and chemical state by recording selected characteristic spectra. The procedure continues until no further spectral changes occur, as a function of film thickness, of time elapsed since deposition, or of changes in substrate temperature. 

Although physical studies of the electronic structure of surfaces have to be performed under UHV conditions to guarantee clean uncontaminated samples, the technique does not require vacuum for its operation. Thus, in-situ observation of processes at solid-gas and solid-liquid interfaces is possible as well. This has been utilized, for instance, to directly observe corrosion and electrode processes with atomic resolution [5.2, 5.37]. 

The above measurements all rely on force and displacement data to evaluate adhesion and mechanical properties. As mentioned in the introduction, a very useful piece of information to have about a nanoscale contact would be its area (or radius). Since the scale of the contacts is below the optical limit, the techniques available are somewhat limited. Electrical resistance has been used in early contact studies on clean metal surfaces [62], but is limited to conducting interfaces. Recently, Enachescu et al. [63] used conductance measurements to examine adhesion in an ideally hard contact (diamond vs. tungsten carbide). In the limit of contact size below the electronic mean free path, but above that of quantized conductance, the contact area scales linearly with contact conductance. They used these measurements to demonstrate that friction was proportional to contact area, and the area vs. load data were best-fit to a DMT model. 

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