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Impurities measurement

Compared with conventional impurities measurements, trace analyses caimot be expected to achieve the same linearity and precision values. This is due to the lower signal-to-noise ratios inevitable at low levels. Hence, while the same approaches can be used, greater latitude will be necessary in the acceptance criteria. What must be demonstrated is that the data is statistically valid to show that the levels of toxic analytes are below their specification limits. [Pg.118]

Similar to the analytical procedure for trace analysis in high purity GaAs wafers after matrix separation, discussed previously,52 the volatilization of Ga and As has been performed via their chlorides in a stream of aqua regia vapours (at 210 °C) using nitrogen as the carrier gas for trace/matrix separation.58 The recoveries of Cr, Mn, Fe, Ni, Co, Cu, Zn, Ag, Cd, Ba and Pb determined after a nearly quantitative volatilization of matrix elements (99.8 %) were found to be between 94 and 101 % (except for Ag and Cr with 80 %). The concentrations of impurities measured by ICP-DRC-MS (Elan 6100 DRC, PerkinElmer Sciex) after matrix separation were compared with ICP-SFMS (Element 2, Thermo Fisher Scientific) and total reflection X-ray fluorescence analysis (TXRF Phillips). The limits of detection obtained for trace elements in GaAs were in the low ngg-1 range and below.58... [Pg.269]

Catalyst surface areas were measured using the multi-point BET method on a Carlo-Erba Ins. Sorpty 1750. Before the measurements, the samples were heated under dynamic vacuum at 573 K for 1 h in order to remove adsorbed water and impurities. Measurements were made at liquid nitrogen temperature with nitrogen as the adsorbate gas. Powder X-ray diffraction measurements were performed on a Siemens Model D-500 diffractometer with Co Kc monochromatic radiation (X = 1.78901 A) and the high resolution electron microscopy was carried out on a Topcon EM-002B microscope. To prevent artefacts no solvents were used in the preparation and mounting of samples for HRTEM. [Pg.481]

ICP-MS has been used for the analysis of many materials, including alloys, steels, nuclear materials, ceramics, superconductors, plastics, polymers, and catalysts. Semiquantitative analysis by ICP-MS is often a convenient method to screen samples for trace elements and impurities. Measurement of impurities can be complicated by sample matrix-dependent degradation of sensitivity, particularly if the samples contain high concentrations of heavy elements that create extensive space-charge-induced ion transmission losses. Matrix matching is complicated by the need for ultrapure materials. [Pg.136]

Applications. CART is not generally established yet, and as a consequence, not many applications for electrophoretic or similar data in the pharmaceutical held are found. Put et al. (52) apphed CART in a quantitative structure-retention relationship context on a retention data set of 83 structurally diverse drugs, in order to predict chromatographic retention. There were 266 molecular descriptors calculated and used as explanatory variables (X matrix). The considered response (y) was the retention factor of the compounds, predicted for a pure aqueous mobile phase. The total sum of squares of the response values about the mean of the node was applied as impurity measure. From all descriptors, three were selected to describe and predict the retention, and four terminal nodes were obtained (Fig. 13.11b). Arbitrarily, the drugs were then divided into hve retention classes. Each terminal node was then labeled with either one or two class names. The regression tree thus becomes a classihcation tree. From CV, it was concluded that only 9% serious misclassihcations were observed. [Pg.310]

FIGURE 15.1 Comparison between impurity measurements and the upper limit on the impurity in a product for the original control system (case A), the improved control system with the original impurity setpoint (case B), and the improved control with new setpoint (case C). [Pg.1176]

It should also be noted that the HPLC methods used for vims testing (lEX and RP) are also capable of detecting unexpected (non-viral) proteins, albeit with less sensitivity than this ELISA. AU impurity measures are best applied to the most concentrated in-process samples, specifically at the ultrafiltered bulk virus stage of the process. Taken together, none of these methods has shown any evidence of measurable HCP in the ultra-filtered bulk samples. [Pg.181]

RSD of 2% or less for a HPLC assay method for a small molecule drug product or API. For impurity measurements, the %RSD will increase as the spiked level decreases. Typical acceptance criteria at 0.1% levels are 10-25% RSDs, whereas at a 1% level, %RSD criteria are set at 3-5%. An example of accuracy and precision results obtained from a recovery study for Degradation Product A from XYZ Tablets by one analyst is presented in Table 8.2. Another method for measuring repeatability is to analyze a homogenous sample multiple times, for example 6 x samples at 100% of test concentration and then determine the %RSD. [Pg.167]

Hydrogen in cover gas Cleaning of coolant and circuit from impurities Measurement of hydrogen content in cover gas thermal conductivity method chromatography... [Pg.33]

Table 3.2.1/1 shows the impurities measured in the helium main circuit of the EVO plant. The first line shows the values without degasification and the second line those with degasification of the sealing oil. The third line shows the content of impurities in the main circuit if the helimn purification system is not operated. Lines 4 and 5 permit a comparison with AVR and Dragon (except for radioactive impurities). Line 6 gives the maximum permissible values as specified for HHT. [Pg.224]

FIGURE 40.21 Comparison of the depth profiles of a copper impurity by trace element accelerator mass spectrometry (TEAMS) and secondary ion mass spectrometry (SIMS). Reprinted from McDaniel, ED, Datar, S.A., Nigam, M., Ravi Prasad, G.V. (2002) Impurity measurements in semiconductor materials using trace element accelerator mass spectrometry. Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms, 190 1-A), 826-830. Copyright (2002), with permission from Elsevier Science. [Pg.917]

Ronsheim, P., Flaitz, P, Hatzistergos, M., Molella, C, Thompson, K., Alvis, R. (2008) Impurity measurements in silicon with D-SIMS and atom probe tomography. Applied Surface Science, 255,1547-1550. [Pg.941]

Very dry, OH measured in ppb Very pure, impurities measured in ppb... [Pg.441]

There is a wide sphere of applicability of DTA/DSC technique, which is regularly described in satisfactory details in the individual apparatus manuals or other books [1,15,602,613,640,646]. The usage can be sorted in to two classes The methods based on the (1) modified instrumentation such as (i) high-pressure studies [647] or (ii) differential hydrothermal analysis [648] and the measurements applicable under the (2) ordinary apparatus set up such (iii) determination of phase boundaries [646,649], (iv) impurity measurements [650,651] and (ivi) reaction kinetics (see previous Chapter [3,425,508-510,521]. Specifically constructed instrumentations [1,15,602] falls beyond the scope of this book so that we shall concentrate on the second type of applications. [Pg.366]

When the (CH) synthesis was repeated in Philadelphia, a rather low conductivity was observed again, in spite of the metallic appearance. The product was not very pure, and so the researchers decided to strictly remove all impinities from the polyacetylene, with the opposite effect than expected the conductivity decreased. Obviously, small halogen impurities measured by elemental analysis had a posihve influence. So, an experiment analog to (SN) chemistry, where the addition of bromine is known to increase the conductivity by one order of magnitude, was made. [Pg.13]

Tallow dialkyldimethylammonium salt mono- and trialkyl impurities measured separated from an imi-dazolininium compound and from Ci6 alkylbenzyldimethylammo-nium chloride monoalkyl compounds resolved by chain length... [Pg.669]


See other pages where Impurities measurement is mentioned: [Pg.530]    [Pg.265]    [Pg.107]    [Pg.78]    [Pg.321]    [Pg.121]    [Pg.67]    [Pg.308]    [Pg.490]    [Pg.2722]    [Pg.470]    [Pg.271]    [Pg.830]    [Pg.370]    [Pg.292]   
See also in sourсe #XX -- [ Pg.41 ]

See also in sourсe #XX -- [ Pg.370 ]




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